An extreme ultraviolet light generating apparatus may include: a chamber, in which extreme ultraviolet light is generated; a target supply unit that outputs a target into the chamber as droplets to supply the target to a plasma generating region; a stage that moves the target supply unit in a direction substantially perpendicular to the trajectory of droplets output from the target supply unit; a droplet detector provided between the target supply unit and the plasma generating region at an inclination of a predetermined angle with respect to a substantially vertical direction, that detects the droplets from a direction inclined at the predetermined angle; and a calculation control unit that controls the irradiation timings of the laser beam at which the laser beam is irradiated onto the droplets within the plasm generating region, by adding delay times to the timings at which the droplets are detected by the droplet detector.

A polarization measuring device (10) for determining the polarization of a light beam (16, 46) that includes a reflector (12, 58) and a detector (14, 20). The reflector (12, 58) is configured such that the plane of incidence of the light rays in the light beam (16, 46) varies in a location-dependent manner, such that the reflector (12, 58) reflects differing polarization components of the light beam (16, 46) to different extents depending on the plane of incidence. The detector (14, 20) serves to detect the differing polarization components.

A pulsed light generating method for generating a pulsed light by cutting out a laser light outputted from a laser light source with an intensity modulation type electro optic modulator, wherein: the electro optic modulator is driven by use of a drive signal that changes a voltage applied to the electro optic modulator between a voltage lower than a reference voltage and a voltage higher than the reference voltage, the reference voltage being a voltage applied to the electro optic modulator at which a transmittance of the laser light transmitting through the electro optic modulator is local maximum.

A portable image-forming device includes a housing, an exposure member for exposing an instant film disposed inside of the housing by means of a light radiating from the screen of a portable display device, a shading member linked in movement with the exposure member so as to shade the instant film, a traction member connected to the exposure member so as to move the exposure member to a pre-exposure position, and a developing-agent-spreading member for spreading a developing agent, which is provided on the instant film, over the entire instant film. The traction member and the developing-agent-spreading member are manually operated by a user.

A projection exposure apparatus for semiconductor lithography includes a deformable optical element for the correction of wavefront aberrations. Actuating units for the deformation of the optical element are in mechanical contact with the optical element by way of contact regions. The contact regions are arranged in a regular or irregular arrangement outside an optically active region of the optical element. There are contact regions lying closest to the optically active region and remote contact regions.

An optical system of a microlithographic projection exposure apparatus designed for an operating wavelength of at least 150 nm. In one disclosed aspect, the optical system includes an element (11, 21) producing an angular distribution for light incident during the operation of the optical system and a fly's eye condenser (200, 400, 500) which includes two arrangements (210, 220, 410, 420, 510, 520) following one another in the light propagation direction and made of beam-deflecting optical elements (211-213, 221-223, 411-413, 421-423, 511-513, 521-523), which produce a multiplicity of optical channels. No optical element with refractive power is arranged in the beam path between the element (11, 21) producing an angular distribution and the fly's eye condenser (200, 400, 500).

This disclosure discloses an alignment device and a method of manufacturing an alignment film, and a display substrate. The alignment device comprises a first exposure chamber that contains a first light box and a light-shielding plate for blocking light emitted from the first light box from irradiating the alignment region of the alignment film. The light emitted from the first light box is used to irradiate a non-alignment region so as to eliminate the alignment film in the non-alignment region.

An extreme ultraviolet (EUV) exposure system capable of improving the yield of an EUV exposure process by improving EUV exposure performance, and furthermore, capable of increasing throughput or productivity of the EUV exposure process, the EUV exposure system including an EUV exposure apparatus configured to perform EUV exposure on a wafer disposed on a chuck table, a load-lock chamber combined with the EUV exposure apparatus and configured to supply and discharge the wafer to/from the EUV exposure apparatus, and an ultraviolet (UV) exposure apparatus configured to perform UV exposure by irradiating an entire upper surface of the wafer with a UV light without using a mask.

An illumination optical unit for projection lithography illuminates an object field with illumination light. The illumination optical unit has a collector for collecting the emission of a light source for the illumination light. The collector is arranged such that it transfers the illumination light from the light source into an intermediate focus. The illumination optical unit furthermore has a field facet mirror and a pupil facet mirror, each having a plurality of facets. The field facets are imaged into the object field by a transfer optical unit. The illumination optical unit additionally has an individual-mirror array having individual mirrors tiltable in a manner driven individually. The array is arranged upstream of the field facet mirror and downstream of the intermediate focus in an illumination beam path.

An optical system has an aperture device having a multiplicity of aperture elements for the delimitation of the cross section of a ray bundle running through the optical system. The aperture device has a first aperture element, which is pivotable about a first rotation axis between an engagement position in the beam path of the optical system and a neutral position outside the beam path of the optical system and has a first aperture opening delimited by a first aperture edge. The aperture device also has at least one second aperture element, which is pivotable about a second rotation axis between an engagement position in the beam path of the optical system and a neutral position outside the beam path of the optical system and has a second aperture opening delimited by a second aperture edge. The second aperture opening is smaller than the first aperture opening. The aperture elements pivoted into the engagement position form an effective aperture opening. The aperture edges of aperture elements pivoted into the engagement position do not lie in a common plane.