An EUV light source serves for generating a usable output beam of EUV illumination light for a projection exposure apparatus for projection lithography. The light source has an EUV generation device which generates an EUV raw output beam. The latter is circularly polarized. For the purposes of setting the polarization of the usable output beam and in respect of the polarization direction, a polarization setting device has a linearly polarizing effect on the raw output beam. This results in an EUV light source, which provides an improved output beam for a resolution-optimized illumination.

A method of determining exposure dose of a lithographic apparatus used in a lithographic process on a substrate, the method comprising the steps: (a) receiving a substrate comprising first and second structures produced using the lithographic process; (b) detecting scattered radiation while illuminating the first structure with radiation to obtain a first scatterometer signal; (c) detecting scattered radiation while illuminating the second structure with radiation to obtain a second scatterometer signal; (d) using the first and second scatterometer signals to determine an exposure dose value used to produce said first and second structures wherein the first structure has a first periodic characteristic with spatial characteristics and yet at least another second periodic characteristic with spatial characteristics designed to be affected by the exposure dose and the second structure has a first periodic characteristic with spatial characteristics and yet at least another second periodic characteristic with spatial characteristics designed to be affected by the exposure dose wherein the exposure dose affects the exposure dose affected spatial characteristics of the first and second structures in a different manner.

An optical system for a microlithographic projection exposure apparatus and a microlithographic exposure method are disclosed. In an embodiment an optical system for a microlithographic projection exposure apparatus includes at least one mirror arrangement having a plurality of mirror elements which are displaceable independently of each other for altering an angular distribution of the light reflected by the mirror arrangement. The optical system also includes at least one manipulator downstream of the mirror arrangement in the light propagation direction. The manipulator has a raster arrangement of manipulator elements so that light incident on the manipulator during operation of the optical system is influenced differently in its polarization state and/or in its intensity in dependence on the incidence location.

Provided is an illumination optical system that illuminates a target illumination region by using light emitted from a discharge lamp. The system includes a condensing mirror that condenses the light from the discharge lamp, an optical integrator which has a polygonal cross-sectional shape and is arranged on an optical path from the condensing mirror to the target illumination region, an imaging optical system that forms an image on the target illumination region with respect to an exit end face of the optical integrator as an object plane, and a power supply cable connecting to an electrode of the discharge lamp across the optical path directed from the condensing mirror to the optical integrator. The cable is arranged so that a shadow of the cable is neither parallel nor perpendicular to each side of the polygon of an entrance surface of the optical integrator.

The present invention provides an exposure apparatus including a rotation shutter, and a control unit configured to control a rotational speed of the rotation shutter so as to match an exposure amount on a substrate with a target exposure amount in exposure processing for a shot region, based on first information indicating a relationship between a rotational speed of the rotation shutter and an exposure amount on the substrate when rotating the rotation shutter at the rotational speed without stopping rotation of the rotation shutter so as to make a shift from a first state in which the rotation shutter shields a light to a second state in which the rotation shutter passes the light and then back to the first state, wherein the control unit updates the first information based on second information concerning a change in the illuminance of light.

An imaging apparatus includes a housing loaded with a film on which a photosensitive surface is caused to be exposed to subject light to record a subject image, and a light source that is provided in the housing and is capable of emitting, to the photosensitive surface, effect light that exposes the photosensitive surface in a manner superimposed on the subject light to impart a visual effect to the subject image.

The invention relates to a photolithographic illuminator device including: a light beam source, a condenser (5), an optical homogenizing system (4) including at least one microlens array, said system being arranged upstream from the condenser, and a shutter (3) arranged at the object focal point of the optical homogenizing system, the illuminator being characterized in that same further comprises a network of aperture diaphragms (8) arranged in the Fourier transform plane of the shutter plane (3). The invention likewise relates to a photolithographic device including such an illuminator.

A surface position detection apparatus capable of highly precisely detecting the surface position of a surface to be detected without substantially being affected by relative positional displacement due to a polarization component occurring in a light flux having passed through a reflective surface. In the apparatus, a projection system has a projection side prism member having first reflective surfaces, and a light receiving system has a light receiving prism member having second reflective surfaces arranged in correspondence with the projection side prism member. The surface position detection apparatus further has a member for compensating relative positional displacement due to a polarization component of a light flux having passed through the first and second reflective surfaces.

An absorptive grid polarization element includes a transparent substrate, and a stripe-like grid provided on the transparent substrate. Each of a plurality of linear parts which form the grid absorbs more s polarization light than p polarization light, and thus achieves a polarizing action. The transparent substrate is made of quartz glass. Each of the linear parts includes a second layer formed on the transparent substrate, and a first layer formed on the second layer. The first layers are formed from amorphous titanium oxide. The second layers are formed from amorphous silicon.

An inspection apparatus may determine precise OV measurements of a target on a substrate using an optical pupil symmetrizer to reduce the inspection apparatus's sensitivity to asymmetry and non-uniformity of the illumination beam in the pupil plane. The inspection apparatus includes an illumination system that forms a symmetrical illumination pupil by (1) splitting an illumination beam into sub-beams, (2) directing the sub-beams along different optical branches, (3) inverting or rotating at least one of the sub-beams in two dimensions, and recombining the sub-beams along the illumination path to symmetrize the intensity distribution. The illumination system is further configured such that the first and second sub-beams have an optical path difference that is greater than a temporal coherence length of the at least one beam and less than a depth of focus in the pupil plane of the objective optical system.