A reticle enclosure includes a base including a first surface, a cover including a second surface and disposed on the base, wherein the base and the cover form an internal space therebetween to include a reticle, and a layer of elastomer or gelatinous material disposed on at least one of the first surface and the second surface, wherein the layer of elastomer or gelatinous material is disposed between the base and the cover and contacts either the base or the cover.

Provided is a method of manufacturing a deposition mask frame assembly, the method including placing and welding a support stick mask and a gap stick mask on a frame, and joining edges of a deposition stick mask with the frame by welding while the deposition stick mask is tensioned in a longitudinal direction of the X-axis direction and at the same time, adhesively tensioned in the Y-axis direction, thereby preventing wrinkles due to the tensioning of the deposition stick mask to manufacture a fine and high-quality deposition mask frame assembly.

Provided is a method of manufacturing a deposition mask frame assembly, the method including placing and welding a support stick mask and a gap stick mask on a frame, and joining edges of a deposition stick mask with the frame by welding while the deposition stick mask is tensioned in a longitudinal direction of the X-axis direction and at the same time, adhesively tensioned in the Y-axis direction, thereby preventing wrinkles due to the tensioning of the deposition stick mask to manufacture a fine and high-quality deposition mask frame assembly.

The inventive concept provides a mask treating apparatus. The mask treating apparatus includes a support unit configured to support and rotate a mask, the mask having a first pattern within a plurality of cells thereof and a second pattern outside regions of the plurality of cells; and a heating unit having a laser irradiator for irradiating a laser light to a specific region of the mask supported on the support unit, and a controller configured to control the support unit and the heating unit, and wherein the support unit includes: a support part for supporting the mask; and a moving stage part configured to move a position of the support part, and wherein the controller controls the moving stage part so a position of the mask supported on the support part is changed so the second pattern is positioned at the specific region.

The inventive concept provides a mask treating apparatus. The mask treating apparatus includes a support unit configured to support and rotate a mask, the mask having a first pattern within a plurality of cells thereof and a second pattern outside regions of the plurality of cells; and a heating unit having a laser irradiator for irradiating a laser light to a specific region of the mask supported on the support unit, and a controller configured to control the support unit and the heating unit, and wherein the support unit includes: a support part for supporting the mask; and a moving stage part configured to move a position of the support part, and wherein the controller controls the moving stage part so a position of the mask supported on the support part is changed so the second pattern is positioned at the specific region.

Provided is a quick-release valve including: a quick-release member having a collar detachably coupled to a bottom opening of a base; and a sleeve having a flow passage for allowing a gas to enter or exit a substrate container. The collar has a pair of ear portions extending outward therefrom along a diameter direction and a handle extending outward therefrom along a radius direction. The ear portions are at a height substantially different from the handle.

Provided is a quick-release valve including: a quick-release member having a collar detachably coupled to a bottom opening of a base; and a sleeve having a flow passage for allowing a gas to enter or exit a substrate container. The collar has a pair of ear portions extending outward therefrom along a diameter direction and a handle extending outward therefrom along a radius direction. The ear portions are at a height substantially different from the handle.

A method for manufacturing a membrane assembly for EUV lithography, the method including: providing a stack having a planar substrate and at least one membrane layer, wherein the planar substrate includes an inner region and a border region around the inner region; and selectively removing the inner region of the planar substrate. The membrane assembly includes: a membrane formed from the at least one membrane layer; and a border holding the membrane, the border formed from the border region of the planar substrate. The stack is provided with a mechanical protection material configured to mechanically protect the border region during the selectively removing the inner region of the planar substrate.

Embodiments of the present disclosure generally include apparatus and methods for removing adhesive residues from a surface of a lithography mask. In particular, the processing systems described herein provide for the delivery of a solvent to a discrete plurality of locations on the surface of the lithography mask to facilitate the removal of adhesive residue therefrom. In one embodiment, a method of processing a substrate includes positioning the substrate on a substrate support of a processing system, sealing individual ones of a plurality of cleaning units to a surface of the substrate at a corresponding plurality of locations, heating a cleaning fluid to a temperature between about 50° C. and about 150° C., flowing the cleaning fluid to, and thereafter, from, the plurality of cleaning units, and exposing the surface of the substrate to the cleaning fluid at the plurality of locations.

In a method of cleaning a photo mask, the photo mask is placed on a support such that a pattered surface faces down, and an adhesive sheet is applied to edges of a backside surface of the photo mask.