A photomask clamping device includes a clamping assembly, a frame body and a handle, where the clamping assembly is provided on the frame body, and is used to clamp a side of a photomask; a connecting portion is provided in the middle of one side of the frame body; the handle is rotatably connected to the connecting portion, and is provided with a first drive mechanism; and the first drive mechanism is connected to the connecting portion, and is used to drive the connecting portion to rotate. When it is necessary to deal with a problem on the surface of a photomask, the clamping assembly is used to clamp a side of the photomask, and the handle is held to take the photomask out of a container.

A photomask clamping device includes a clamping assembly, a frame body and a handle, where the clamping assembly is provided on the frame body, and is used to clamp a side of a photomask; a connecting portion is provided in the middle of one side of the frame body; the handle is rotatably connected to the connecting portion, and is provided with a first drive mechanism; and the first drive mechanism is connected to the connecting portion, and is used to drive the connecting portion to rotate. When it is necessary to deal with a problem on the surface of a photomask, the clamping assembly is used to clamp a side of the photomask, and the handle is held to take the photomask out of a container.

A method for preventing photomask contamination includes securing a photomask on a bottom surface of an electrostatic chuck; generating a first voltage at a peripheral area of the bottom surface of the electrostatic chuck to attract a particle onto the peripheral area of the bottom surface of the electrostatic chuck, wherein the peripheral area of the bottom surface of the electrostatic chuck is not directly above the photomask; after generating the first voltage, generating a second voltage at the peripheral area of the bottom surface of the electrostatic chuck to repulse the particle, wherein the first voltage and the second voltage have opposite electrical properties; and generating a third voltage, by using a collecting plate, near a sidewall of the photomask to attract the repulsed particle.

A method for preventing photomask contamination includes securing a photomask on a bottom surface of an electrostatic chuck; generating a first voltage at a peripheral area of the bottom surface of the electrostatic chuck to attract a particle onto the peripheral area of the bottom surface of the electrostatic chuck, wherein the peripheral area of the bottom surface of the electrostatic chuck is not directly above the photomask; after generating the first voltage, generating a second voltage at the peripheral area of the bottom surface of the electrostatic chuck to repulse the particle, wherein the first voltage and the second voltage have opposite electrical properties; and generating a third voltage, by using a collecting plate, near a sidewall of the photomask to attract the repulsed particle.

A reticle carrier described herein is configured to quickly discharge the residual charge on a reticle so as to reduce, minimize, and/or prevent particles in the reticle carrier from being attracted to and/or transferred to the reticle. In particular, the reticle carrier may be configured to provide reduced capacitance between an inner baseplate of the reticle carrier and the reticle. The reduction in capacitance may reduce the resistance-capacitance (RC) time constant for discharging the residual charge on the reticle, which may increase the discharge speed for discharging the residual charge through support pins of the reticle carrier. The increase in discharge speed may reduce the likelihood that an electrostatic force in the reticle carrier may attract particles in the reticle carrier to the reticle. This may reduce pattern defects transferred to substrates that are patterned using the reticle, may increase semiconductor device manufacturing quality and yield, and may reduce scrap and rework of semiconductor devices and/or wafers.

Reticle pod inner pods include a cover and a baseplate, with the cover and the baseplate contacting one another at contact surfaces. The contact surfaces of the cover and the baseplate each include different materials. The different materials can each be metals. The different materials can differ in hardness. The difference in hardness can be 50 Brinell hardness or greater. One of the different materials can be a ductile material, having elongation at break of 25% or greater. Methods can include providing the cover and the baseplate each including a first material, and providing a second, different material at the contact surfaces of one of the cover or the baseplate.

Reticle pod inner pods include a cover and a baseplate, with the cover and the baseplate contacting one another at contact surfaces. The contact surfaces of the cover and the baseplate each include different materials. The different materials can each be metals. The different materials can differ in hardness. The difference in hardness can be 50 Brinell hardness or greater. One of the different materials can be a ductile material, having elongation at break of 25% or greater. Methods can include providing the cover and the baseplate each including a first material, and providing a second, different material at the contact surfaces of one of the cover or the baseplate.

A storage container in which a uniform flow velocity of the purge gas can be achieved is provided with a plurality of stages of storage units each having an accommodating region to accommodate an article. A supply portion supplies a purge gas; a duct portion communicates with other duct portions of other storage units and serves as a flow path for the purge gas supplied from the supply portion; and an introducing portion communicably connects the duct portion with the accommodating region and introduces the purge gas to the accommodating region. In the flow path for the purge gas in the duct portion, a diffusion member is arranged.

A storage container in which a uniform flow velocity of the purge gas can be achieved is provided with a plurality of stages of storage units each having an accommodating region to accommodate an article. A supply portion supplies a purge gas; a duct portion communicates with other duct portions of other storage units and serves as a flow path for the purge gas supplied from the supply portion; and an introducing portion communicably connects the duct portion with the accommodating region and introduces the purge gas to the accommodating region. In the flow path for the purge gas in the duct portion, a diffusion member is arranged.

A reticle pod includes an outer pod, an inner pod cover and an inner base plate. A reticle is supported on the base and is contained within the environment created by the inner pod cover and the inner pod base. The inner pod cover can include a plurality of reticle retainers configured to contact a side wall of the reticle and limit movement of the reticle in a horizontal direction.