Method for manufacturing a master pattern for a mold for a horology component, wherein the method includes manufacturing a first structure from a first photosensitive resin comprising at least one layer of photosensitive resin comprising a first pattern obtained by polymerizing the first photosensitive resin by irradiation through at least one mask, then developing the first photosensitive resin; and transforming the first structure into a second structure by structuring at least one surface of the first structure by the addition of a second photosensitive resin to the at least one surface.

A method of producing a relief image or mold from a liquid photopolymer resin, said method comprising the steps of: a) placing an image film onto an exposure glass; b) placing a cover film over the image film and drawing a vacuum c) placing substrate material on a bottom glass d) casting a liquid photopolymer resin layer onto the substrate material; d) laminating a flexible polyester sheet onto a backside of the liquid photopolymer resin layer as the liquid photopolymer resin layer is being cast onto the substrate material; and e) exposing the liquid photopolymer resin layer through the image film to selectively crosslink and cure the photopolymerizable resin layer and form a cured relief image, wherein said depth of the cured relief image is less than the height of the cast liquid photopolymerizable resin.

A polymer, an organic layer composition, and a method of forming patterns, the polymer including a structural unit represented by Chemical Formula 1 or Chemical Formula 2:

##STR00001##

The present invention provides a manufacture method of a nano-imprint lithography template and a nano-imprint lithography template. In the manufacture method of the nano-imprint lithography template, first, the soft membrane having a nanowire gate structure is wrapped on the outer circumferential surface of the cylindric hard roller to form the nanowire gate structure film layer to obtain the temporary roller. Then, the low melting point solder alloy is utilized to form the structure hardened layer on the outer circumferential surface of the temporary roller along the nanowire gate structure of the nanowire gate structure film layer to obtain the nano-imprint lithography template having the nanowire gate structure. By forming the hard structure hardened layer on the soft nanowire gate structure for hardening the soft nanowire gate structure, the issue that the hardness of the micro structure material itself in the imprint procedure is not enough is overcame.

Multiple patterning approaches using radiation sensitive organometallic materials is described. In particular, multiple patterning approaches can be used to provide distinct multiple patterns of organometallic material on a hardmask or other substrate through a sequential approach that leads to a final pattern. The multiple patterning approach may proceed via sequential lithography steps with multiple organometallic layers and may involve a hardbake freezing after development of each pattern. Use of an organometallic resist with dual tone properties to perform pattern cutting and multiple patterning of a single organometallic layer are described. Corresponding structures are also described.

The present invention provides a stretchable ACF, a method for manufacturing same, and an interfacial bonding member and a device comprising same. The stretchable ACF comprises: a polymer film; and conductive particles inserted into the polymer film and aligned therein, wherein the conductive particles are exposed to the outside of the upper and lower surfaces of the polymer film.

Methods of forming an array of patterns on a substrate are provided. A replication medium is coated onto a relief structure of a patterned template and solidified. Patterned templates with the replication medium are transferred to an array of sub-regions of a tiling region of a substrate, where heat and/or radiation can be applied to the replication medium. The patterned templates are then removed from the substrate to form a patterned surface structure on the substrate.

Methods for generating patterned nanoparticle assemblies in thin films of supramolecular nanocomposites are provided that allow control over microdomain morphology, periodicity, and orientation by tuning the assembly kinetics and pathways of the system. Directed self-assembly (DSA) of block copolymers (BCPs) with nanoparticles formed on lithographically-patterned templates produce patterned supramolecular nanocomposite films and patterns of nanoparticles. DSA may be used to guide the formation of concentric rings with radii spanning approximately 150 nm to 1150 nm and ring widths spanning about 30 nm to 60 nm, for example. When plasmonic nanoparticles are used, ring nanodevice arrays can be fabricated in one step, and the completed devices produce high-quality orbital angular momentum (OAM).

A structure stamp has a flexible stamp which has a microstructured or nanostructured stamp surface for embossing of an embossing structure which corresponds to the stamp surface on an embossing surface, and a frame for clamping the stamp. Moreover, the invention relates to a device for embossing an embossing pattern on an embossing surface with the following features: a stamp receiver for accommodating and moving a structure stamp, an embossing material receiver for accommodating and placing an embossing material opposite the structure stamp, and an embossing element drive for moving an embossing element along the structure stamp.

Method for manufacturing a horology component, including manufacturing (E1) a first structure (10) from a first photosensitive resin (31) having at least one layer of photosensitive resin having a first pattern obtained by polymerizing the first photosensitive resin by irradiation through at least one mask (4), then developing the first photosensitive resin; and transforming (E2) the first structure (10) into a second structure (1) by structuring at least one surface of the first structure by the addition of a second photosensitive resin (32) to the at least one surface, the second structure (1) being intended to at least partially form a manufacturing mold for the horology component.