The present disclosure provides a correction method of correcting, by an information processing apparatus, design data of a pattern of a mold to be used in an imprint process of forming a pattern in an imprint material on a substrate, comprising: obtaining an actual volume of a concave pattern element formed in a test mold; determining a correction value for correcting a difference between the actual volume and a design volume of the pattern element by a dimension of the pattern element in a plane direction parallel to a surface of the test mold; and correcting the design data based on the correction value.

Method of manufacturing a nanoimprint lithography replica includes depositing a first resist layer over a substrate and selectively exposing the first resist layer to a first actinic radiation. The selectively exposed first resist layer is developed to form a pattern in the first resist layer. The pattern in the first resist layer is extended into the substrate to form a mold in the substrate. The first resist layer is removed from the substrate. A second resist layer deposited over a replica blank. The second resist layer is contacted with the mold. The second resist layer is exposed to a second actinic radiation. The mold and the exposed second resist layer are separated. A pattern is formed in the exposed second resist layer. The pattern in the second resist layer is extended into the replica blank, and the second resist layer is removed from the replica blank to form a replica.

A method includes providing a coating (208) over a first surface (202) of a substrate (204) and over a metasurface (200) on the first surface of the substrate; and imprinting the coating to cause a surface of the coating to have a predetermined characteristic. A device includes a substrate; a metasurface on a first surface of the substrate; and a coating on the metasurface and on the first surface of the substrate, a surface of the coating defining a functional structure.

A microfluidic device for particle analysis, such as immunophenotyping, includes a plurality of microfluidic channels for the passage of a particle-laden fluid flow, a plurality of dedicated impedance sensors for generating impedance signals relative to each microfluidic sensor. The impedance sensors are CODES Coulter sensors, each having a distinct coded sequence for generating mutually orthogonal signals. The system uses a multi-frequency excitation signal for driving the Coulter sensors, such that the Coulter sensors generate multi-frequency impedance signals. The system outputs the multi-frequency signals of the plurality of impedance sensors as a single multi-frequency multiplexed signal, which is subsequently separated into a plurality of single-frequency multiplexed signals, which are then demodulated into single-frequency component signals corresponding to each of the Coulter sensors.