A method of replicating master molds used in the fabrication of microsystems having micron to millimeter sized features. Master molds are replicated using a polymer sheet, which is heated and melted onto an elastomeric mold fabricated from the master mold. The copy molds accurately replicate the geometries of the master mold, such as high aspect ratio features, microposts, and channels with slender sidewalls. The polymer sheet encases the elastomeric mold without the application of an external force, permitting copying without deformation of the features.

Embodiments of the microfluidic device may include of an array of microfluidic cell capture chambers, each functionalized with a different antibody to recognize a target antigen, and a network of code-multiplexed Coulter counters placed at strategic nodes across the device to quantify the fraction of cell population captured in each microfluidic chamber. For example, an apparatus may comprise a fluid inlet port divided into a plurality of separate microfluidic paths, each separate microfluidic path configured to transport a plurality of cells, the plurality of separate microfluidic paths, each comprising a plurality of microfluidic cell capture chambers, an outlet port to discharge a merged output of cells from the plurality of microfluidic cell capture chambers, and a plurality of sensors to detect cells passing into or out of a microfluidic cell capture chamber.

Example embodiments provide methods, systems, apparatuses, computer program products and/or the like for fabrication of three-level structures. In various embodiments, the three-level structures are at least part of photonic structures or elements. For example, a three-level structure may be part of grating coupler or other photonic element. In various embodiments, three-level structures are structures with three levels of material thickness: no material, thin material, and thick material. In various embodiments, the fabrication method described herein is deterministic and easily controllable.

The present invention provides a stretchable ACF, a method for manufacturing same, and an interfacial bonding member and a device comprising same. The stretchable ACF comprises: a polymer film; and conductive particles inserted into the polymer film and aligned therein, wherein the conductive particles are exposed to the outside of the upper and lower surfaces of the polymer film.

An appearance decoration member includes a texture surface. The texture surface is divided into multiple partition units arranged in multiple rows and multiple columns, and each of the multiple partition units has a sub-texture. An included angle of the sub-texture relative to a row direction is defined as a texture angle, where texture angles of two adjacent sub-textures in a first row are different, and texture angles of sub-textures in each of the multiple columns form an arithmetic progression along a column direction.

A resist composition, a dry film resist, a method for producing a dry film resist, a method for forming a resist pattern, and a method for producing a plated object are described. The resist composition includes a resin (A1) having a group represented by formula (1), a resin (A2) including a structural unit represented by formula (a3), and an acid generator (B1).

##STR00001##

Embodiments of the microfluidic device may include of an array of microfluidic cell capture chambers, each functionalized with a different antibody to recognize a target antigen, and a network of code-multiplexed Coulter counters placed at strategic nodes across the device to quantify the fraction of cell population captured in each microfluidic chamber. For example, an apparatus may comprise a fluid inlet port divided into a plurality of separate microfluidic paths, each separate microfluidic path configured to transport a plurality of cells, the plurality of separate microfluidic paths, each comprising a plurality of microfluidic cell capture chambers, an outlet port to discharge a merged output of cells from the plurality of microfluidic cell capture chambers, and a plurality of sensors to detect cells passing into or out of a microfluidic cell capture chamber.

Method for manufacturing by photolithography a resin multilayer mould (10; 10) including a cavity (11; 11) provided with an inlet (110; 110) for the manufacture of a horological component, including producing at least two resin layers of the mould (10; 10), by producing a first resin layer (C10; C20) having a first through-opening or open opening (111; 111) oriented in the direction of the inlet (110; 110) of the mould to delimit a first volume of the cavity (11; 11) of the mould (10, 10), and producing a second resin layer (C20; C30) including a rigid film and having a second through-opening (112; 112) that delimits a second volume of the cavity (11; 11) of the mould (10, 10) and is at least partly superposed on the first through-opening or open opening (111; 111), the second resin layer partly covering that same first through-opening or open opening (111; 111).

A resist composition contains a resin including a structural unit having an acid-labile group, a photosensitive agent, and an acid generator. The acid generator contains a compound in which a maximum molar absorption coefficient in the wavelength range of 355 to 375 nm is 6,000 (L/(mol.Math.cm)) or less The content of the photosensitive agent is 10% by mass or less in the solid content of the resist composition. When a film is formed from the resist composition with the film thickness used, a minimum transmittance of radiation of the film in the wavelength range of 355 to 375 nm is 23% or more. Also described are a method for producing a resist pattern, and a method for producing a plated molded article.

Multiple patterning approaches using radiation sensitive organometallic materials is described. In particular, multiple patterning approaches can be used to provide distinct multiple patterns of organometallic material on a hardmask or other substrate through a sequential approach that leads to a final pattern. The multiple patterning approach may proceed via sequential lithography steps with multiple organometallic layers and may involve a hardbake freezing after development of each pattern. Use of an organometallic resist with dual tone properties to perform pattern cutting and multiple patterning of a single organometallic layer are described. Corresponding structures are also described.