G03F7/12

Stencil for forming surface structures by etching
09962925 · 2018-05-08 · ·

The invention relates to a stencil for forming surfaces structures by etching, a method for producing a stencil for forming surfaces structures by etching, a printing machine for producing a stencil for forming surface structures by etching, and a method for forming surface structures by etching. A known stencil for forming surface structures by etching includes an etching-resistant stencil layer. The stencil layer can be transferred to the surface to be structured, and the stencil layer can after an etching treatment be partially removed from the surface to be structured, and is elaborated and developed in that the stencil layer includes at least two partial regions and that at least two partial regions can be removed independently of one another from the surface to be structured.

High-Resolution Patterning of Graphene by Screen and Gravure Printing for Highly Flexible Printed Electronics

Graphene ink compositions as can be utilized with gravure and screen printing processes, to provide flexible electronic components with high-resolution printed graphene circuitry.

High-Resolution Patterning of Graphene by Screen and Gravure Printing for Highly Flexible Printed Electronics

Graphene ink compositions as can be utilized with gravure and screen printing processes, to provide flexible electronic components with high-resolution printed graphene circuitry.

PRECISION SCREEN PRINTING WITH SUB-MICRON UNIFORMITY OF METALLIZATION MATERIALS ON GREEN SHEET CERAMIC

Precision screen printing is described that is capable of sub-micron uniformity of the metallization materials that are printed on green sheet ceramic. In some examples, puck is formed with electrical traces by screen printing a paste that contains metal on a ceramic green sheet in a pattern of electrical traces and processing the printed green sheet to form a puck of a workpiece carrier. In some example, the printing includes applying a squeegee of a screen printer to the printed green sheet in a squeegeeing direction while the green sheet is on a printer bed of the screen printer. The method further includes mapping the printer bed at multiple locations along the squeegeeing direction, identifying non-uniformities in the printer bed mapping, and modifying a printer controller of the screen printer to compensate for mapped non-uniformities in the printer bed.

Self-Adhesive Graphite Film Positive
20240427249 · 2024-12-26 ·

Graphite images may be translated into printable forms by use of a Self-Adhesive Graphite Film Positive. Graphite is used to block the passage of light wave energy. In the case of silk screen print making a self-adhesive backing member is used in conjunction with the Graphite Positive to prevent the backscatter of light.

Self-Adhesive Graphite Film Positive
20240427249 · 2024-12-26 ·

Graphite images may be translated into printable forms by use of a Self-Adhesive Graphite Film Positive. Graphite is used to block the passage of light wave energy. In the case of silk screen print making a self-adhesive backing member is used in conjunction with the Graphite Positive to prevent the backscatter of light.

AUTOMATIC FILM WASHOUT SYSTEM
20170254080 · 2017-09-07 ·

Provided is an automatic film washout device includes a housing defining a rinsing chamber and a drain in fluid communication with the rinsing chamber. A drum is rotatably coupled to the housing and is configured to be engageable with the photosensitive material for washout thereof. A booster pump is operatively coupled to the housing and includes a pump inlet and a pump outlet, the pump inlet being fluidly connectable to the pressurized fluid source to receive fluid therefrom at an inlet pressure, the pump being configured to elevate the pressure of the fluid exiting the pump via the pump outlet. A plurality of nozzles are coupled to the housing and in fluid communication with the pump to receive fluid therefrom. The plurality of nozzles are configured to direct fluid into the rinsing chamber for washout of the photosensitive material.

Printing form precursor having elastomeric cap layer and a method of preparing a printing form from the precursor

The invention pertains to a printing form precursor, a method of preparing a printing form from the precursor, and a process of preparing the precursor. The printing form precursor includes a photopolymerizable layer, an elastomeric layer having at least an elastomeric binder and particulate, and an actinic radiation opaque material on, adjacent, or disposed above the elastomeric layer opposite the photopolymerizable layer. The particulate is selected from specific material particles having an average diameter from 1 to 10 micron and a refractive index that is within 0.04 units of an index of refraction of the composition forming the elastomeric layer.

Printing form precursor having elastomeric cap layer and a method of preparing a printing form from the precursor

The invention pertains to a printing form precursor, a method of preparing a printing form from the precursor, and a process of preparing the precursor. The printing form precursor includes a photopolymerizable layer, an elastomeric layer having at least an elastomeric binder and particulate, and an actinic radiation opaque material on, adjacent, or disposed above the elastomeric layer opposite the photopolymerizable layer. The particulate is selected from specific material particles having an average diameter from 1 to 10 micron and a refractive index that is within 0.04 units of an index of refraction of the composition forming the elastomeric layer.

ULTRATHIN FILM SHADOW MASK FOR LITHOGRAPHY AND LITHOGRAPHY METHOD USING THE SAME
20250044698 · 2025-02-06 ·

Provided are a new ultrathin film silicon shadow mask which is flexible, is reusable, and can be precisely aligned and manipulated through transfer printing, and a lithography method using the same. A thin thickness of a silicon shadow mask may intrinsically form a pattern having an enhanced resolution in a plane and a non-planar surface. Further, the silicon shadow mask may be formed on a substrate by metal deposition in addition to etching in a multi-layer configuration by a transfer printing technology based alignment method. Through such a method, a material in which patterning is impossible may be patterned through photolithography.