A photosensitive resin composition includes a polymer compound having a structure represented by Formula 1 as a component A; and an infrared absorbent as a component B. A planographic printing plate precursor includes a support; a polymer compound, which has a structure represented by Formula 1, as a component A on the support; and a recording layer, which contains an infrared absorbent, as a component B on the support. In Formula 1, R.sup.1 represents an (x+2) valent aromatic hydrocarbon ring group, and x represents an integer of 1 to 4. ##STR00001##

A photosensitive resin composition includes a polymer compound having a structure represented by Formula 1 as a component A; and an infrared absorbent as a component B. A planographic printing plate precursor includes a support; a polymer compound, which has a structure represented by Formula 1, as a component A on the support; and a recording layer, which contains an infrared absorbent, as a component B on the support. In Formula 1, R.sup.1 represents an (x+2) valent aromatic hydrocarbon ring group, and x represents an integer of 1 to 4. ##STR00001##

The present invention discloses an apparatus for making direct writing screen plate and a using method thereof. The present invention provides a direct writing screen plate making apparatus and a focal plane control method. A Z-axis controller is used to pre-establish a mapping relation between the focal plane position of the scanning band to be scanned in the next step and the scanning platform position signal. During the next step of scanning, the position of the optical lens is adjusted according to the mapping relation, thus avoiding the problem of inconsistency between the calculated focal plane and the actual focal plane caused by the position deviation between the assembled displacement sensor and the optical lens. The present invention also provides a method for exposing a region of interest and a method for compensating the on-line real-time light uniformity.

The present disclosure provides a mask plate and fabrication method thereof. The mask plate includes a substrate, having a first surface and a second surface, and containing a plurality of openings. The mask plate also includes a mask pattern layer, formed on the first surface of the substrate and including a plurality of pattern regions and a shield region surrounding the plurality of pattern regions. Each pattern region includes at least one through hole, and each opening formed in the substrate exposes a pattern region and the at least one through hole in the pattern region. The mask plate further includes a top substrate layer, formed on the mask pattern layer. The top substrate layer contains a plurality of grooves passing through the top substrate layer, and each groove exposes a pattern region in the mask pattern layer and exposes the at least one through hole in the pattern region.

The present invention discloses a method of manufacturing a shadow mask, wherein hybrid processing is used to form a mask pattern on the shadow mask, the method includes: forming a wet-etched pattern by performing wet etching from above a base; and forming a laser-processed pattern that continues from the wet-etched pattern, by performing laser processing from above the base or from below the base on which the wet-etched pattern is formed. The present invention uses hybrid processing including wet etching and laser processing for manufacturing a shadow mask. The method has an effect on solving the productivity degradation of the conventional laser processing and provides a shadow mask with high quality using wet etching.

The present invention discloses a method of manufacturing a shadow mask, wherein hybrid processing is used to form a mask pattern on the shadow mask, the method includes: forming a wet-etched pattern by performing wet etching from above a base; and forming a laser-processed pattern that continues from the wet-etched pattern, by performing laser processing from above the base or from below the base on which the wet-etched pattern is formed. The present invention uses hybrid processing including wet etching and laser processing for manufacturing a shadow mask. The method has an effect on solving the productivity degradation of the conventional laser processing and provides a shadow mask with high quality using wet etching.

Precision screen printing is described that is capable of sub-micron uniformity of the metallization materials that are printed on green sheet ceramic. In some examples, puck is formed with electrical traces by screen printing a paste that contains metal on a ceramic green sheet in a pattern of electrical traces and processing the printed green sheet to form a puck of a workpiece carrier. In some example, the printing includes applying a squeegee of a screen printer to the printed green sheet in a squeegeeing direction while the green sheet is on a printer bed of the screen printer. The method further includes mapping the printer bed at multiple locations along the squeegeeing direction, identifying non-uniformities in the printer bed mapping, and modifying a printer controller of the screen printer to compensate for mapped non-uniformities in the printer bed.

Precision screen printing is described that is capable of sub-micron uniformity of the metallization materials that are printed on green sheet ceramic. In some examples, puck is formed with electrical traces by screen printing a paste that contains metal on a ceramic green sheet in a pattern of electrical traces and processing the printed green sheet to form a puck of a workpiece carrier. In some example, the printing includes applying a squeegee of a screen printer to the printed green sheet in a squeegeeing direction while the green sheet is on a printer bed of the screen printer. The method further includes mapping the printer bed at multiple locations along the squeegeeing direction, identifying non-uniformities in the printer bed mapping, and modifying a printer controller of the screen printer to compensate for mapped non-uniformities in the printer bed.

A polymer mask comprises carrier substrate and mask, and sacrificial layer position between mask and carrier substrate. The mask comprises polymer membrane layer and plurality of holes pass through and located on polymer membrane layer, and polymer membrane layer doping magnetic-nanoparticles. The disclosure further provides a manufacture method of polymer mask, comprising steps of. S1, processing sacrificial layer on carrier substrate. S2, coating polymer precursor on sacrificial layer and cured to form original polymer membrane. S3, positioning photo mask on original polymer membrane, and ablating a non-photo mask shielding region on original polymer membrane to form holes by laser scanning to obtain polymer mask precursor. S4, washing and drying polymer mask precursor, and weakening interaction between carrier substrate and mask for obtain polymer mask. The disclosure further provides the polymer mask described above applied to manufacture OLED.

A system or machine is disclosed which takes pre-stretched emulsion coated screens, digitally prints thereon and exposes them before further processing and use in a screen printing machine.