A mask for thin film deposition of a display apparatus having both end portions coupleable to a frame in a state of tension in a lengthwise direction thereof, the mask including: a first portion having a first thickness and a plurality of pattern holes through which a deposition material may pass; a second portion comprising a welding portion having a second thickness configured to be coupled to a frame; and a third portion connecting the first portion and the third portion, wherein the first thickness is less than the second thickness, and the third portion includes an inclined surface connecting the first portion and the second portion.

A method of manufacturing a mask includes attaching a first mask base substrate and a second mask base substrate to opposite sides of an adhesive layer, forming a photoresist layer on the first and second mask base substrates, exposing and developing the photoresist layer to remove the photoresist layer on effective area at centers of surfaces of the first and second mask base substrates such that the first photoresist layer remains on non-effective areas at edges of surfaces of the first mask base substrate and the second mask base substrate, etching the effective area to form a stepped groove on the first and second mask base substrates, separating the first and second mask base substrates from the adhesive layer, and forming a pattern hole in the effective area of first and second mask base substrates, each with the first stepped groove thereon.

The present disclosure in some embodiments provides a mask plate, including: a metal mask plate body provided with a plurality of first openings; and an insulation film arranged on the metal mask plate body and provided with a plurality of second openings. An orthogonal projection of at least one second opening in the plurality of second openings onto the metal mask plate body falls within the corresponding first opening or first openings.

The invention relates to a method for generative production of relief printing plates, wherein a support with a polymeric substrate layer and a laser-ablatable mask layer is provided, the polymeric substrate layer containing a first binder. A mask with openings corresponding to pixels is produced by imagewise laser ablation of the mask layer. A liquid containing a reactive monomer is then applied over the surface of the mask-covered polymeric substrate layer, and the liquid or the reactive monomer diffuses through the openings of the mask into the polymeric substrate layer for a defined exposure time so as to form a relief. The excess liquid or the excess monomer and optionally the mask are removed from the surface, and the resulting relief is fixed by crosslinking.

The invention relates to a method for generative production of relief printing plates, wherein a support with a polymeric substrate layer and a laser-ablatable mask layer is provided, the polymeric substrate layer containing a first binder. A mask with openings corresponding to pixels is produced by imagewise laser ablation of the mask layer. A liquid containing a reactive monomer is then applied over the surface of the mask-covered polymeric substrate layer, and the liquid or the reactive monomer diffuses through the openings of the mask into the polymeric substrate layer for a defined exposure time so as to form a relief. The excess liquid or the excess monomer and optionally the mask are removed from the surface, and the resulting relief is fixed by crosslinking.

A mask and a fabrication method thereof are provided. The mask includes: a frame, which includes a hollow portion and a border surrounding the hollow portion; an opening plate, which is provided on the frame and includes an opening and a body surrounding the opening, the opening corresponding to the hollow portion, and the body being connected with the border; and a pattern plate, which is provided on the opening plate and includes a pattern portion and a non-pattern portion positioned in a periphery of the pattern portion, the pattern portion corresponding to the opening, the non-pattern portion being connected with the body of the opening plate, and the non-pattern portion and the frame being separated from each other at a position of the border.

The present invention discloses a method of manufacturing a shadow mask, wherein hybrid processing is used to form a mask pattern on the shadow mask, the method includes: forming a wet-etched pattern by performing wet etching from above a base; and forming a laser-processed pattern that continues from the wet-etched pattern, by performing laser processing from above the base or from below the base on which the wet-etched pattern is formed. The present invention uses hybrid processing including wet etching and laser processing for manufacturing a shadow mask. The method has an effect on solving the productivity degradation of the conventional laser processing and provides a shadow mask with high quality using wet etching.

A photosensitive resin composition includes a polymer compound having a structure represented by Formula 1 as a component A; and an infrared absorbent as a component B. A planographic printing plate precursor includes a support; a polymer compound, which has a structure represented by Formula 1, as a component A on the support; and a recording layer, which contains an infrared absorbent, as a component B on the support. In Formula 1, R.sup.1 represents an (x+2) valent aromatic hydrocarbon ring group, and x represents an integer of 1 to 4.

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A photosensitive resin composition includes a polymer compound having a structure represented by Formula 1 as a component A; and an infrared absorbent as a component B. A planographic printing plate precursor includes a support; a polymer compound, which has a structure represented by Formula 1, as a component A on the support; and a recording layer, which contains an infrared absorbent, as a component B on the support. In Formula 1, R.sup.1 represents an (x+2) valent aromatic hydrocarbon ring group, and x represents an integer of 1 to 4.

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The invention relates to a stencil for forming surfaces structures by etching, a method for producing a stencil for forming surfaces structures by etching, a printing machine for producing a stencil for forming surface structures by etching, and a method for forming surface structures by etching. A known stencil for forming surface structures by etching includes an etching-resistant stencil layer. The stencil layer can be transferred to the surface to be structured, and the stencil layer can after an etching treatment be partially removed from the surface to be structured, and is elaborated and developed in that the stencil layer includes at least two partial regions and that at least two partial regions can be removed independently of one another from the surface to be structured.