A method for cancer diagnosis is disclosed. The method includes forming a plurality of cultured cells on an electrochemical biosensor placing the electrochemical biosensor in a medium solution comprising a cell culture solution of a plurality of biological cells, measuring a first electrochemical response from the electrochemical biosensor with the plurality of cultured cells, forming a plurality of stimulated cells on the electrochemical biosensor by ultrasonically stimulating of the plurality of cultured cells, measuring a second electrochemical response from the electrochemical biosensor with the plurality of stimulated cells, and detecting presence of cancer cells responsive to a difference between the first electrochemical response and the second electrochemical response being less than a threshold. Where, the first electrochemical response includes an electrochemical response of the plurality of cultured cells and the second electrochemical response includes an electrochemical response of the plurality of stimulated cells.

A substrate treatment apparatus for applying a coating solution to a front surface of a substrate and developing an exposed coating film on the front surface of the substrate, includes a film forming unit configured to form a friction reducing film on a rear surface of the substrate before exposure processing, the friction reducing film reducing friction between the rear surface of the substrate and a holding surface for holding the rear surface of the substrate in the exposure processing.

A lithographically fabricated electrode comprises a continuous metal film; and a discontinuous metal film. The discontinuous metal film has a first edge proximal to the continuous metal film, and a second edge distal the continuous metal film.

A super-resolution system for nano-patterning is disclosed, comprising an exposure head that enables a super-resolution patterning exposures. The super-resolution exposures are carried out using electromagnetic radiation and plasmonic structures, and in some embodiments, plasmonic structures having specially designed super-resolution apertures, of which the “bow-tie” and “C-aperture” are examples. These apertures create small but bright images in the near-field transmission pattern. A writing head comprising one or more of these apertures is held in close proximity to a medium for patterning. In some embodiments, a data processing system is provided to re-interpret the data to be patterned into a set of modulation signals used to drive the multiple individual channels and multiple exposures, and a detection means is provided to verify the data as written.

A device for varyingly irradiating by means of ray shaping is described. Furthermore, a method of manufacturing a structure made of a curable material by means of molding is described. In a first step of the method, a molding tool is arranged above a surface such that the curable material abuts on the surface and a molding surface, facing the surface, of the molding tool in a region between the molding tool and the surface and such that further curable material may continue to flow to the region. In a second step, the curable material is irradiated in the region in a locally varying manner such that the ray experiences ray shaping in an optical channel and such that the curable material cures at different speeds in a laterally varying manner.

A method of fabricating microstructures of polar elastomers includes coating a substrate with a dielectric material including a polar elastomer, coating the dielectric material with a photoresist, exposing the photoresist to ultraviolet (UV) light through a photomask to define a pattern on the photoresist, developing the photoresist to form the pattern on the photoresist, etching the dielectric material to transfer the pattern from the photoresist to the dielectric material, and removing the photoresist from the patterned dielectric material

A method for fabricating a thick crack-free dielectric film on a wafer for device fabrication is disclosed herein. A stress-release pattern is fabricated in an oxide layer of the wafer, which surrounds a number of device regions. The stress-release pattern comprises a plurality of recessions, which are spaced periodically along at least one direction. The plurality of recessions interrupt the continuous film during the dielectric film deposition, to prevent cracks from forming in the dielectric film and propagating into the device regions. Such that, a thick crack-free dielectric film can be achieved in the device regions, which are formed by patterning the dielectric layer. Furthermore, conditions of the dielectric film deposition process can be tuned to ensure quality of the deposited dielectric film. Still further, a plurality of deposition runs may be performed to deposit the thick crack-free dielectric film.

Systems and methods for imprinting formable material on a substrate with a template. Illuminate the formable material with a gelling radiation distribution pattern. The gelling radiation distribution pattern has a gelling dosage that that varies from a minimum gelling dosage at each of a plurality of corners of a boundary edge to a peak gelling dosage at a center of each of the boundary edges.

Light reflection from a metal mesh touch sensor is reduced or prevented by encasing the metal lines with a passivation coating and including non-reflective nanoparticles in the patterning photoresist. The photoresist is mixed with catalytic nanoparticles wherein the nanoparticles are formed to minimize light reflection. The nanoparticles may be carbon coated metallic particles, or uncoated palladium nanoparticles. Also, a standoff photoresist layer may be included between the substrate and the photoresist composition to prevent reflection from the edges of the metallic lines.

The present invention concerns an optical system for spatiotemporally shaping the wavefront of the electric field of a light beam (1) to be projected into a target volume (5), where the propagation axis is axis z, to create 3D patterned illumination in the target volume (5), comprising a pulsed laser source, configured to have an illumination pattern whose transversal surface at the target volume being superior to the diffraction limit of the optical system, at least one intermediate optical element (4) which is a dispersive grating for performing temporal focusing of the light beam (1), located, on the propagation axis (z), where an image of the illumination pattern is formed, for modulating the phase and/or the amplitude of the electric field of the light beam, and a second optical element (3) which is a spatiallight modulator for modulating the phase of the electric field of the input light beam, and for realizing spatiotemporal multiplexing to create 3D patterned illumination in the target volume (5) by replicating the illumination pattern, so as to have several replicated illumination patterns in the target volume (5), and controlling the position with transversal coordinates X, Y and axial coordinate Z of each replicated illumination pattern in the target volume (5).