Patent classifications
G05D16/024
SYSTEM AND METHOD FOR AUTOMATICALLY ENERGIZING PACKING MATERIAL WITH A PACKING LOADING ASSEMBLY
A pressure regulating system for use with a mechanical seal and stationary equipment for applying a substantially uniform force or load to a stacked set of packing elements. The force applied to the packing elements can be regulated or controlled in real time and in a remote manner. The mechanical seal includes an axially movable follower element that can be energized by pressurized fluid to move between a pre-loaded position where the follower element does not apply an axial load to the packing elements to a loaded position where the follower element applies the axial load to the packing elements.
Target opening degree estimator and pressure adjustment vacuum valve
A target opening degree estimator estimates a target opening degree estimation value as an opening degree of a valve element of a pressure adjustment vacuum valve when a pressure of a vacuum chamber connected to the pressure adjustment vacuum valve reaches a pressure adjustment target pressure based on a correlation between the opening degree of the valve element and the pressure of the vacuum chamber, a current opening degree, and a current pressure.
Vacuum electrically controlled proportional valve
A vacuum electrically controlled proportional valve includes a valve seat coupled to a guide seat. The guide seat is connected, at a top thereof, to a vacuum pressure electromagnetic valve, an atmospheric pressure electromagnetic valve, and a sensor. A main diaphragm is sandwich between the seat valve and the guide seat to define a vacuum pressure chamber. A pilot discharge straight rod that is provided with a vacuum valve gate assembly is fit to a center of the main diaphragm. A master channel through which a primary-side pressure and a secondary-side pressure flow is provided. A regulation channel is provided and controlled by the vacuum pressure electromagnetic valve and the atmospheric pressure electromagnetic valve. A pilot atmosphere channel is connected to a space under the main diaphragm. A first and a second vacuum destruction valve gates are provided for adjusting, in stage-wise manner, the level of vacuum pressure.
Inlet pressure compensation for a valve system
An inlet pressure valve regulation system to provide a regulated fluid flow includes a housing, first piston assembly, regulating valve, and inlet pressure conduit. The housing has an inlet at an inlet end which receives a pressurized fluid and an outlet at an outlet end which provides the regulated fluid flow. The piston assembly is arranged in the housing and has a first cavity and a control orifice to fluidly connect the inlet to the first cavity. The first piston assembly is configured to regulate the fluid flow. The regulating valve has a first valve chamber, a second valve chamber fluidly connected to a vent, a floating valve seat disposed between the first valve chamber and the second valve chamber, and a valve component. The floating valve seat includes a diaphragm and a seat having a passageway to fluidly connect the first valve chamber and the second valve chamber.
VACUUM VALVE AND VALVE CONTROL DEVICE
A vacuum valve for driving a valve body arranged facing a valve opening up and down relative to the valve opening to perform valve opening/closing operation, comprises: a first up-down driver configured to drive the valve body up and down with a first minimum drivable amount; and a second up-down driver configured to drive the valve body up and down with a second minimum drivable amount smaller than the first minimum drivable amount.
Adjustable deadband control system
Control systems include various combinations of pressure regulators, pilots, and pressure stabilizers to provide systems with adjustable deadbands for over pressure protection, adjustable deadbands for under pressure protection, adjustable deadbands for both over pressure and under pressure protection, pressure assisted closure for over pressure protection, pressure assisted closure for under pressure protection, pressure assisted closure for both over pressure and under pressure protection, or spring assisted closure for over pressure and under pressure protection.
Substrate Processing Apparatus and Method of Manufacturing Semiconductor Device
Described herein is a technique capable of substantially cancelling out a machine difference of a pressure control valve. According to one aspect of the technique of the present disclosure, there is provided a substrate processing apparatus including: a sensor detecting a valve opening degree; a first control circuit outputting a valve opening degree control signal based on a valve opening degree value detected by the sensor and a deviation between a pressure of the process chamber and a target vacuum pressure value; a second control circuit outputting an electropneumatic control signal based on the valve opening degree control signal; and a span adjustment circuit adjusting the first or second control circuit so that an upper limit value of the valve opening degree is set to a predetermined full opening degree less than a physically defined full opening degree.
Valve control device
A valve control device configured such that a pressure measurement value of a chamber, a target pressure value of the chamber, and an opening degree measurement value of the vacuum valve are input to the valve control device and configured to control an opening degree of the vacuum valve based on a deviation between the pressure measurement value and the target pressure value, comprises: a storage storing a correlation between the opening degree of the vacuum valve and a conductance of a system including the vacuum valve; and a correction gain setting section obtaining, based on the correlation, a change rate of the conductance in association with an opening degree change at the input opening degree measurement value, thereby setting an inverse of the change rate as a correction gain. The opening degree of the vacuum valve is controlled based on the deviation and the correction gain.
BYPASS AND PRESSURE ADJUSTMENT VALVE
A bypass valve, comprising: a main conduit (10), comprising a first section (11) and a second section (12); a mobile control shutter (21); a bypass conduit (30) which places the main conduit (10) in communication with a discharge opening; a control element (31), mobile between a closed position, at which it closes the bypass conduit (30), and an open position, at which it opens the bypass conduit; a throttle element (40), interposed between the first section (11) and the second section (12), structured to produce a load loss which depends on the fluid flow rate in transit along the main conduit (10).
The control element (31) is tubular-shaped and defines internally a section of the bypass conduit (30). The control element (31) is slidable along a housing (32) provided with a sealing seat (33).
A passageway (34) is predisposed between the control element (31) and the housing (32) which places the first section (11) in communication with the second section (12);
GAS SUPPLY REGULATOR
A gas supply regulation assembly includes at least one inlet capable of being in fluid communication with at least one gas bottle and an outlet capable of being in fluid communication with a gas-consuming appliance. The gas supply regulation assembly further includes a gas pressure detection device for detecting gas pressure in a chamber communicating with the outlet.