A method for producing a biofuel by continuous or discontinuous steam cracking of lignocellulosic biomass includes: —recording a digital model of the optimal steam cracking parameters as a function of the nature and the content of the contaminants; —introducing a biomass containing at least part of the contaminated biomass into the steam cracking reactor; —measuring at least once during the treatment the nature and content of the contaminants; and —controlling the adjustment of the steam cracking parameters as a function of the nature and the content of the measured contaminants and of the digital model.

A method for producing a biofuel by continuous or discontinuous steam cracking of lignocellulosic biomass, comprises: —recording a digital model of the optimal steam cracking parameters as a function of the typology of the plant constituents of the biomass; —supplying the steam cracking reactor with heterogeneous biomass; —measuring at least once during the treatment the typology of the plant constituents of the biomass; and —controlling the adjustment of the steam cracking parameters as a function of the typology of the plant constituents of the measured biomass and of the digital model.

A gas solution manufacturing device 1 includes a gas supply line 2 configured to supply a gas as a raw material of a gas solution, a liquid supply line 3 configured to supply a liquid as a raw material of the gas solution, a gas solution production unit 4 configured to mix the gas and the liquid together to produce the gas solution, a gas-liquid separation unit 5 configured to perform gas-liquid separation of the produced gas solution into a supplied liquid to be supplied to a use point and a discharged gas to be discharged through an exhaust port, and a gas dissolving unit 6 provided in the liquid supply line 4 and configured to dissolve the discharged gas resulting from the gas-liquid separation in the liquid. The gas dissolving unit 6 is configured with a hollow fiber membrane configured with a gas permeable membrane.

An apparatus and method of adjusting a plating solution are described. Suppressor is added to the plating solution until a comparison to reference data of an RDE potential taken at a first time during a constant current experiment indicates a threshold suppressor concentration is present. The amount of suppressor added to reach the threshold suppressor concentration is used to determine suppressor concentration of the solution. Another amount of suppressor is added to a new plating solution so that the new plating solution has a specific suppressor concentration. The RDE potential or slope of RDE potential change of the new plating concentration with the specific suppressor concentration taken at a second time during another constant current experiment is compared with the reference data to determine the leveler concentration. The suppressor and leveler concentrations of the original plating solution are adjusted before a semiconductor substrate is plated.

A method of controlling an output relay of a chemical controller is disclosed. The output relay is coupled to a pump configured to introduce at least one chemical into the aquatic application. The chemical controller controls the operation of the pump using the output relay. The method includes the step of utilizing a watchdog timer circuit to determine that a processor has failed to send a reset signal to the watchdog timer circuit before a timer of the watchdog timer circuit reaches zero. The method further includes the step of outputting a processor fault signal from the watchdog timer circuit.

A method of controlling an output relay of a chemical controller is disclosed. The output relay is coupled to a pump configured to introduce at least one chemical into the aquatic application. The chemical controller controls the operation of the pump using the output relay. The method includes the step of utilizing a watchdog timer circuit to determine that a processor has failed to send a reset signal to the watchdog timer circuit before a timer of the watchdog timer circuit reaches zero. The method further includes the step of outputting a processor fault signal from the watchdog timer circuit.

Semiconductor processing systems and methods are provided in which an amount or concentration of a chemical in a chemical mixture contained in a tank is automatically controlled based on a sensed properties of the chemical mixture. In some embodiments, a semiconductor processing system includes a processing tank that is configured to contain a chemical mixture. A chemical sensor is configured to sense one or more properties of the chemical mixture. The system further includes an electrically controllable valve that is configured to adjust an amount of the first chemical in the chemical mixture based on the sensed one or more properties of the chemical mixture.

Semiconductor processing systems and methods are provided in which an amount or concentration of a chemical in a chemical mixture contained in a tank is automatically controlled based on a sensed properties of the chemical mixture. In some embodiments, a semiconductor processing system includes a processing tank that is configured to contain a chemical mixture. A chemical sensor is configured to sense one or more properties of the chemical mixture. The system further includes an electrically controllable valve that is configured to adjust an amount of the first chemical in the chemical mixture based on the sensed one or more properties of the chemical mixture.

A chemical regulation system according to various embodiments of the present technology is configured to regulate the flow rate of a liquid and monitors the chemical composition of the liquid. The chemical regulation system may comprise various valves, fittings, and couplings configured to regulate the flow of the liquid through a production tank and into a chemical hopper to product a highly concentrated liquid/chemical solution that is provided to the production tank. The chemical regulation system may comprise a controller to electrically control various valves. The chemical regulation system may comprise a device for facilitating the flow of a liquid out of a production tank.

A chemical regulation system according to various embodiments of the present technology is configured to regulate the flow rate of a liquid and monitors the chemical composition of the liquid. The chemical regulation system may comprise various valves, fittings, and couplings configured to regulate the flow of the liquid through a production tank and into a chemical hopper to product a highly concentrated liquid/chemical solution that is provided to the production tank. The chemical regulation system may comprise a controller to electrically control various valves. The chemical regulation system may comprise a device for facilitating the flow of a liquid out of a production tank.