A memory device comprising a plurality of memory cells situated in a first cell field, multiple first bit lines, each respectively connected to multiple memory cells of the first cell field to enable access to the memory cells via the bit line, and multiple sense amplifier pairs which respectively comprise a first and a second sense amplifier. Each first bit line is assigned to a sense amplifier pair, each first bit line being connected to a respective first semiconductor switch element, through which the bit line is electroconductively connectible to and insulatable from the first sense amplifier of the sense amplifier pair, to which the bit line is assigned. Each first bit line is connected to a respective second semiconductor switch element, through which the bit line is electroconductively connectible to and insulatable from the second sense amplifier of the sense amplifier pair, to which the bit line is assigned.

A three-dimensional semiconductor memory device may include a peripheral circuit structure including transistors on a first substrate, and a cell array structure on the peripheral circuit structure, the cell array structure including: a first stack structure block comprising first stack structures arranged side by side in a first direction on a second substrate, a second stack structure block comprising second stack structures arranged side by side in the first direction on the second substrate, a separation structure disposed on the second substrate between the first stack structure block and the second stack structure block and comprising first mold layers and second mold layers, and a contact plug penetrating the separation structure. The cell array structure may include a first metal pad and the peripheral circuit structure may include a second metal pad. The first metal pad may be in contact with the second metal pad.

A three-dimensional semiconductor memory device may include a peripheral circuit structure including transistors on a first substrate, and a cell array structure on the peripheral circuit structure, the cell array structure including: a first stack structure block comprising first stack structures arranged side by side in a first direction on a second substrate, a second stack structure block comprising second stack structures arranged side by side in the first direction on the second substrate, a separation structure disposed on the second substrate between the first stack structure block and the second stack structure block and comprising first mold layers and second mold layers, and a contact plug penetrating the separation structure. The cell array structure may include a first metal pad and the peripheral circuit structure may include a second metal pad. The first metal pad may be in contact with the second metal pad.

Embodiments of three-dimensional (3D) memory devices having a shielding layer and methods for forming the 3D memory devices are disclosed. In an example, a method for forming a 3D memory device is disclosed. A peripheral device is formed on a substrate. A first interconnect layer including a first plurality of interconnects is formed above the peripheral device. A shielding layer including a conduction region is formed above the first interconnect layer. A second interconnect layer including a second plurality of interconnects is formed above the shielding layer. The conduction region of the shielding layer covers an area of the first and second plurality of interconnects in the first and second interconnect layers. A plurality of memory strings each extending vertically above the second interconnect layer are formed.

A semiconductor storage device includes a first wiring, a second wiring, an insulating portion, and a resistance changing film. The first wiring extends in a first direction. The second wiring extends in a second direction intersecting the first direction, and is provided at a location different from that of the first wiring in a third direction intersecting the first direction and the second direction. The insulating portion is provided between the first wiring and the second wiring in the third direction. The resistance changing film is provided between the first wiring and the second wiring in the third direction, is adjacent to the insulating film from a first side and a second side which is opposite to the first side in the first direction, and the resistance changing film being smaller than the second wiring in the first direction.

A semiconductor storage device includes a first wiring, a second wiring, an insulating portion, and a resistance changing film. The first wiring extends in a first direction. The second wiring extends in a second direction intersecting the first direction, and is provided at a location different from that of the first wiring in a third direction intersecting the first direction and the second direction. The insulating portion is provided between the first wiring and the second wiring in the third direction. The resistance changing film is provided between the first wiring and the second wiring in the third direction, is adjacent to the insulating film from a first side and a second side which is opposite to the first side in the first direction, and the resistance changing film being smaller than the second wiring in the first direction.

In certain aspects, a memory device includes a first memory string including a first drain, a first drain select gate (DSG) transistor, first memory cells, and a first drain dummy transistor between the first drain and the first DSG transistor. The memory device also includes a first bit line coupled to the first drain, a first drain dummy line coupled to the first drain dummy transistor, a first DSG line coupled to the first DSG transistor, word lines respectively coupled to the first memory cells, and a peripheral circuit configured to perform a program operation on a target memory cell of the first memory cells coupled to a selected word line of the word lines. To perform the program operation, the peripheral circuit includes a bit line driver coupled to the first bit line and configured to apply a first bit line voltage to select the first bit line, and a word line driver coupled to the first drain dummy line and the first DSG line and configured to apply a DSG voltage to the first DSG line to turn on the first DSG transistor, and apply a drain dummy line voltage to the first drain dummy line to turn on the first drain dummy transistor. The drain dummy line voltage is greater than the DSG voltage.

The present disclosure relates to circuits, systems, and methods of operation for a memory device. In an example, a memory device includes a memory array including a plurality of memory cells, each memory cell having an impedance that varies in accordance with a respective data value stored therein; and a tracking memory cell having an impedance based on a tracking data value stored therein; and a read circuit coupled to the memory array, the read circuit configured to determine an impedance of a selected memory cells with respect to the impedance of the tracking memory cell; read a data value stored within the selected memory cell based upon a voltage change of a signal node voltage corresponding to the impedance of the selected memory cell.

The present disclosure provides a method for manufacturing a semiconductor device and a semiconductor device. The method for manufacturing a semiconductor device includes: providing a substrate; forming a plurality of first structures extending in a first direction on the substrate; forming a sacrificial layer on sidewalls of the first structures; forming an outer spacer layer on a sidewall of the sacrificial layer; removing part of the outer spacer layer to obtain a patterned outer spacer layer that exposes part of the sacrificial layer; and removing the sacrificial layer to form air gaps between the patterned outer spacer layer and the first structures.

The present disclosure describes a patterning process for a strap region in a memory cell for the removal of material between polysilicon lines. The patterning process includes depositing a first hard mask layer in a divot formed on a top portion of a polysilicon layer interposed between a first polysilicon gate structure and a second polysilicon gate; depositing a second hard mask layer on the first hard mask layer. The patterning process also includes performing a first etch to remove the second hard mask layer and a portion of the second hard mask layer from the divot; performing a second etch to remove the second hard mask layer from the divot; and performing a third etch to remove the polysilicon layer not covered by the first and second hard mask layers to form a separation between the first polysilicon gate structure and the second polysilicon structure.