The object of the present invention is to provide a current source which is capable of suppressing an increase in circuit size and by which a highly accurate constant current extremely stable to manufacturing variations or temperature fluctuations can be obtained. A current source circuit is provided with a nonvolatile storage element having a control gate region and a source region and operating as a field-effect transistor, and is configured to output a current in a state where a bias is applied between the control gate region and the source region.

The present application discloses a serial flash memory, including a memory array, a row decoder, a column decoder, a control module, and an SPI interface, wherein the control module includes a row enable signal; and when the last bit of an SPI row address in an SPI address signal is to be read, the control module enables the row enable signal, and the row enable signal enables an internal row address of an internal address of the serial flash memory to be valid and enables the row decoder to perform decoding and select the internal row address. The present application further provides an address control method of a serial flash memory. In the present application, the timing requirement on the row address can be relaxed, the area of the row decoder can be reduced, and the area of the row drive circuit can be reduced.

An unbalanced plane management method, an associated data storage device and the controller thereof are provided. The unbalanced plane management method may include: setting an unbalanced plane number; selecting at least one plane with a plane count calculated by subtracting the unbalanced plane number from a maximum plane number, and recording at least one set of blocks of the at least one plane to a block skip table; according to block numbers as indexes, combining blocks of unselected planes into superblocks, wherein said superblocks respectively correspond to said block numbers; and recording total capacity of all superblocks and the unbalanced plane number, to generate a latest record of records of multiple types of storage capacity, for further setting storage capacity configuration of the data storage device, wherein said all superblocks include said superblocks.

An unbalanced plane management method, an associated data storage device and the controller thereof are provided. The unbalanced plane management method may include: setting an unbalanced plane number; selecting at least one plane with a plane count calculated by subtracting the unbalanced plane number from a maximum plane number, and recording at least one set of blocks of the at least one plane to a block skip table; according to block numbers as indexes, combining blocks of unselected planes into superblocks, wherein said superblocks respectively correspond to said block numbers; and recording total capacity of all superblocks and the unbalanced plane number, to generate a latest record of records of multiple types of storage capacity, for further setting storage capacity configuration of the data storage device, wherein said all superblocks include said superblocks.

The present application provides a storage system, including a plurality of storage chips, each storage chip including a data output unit, the data output units sharing a power supply and a ground terminal, and the data output unit including: a pull-up unit having a control terminal, a first terminal and a second terminal, a first input signal being inputted to the control terminal, the first terminal being electrically connected to the power supply, the second terminal being connected to an output terminal of the data output unit, and the pull-up unit being a first NMOS transistor; and a pull-down unit having a control terminal, a first terminal and a second terminal, a second input signal being inputted to the control terminal, the first terminal being electrically connected to the ground terminal, and the second terminal being connected to the output terminal of the data output unit.

A 3D semiconductor device, the device including: a first level including a first single crystal layer, the first level including a plurality of first transistors and at least one metal layer, where the at least one metal layer overlays the first single crystal layer, and where the at least one metal layer includes interconnects between the plurality of first transistors, the interconnects between the plurality of first transistors include forming first control circuits; a second level overlaying the at least one metal layer, the second level including a plurality of second transistors; a third level overlaying the second level, the third level including a plurality of third transistors, where the second level includes a plurality of first memory cells, the first memory cells each including at least one of the plurality of second transistors, where the third level includes a plurality of second memory cells, the second memory cells each including at least one of the plurality of third transistors, where at least one of the plurality of second memory cells is at least partially atop of the first control circuits, where the first control circuits are adapted to control data written to at least one of the plurality of second memory cells; and where the plurality of second transistors are horizontally oriented transistors.

A 3D semiconductor device, the device including: a first level including a first single crystal layer, the first level including a plurality of first transistors and at least one metal layer, where the at least one metal layer overlays the first single crystal layer, and where the at least one metal layer includes interconnects between the plurality of first transistors, the interconnects between the plurality of first transistors include forming first control circuits; a second level overlaying the at least one metal layer, the second level including a plurality of second transistors; a third level overlaying the second level, the third level including a plurality of third transistors, where the second level includes a plurality of first memory cells, the first memory cells each including at least one of the plurality of second transistors, where the third level includes a plurality of second memory cells, the second memory cells each including at least one of the plurality of third transistors, where at least one of the plurality of second memory cells is at least partially atop of the first control circuits, where the first control circuits are adapted to control data written to at least one of the plurality of second memory cells; and where the plurality of second transistors are horizontally oriented transistors.

A memory device includes pages arranged in columns and each constituted by a plurality of memory cells on a substrate, voltages applied to a first gate conductor layer, a second gate conductor layer, a first impurity layer, and a second impurity layer in each memory cell included in each of the pages are controlled to perform a page write operation of retaining, inside a channel semiconductor layer, a group of positive holes generated by an impact ionization phenomenon or by a gate-induced drain leakage current, and the voltages applied to the first gate conductor layer, the second gate conductor layer, the first impurity layer, and the second impurity layer are controlled to perform a page erase operation of discharging the group of positive holes from inside the channel semiconductor layer. The first impurity layer of the memory cell is connected to a source line, the second impurity layer thereof is connected to a bit line, one of the first gate conductor layer or the second gate conductor layer thereof is connected to a word line, and the other of the first gate conductor layer or the second gate conductor layer thereof is connected to a first driving control line. In a page read operation, page data in a group of memory cells selected by the word line is read to sense amplifier circuits, and in at least one operation among the page write operation, the page erase operation, and the page read operation, a voltage applied to at least one of the source line, the bit line, the word line, or the first driving control line is controlled by a reference voltage generating circuit combined with a temperature-compensating circuit.

In a dynamic flash memory cell including: a HfO.sub.2 layer and a TiN layer surrounding a lower portion of a Si pillar standing on a P-layer substrate; a HfO.sub.2 layer surrounding an upper portion of the Si pillar; a TiN layer; and N.sup.+ layers connected to a bottom portion and a top portion of the Si pillar, and an SGT transistor including: a SiO.sub.2 layer surrounding a lower portion of a Si pillar standing on the same P-layer substrate; a HfO.sub.2 layer surrounding an upper portion of the Si pillar; a TiN layer; and N.sup.+ layers sandwiching the HfO.sub.2 layer in a perpendicular direction and connected to a top portion and a middle portion of the Si pillar, bottom positions of the Si pillar and the Si pillar are at the same position A. A bottom portion of an upper transistor portion of the dynamic flash memory cell composed of the HfO.sub.2 layer and the TiN layer in an upper portion of the Si pillar, and a bottom portion of an SGT transistor portion composed of the HfO.sub.2 layer and the TiN layer in an upper portion of the Si pillar are at the same position B.

On a substrate, dynamic flash memory cell transistors and, on their outside, driving-signal processing circuit transistors are disposed. A source line wiring layer, a bit line wiring layer, a plate line wiring layer, and a word line wiring layer extend in the horizontal direction relative to the substrate and connect, from the outside of a dynamic flash memory region, in the perpendicular direction, to lead-out wiring layers on an insulating layer. The transistors in driving-signal processing circuit regions connect, via multilayered wiring layers, to upper wiring layers on the insulating layer. A high-thermal-conductivity layer is disposed over the entirety of the dynamic flash memory region and in a portion above the bit line wiring layer.