G01F3/38

SYSTEMS AND METHODS FOR ACCURATE MEASUREMENT OF GAS FROM WET GAS WELLS

Systems and methods for liquid removal to increase the accuracy of gas flow meters, such as venturi meters. Systems and methods include a liquid knockout drum, an impingement plate, a drum separator, and a check valve.

Systems and methods for accurate measurement of gas from wet gas wells

Systems and methods are described for liquid removal to increase the accuracy of gas flow meters, such as venturi meters. Systems and methods include a liquid knockout drum, an impingement plate, a drum separator, and a check valve.

Continuous volume measurement on a receptacle for liquids
10352749 · 2019-07-16 ·

The present invention is about a volume-measuring device installed inside a box that used to store a liquid. The measuring device is placed at the bottom of the box dispensing the liquid, and displays via a measuring tower a measure of the volume of the liquid still in the box. The device is comprised of a receptacle or sealed pouch connected to a measuring tower. As the pressure from the weight of the liquid changes, the receptacle reacts by moving the measuring marker to reflect such change, thus measuring the current liquid volume in the dispensing box.

Continuous volume measurement on a receptacle for liquids
10352749 · 2019-07-16 ·

The present invention is about a volume-measuring device installed inside a box that used to store a liquid. The measuring device is placed at the bottom of the box dispensing the liquid, and displays via a measuring tower a measure of the volume of the liquid still in the box. The device is comprised of a receptacle or sealed pouch connected to a measuring tower. As the pressure from the weight of the liquid changes, the receptacle reacts by moving the measuring marker to reflect such change, thus measuring the current liquid volume in the dispensing box.

CONTINUOUS VOLUME MEASUREMENT ON A RECEPTACLE FOR LIQUIDS
20190186972 · 2019-06-20 ·

The present invention is about a volume-measuring device installed inside a box that used to store a liquid. The measuring device is placed at the bottom of the box dispensing the liquid, and displays via a measuring tower a measure of the volume of the liquid still in the box. The device is comprised of a receptacle or sealed pouch connected to a measuring tower. As the pressure from the weight of the liquid changes, the receptacle reacts by moving the measuring marker to reflect such change, thus measuring the current liquid volume in the dispensing box.

CONTINUOUS VOLUME MEASUREMENT ON A RECEPTACLE FOR LIQUIDS
20190186972 · 2019-06-20 ·

The present invention is about a volume-measuring device installed inside a box that used to store a liquid. The measuring device is placed at the bottom of the box dispensing the liquid, and displays via a measuring tower a measure of the volume of the liquid still in the box. The device is comprised of a receptacle or sealed pouch connected to a measuring tower. As the pressure from the weight of the liquid changes, the receptacle reacts by moving the measuring marker to reflect such change, thus measuring the current liquid volume in the dispensing box.

Gas flow monitoring method and gas flow monitoring apparatus

In a gas flow monitoring method using a MFC (a flow control device) for controlling a flow rate of process gas from a process gas supply source and supply the process gas to a predetermined process chamber, a start shut-off valve placed upstream of the MFC, and a pressure gauge placed between the start shut-off valve and the MFC, the start shut-off valve is closed and a drop of pressure on an upstream side of the MFC is measured by the pressure gauge to measure a flow rate of the MFC, thereafter, the start shut-off valve is opened to monitor the flow rate of the MFC. The MFC is switched from an ON state to an OFF state before the start shut-off valve is opened. The method enables in-line monitoring a low rate of process gas without affecting a semiconductor manufacturing process.

GAS SUPPLY DEVICE CAPABLE OF MEASURING FLOW RATE, FLOWMETER, AND FLOW RATE MEASURING METHOD

A gas supply system includes a flow controller, a first shutoff valve provided downstream of the flow controller, a second shutoff valve provided in a first flow passage communicating with the downstream side of the first shutoff valve, a second flow passage branching from the first flow passage, a third shutoff valve provided in the second flow passage, a pressure sensor that detects a pressure in a flow passage surrounded by the first, second, and third shutoff valves, a temperature sensor that detects a temperature in the flow passage, a volume measuring tank having a known volume connected downstream of the third shutoff valve, and a controller that obtains a volume of the flow passage by applying Boyle's law to open and closed states of the third shutoff valve and calculates the flow rate using the passage volume and outputs of the pressure and temperature sensors.

GAS SUPPLY DEVICE CAPABLE OF MEASURING FLOW RATE, FLOWMETER, AND FLOW RATE MEASURING METHOD

A gas supply system includes a flow controller, a first shutoff valve provided downstream of the flow controller, a second shutoff valve provided in a first flow passage communicating with the downstream side of the first shutoff valve, a second flow passage branching from the first flow passage, a third shutoff valve provided in the second flow passage, a pressure sensor that detects a pressure in a flow passage surrounded by the first, second, and third shutoff valves, a temperature sensor that detects a temperature in the flow passage, a volume measuring tank having a known volume connected downstream of the third shutoff valve, and a controller that obtains a volume of the flow passage by applying Boyle's law to open and closed states of the third shutoff valve and calculates the flow rate using the passage volume and outputs of the pressure and temperature sensors.

Urine production handling device and method
10145813 · 2018-12-04 · ·

Method for automatically, with the aid of a processor, determining a surface degeneration of a first surface of a urine handling system, the first surface being intended to come into contact with urine, the method comprises the following main steps: a) repeatedly measuring one or more capacitive values of the first surface, forming capacitive measurements; b) storing all, or representative instants of the capacitive measurements; c) deciding, based on changes of the stored capacitive measurements, that a significant surface degeneration of the first surface has occurred.