G01J1/20

Chip-scale star tracker

A chip scale star tracker that couples starlight into a lightguide such that the angle of incidence partially determines the mode of propagation of the starlight in the lightguide. A baffle system integrated with the lightguide prevents propagation of light incident from a predetermined range of angles.

Wavefront sensors with irregular aperture masks, diffusers, and cameras, and methods of making and using the same

Wavefront sensors are provided herein. An aperture mask is configured to receive incident light the wavefront of which is to be measured and comprising irregularly spaced apertures that respectively transmit sub-beams of the incident light. A diffuser is configured to receive the sub-beams transmitted by irregularly spaced apertures of the aperture mask. A camera, having a focal plane in which the diffuser substantially is located, is configured to obtain a digital image of the diffuser and thus to obtain a digital image of the incident light the sub-beams of which the aperture mask transmits onto the diffuser. A controller is configured to electronically receive the digital image of the diffuser and to measure the wavefront of the incident light based on the digital image. Methods also are provided.

VARIABLE MODULATION OF RADIATION AND COMPONENTS

Various embodiments include systems and methods to provide selectable variable gain to signals in measurements using incident radiation. The selectable variable gain may be used to normalize signals modulated in measurements using incident radiation. The selectable variable gain may be attained using a number of different techniques or various combinations of these techniques. These techniques may include modulating a modulator having modulating elements in which at least one modulating element acts on incident radiation differently from another modulating element of the modulator, modulating the use of electronic components in electronic circuitry of a detector, modulating a source of radiation or combinations thereof. Additional apparatus, systems, and methods are disclosed.

Sighting device

The present invention relates to a sighting device (1) providing an automatically updated reticule. The control unit (4) acquires the output level of the encoder (22) and calculates the expected distance between the dots of the reticule accordingly. The control unit (4) calculates the expected distance between the dots of the reticule and draws the reticule generated for that specific zoom level on the display means (3).

Laser alignment and calibration system for scanning lasers

A two dimensional scanning laser system may automatically detect a laser, then align and calibrate itself to scan over the sensor area. The system may have a laser with a controller that may cause the laser to be directed over two dimensions, as well as a sensor apparatus. The laser may be controlled with a mirror system that may pivot in two directions, thus allowing the laser to be scanned over a two dimensional area. The sensor may be a point sensor, where the laser may be positioned in a constant direction, as well as a larger area sensor where the laser may be moved across the sensor area to detect objects in a two or three dimensional space. An alignment and calibration sequence may cause the laser to scan across its operational area and detect the location of one or more sensors.

System for generating extreme ultra violet light
09574935 · 2017-02-21 · ·

A system for generating extreme ultraviolet light may include a chamber, a target supply device configured to supply a target material into the chamber, a laser apparatus configured to output a laser beam to irradiate the target material, a wavefront adjuster configured to adjust a wavefront of the laser beam, an imaging optical system configured to focus the laser beam reflected by the target material, an image detector configured to capture an image of the laser beam focused by the imaging optical system, and a controller configured to control the wavefront adjuster based on the captured image.

Solid state photomultiplier

Embodiments of a solid state photomultiplier are provided herein. In some embodiments, a solid state photomultiplier may include a microcell configured to generate an analog signal when exposed to optical photons, a quench resistor electrically coupled to the microcell in series; and a first switch disposed between the quench resistor and an output of the solid state photomultiplier, the first switch electrically coupled to the microcell via the quench resistor and configured to selectively couple the microcell to the output.

Laser phase diversity for beam control in phased laser arrays

Systems and methods that combine forward-model image reconstruction techniques with tomographic estimation of three-dimensional atmospheric turbulence to enable high-quality anisoplanatic imaging and beam control through the atmosphere over an extended field of view using a phased laser array. The system projects laser energy onto specific locations of extended objects in various geometries, overcomes atmospheric anisoplanatism and backscatter; estimates phase across the full aperture, and reconstructs the target object in great detail to enable high-resolution aimpoint selection and maintenance. Aimpoint maintenance is performed by sequentially analyzing a passive image and a laser spot in rapid succession, in each subaperture at high signal-to-noise ratio. As a further improvement, backscatter issues from the projected laser beam are eliminated by cycling the laser and/or sequentially lasing on different wavelengths within the laser gain bandwidth.

Wavefront sensors with irregular aperture masks, diffusers, and cameras, and methods of making and using the same

A wavefront sensor for measuring a wavefront that includes an aperture mask configured to receive incident light, the aperture mask comprising a plurality of apertures irregularly spaced and arranged in a plurality of sub-windows that respectively transmit sub-beams of the incident light. A diffuser can receive the sub-beams transmitted by the plurality of apertures. A controller of the sensor is configured to identify measured sub-beams by convolving the sub-beams imaged on the diffuser with a map of the plurality of apertures; and measure the wavefront of the incident light based on changes in position of the sub-beams in a digital image of the diffuser relative to both reference positions and neighboring sub-beams.

Characteristic value correction device, characteristic value calculation device, inspection device including the same, characteristic value correction method, light-emitting device, and characteristic value correction program
12429374 · 2025-09-30 · ·

A characteristic value correction device includes a waveform acquiring unit, an area calculating unit, a time calculating unit, and a correction coefficient calculating unit. The waveform acquiring unit is configured to acquire a waveform indicating a relationship between an elapsed time and a first current value obtained when the pulse current is applied to a light-emitting device. The area calculating unit is configured to calculate a first area of an entire waveform and a second area of a rectangular wave portion. The time calculating unit is configured to calculate a first time between an application start time and an application end time of the pulse current and a second time corresponding to the second area. The correction coefficient calculating unit is configured to obtain a correction coefficient based on a ratio between the first area and the second area and a ratio between the first time and the second time.