An image pickup system includes a stereoscopic endoscope including image pickup optical systems having a parallax therebetween and a first image pickup device and a second image pickup device, and a processor including a first photometric measurement section configured to photometrically measure a luminance value of a first image pickup signal related to the first image pickup device, a second photometric measurement section configured to measure a luminance value of a second image pickup signal related to the second image pickup device, and a control section including a threshold value comparison section configured to compare the luminance value with a threshold value. When the luminance value of either one of the first image pickup signal and the second image pickup signal exceeds the threshold value, the image pickup system performs light adjustment control of a light source based on a photometric value of the other image pickup signal.

A focus detection apparatus that performs phase difference focus detection based on signals of a plurality of colors obtained from an image sensor, which is covered by color filters of the plurality of colors, that performs photoelectric conversion on light incident on the image sensor via an imaging optical system and outputs electric signals, the apparatus comprising: an acquisition unit that acquires an addition coefficient indicating weights to be applied to the signals of the plurality of colors on the basis of characteristic of chromatic aberration of magnification of the imaging optical system; a generation unit that generates a pair of focus detection signals by performing weighted addition on the signals of the plurality of colors using the addition coefficient; and a detection unit that detects an image shift amount between the pair of focus detection signals.

System and methods for accurate measurement and real-time feedback of solar ultraviolet exposure for management of ultraviolet dose. The systems can include a wearable device and a mobile device, the system performing accurate measurement of UV exposure.

An extreme ultraviolet light generating apparatus includes: EUV light sensors configured to measure energy of extreme ultraviolet light from mutually different directions, the extreme ultraviolet light being generated by applying laser light to a target supplied to a predetermined region in a chamber; an application position adjusting unit configured to adjust an application position of the laser light to the target supplied to the predetermined region; and a controller configured to control the application position adjusting unit such that a centroid of the extreme ultraviolet light becomes a targeted centroid, the centroid of the extreme ultraviolet light being specified from measurement results of the EUV light sensors, the controller controlling the application position adjusting unit such that the application position is scanned in accordance with reference scan points mutually different in position, and calibrating the targeted centroid based on the measurement results acquired for the reference scan points.

One variation of a system for tracking and responding to Sun exposure includes: a housing configured to transiently attach to a port on a first garment; a jack coupled to the housing configured to transiently engage a port on the first garment; a radiation sensor arranged in the housing and configured to detect solar radiation incident on the housing; and a controller configured to: read an identifier of the first garment from the port via the jack; based on the identifier, estimate a skin exposure of a user wearing the first garment; read a solar radiation value from the radiation sensor at a first time; and, based on the solar radiation value and the skin exposure, estimate a solar radiation exposure of the user at the first time.

An extreme ultraviolet light generating apparatus moves a generation position of extreme ultraviolet light based on an instruction from an external device and includes a chamber in which a target fed therein is irradiated with laser light so that the extreme ultraviolet light is generated from the target; a target feeder configured to output and feed the target into the chamber; a condensing mirror configured to condense the laser light on the target fed into the chamber; a stage configured to regulate a position of the target feeder; a manipulator configured to regulate a position of the condensing mirror; and a control unit configured to be able to control at least one of the stage, the manipulator, and a radiation timing of the laser light to the target, in a feedforward method, when the generation position is moved during generation of the extreme ultraviolet light.

One variation of a system for tracking and responding to Sun exposure includes: a housing configured to transiently attach to a port on a first garment; a jack coupled to the housing configured to transiently engage a port on the first garment; a radiation sensor arranged in the housing and configured to detect solar radiation incident on the housing; and a controller configured to: read an identifier of the first garment from the port via the jack; based on the identifier, estimate a skin exposure of a user wearing the first garment; read an solar radiation value from the radiation sensor at a first time; and, based on the solar radiation value and the skin exposure, estimate an solar radiation exposure of the user at the first time.

An extreme ultraviolet light generating apparatus moves a generation position of extreme ultraviolet light based on an instruction from an external device and includes a chamber in which a target fed therein is irradiated with laser light so that the extreme ultraviolet light is generated from the target; a target feeder configured to output and feed the target into the chamber; a condensing mirror configured to condense the laser light on the target fed into the chamber; a stage configured to regulate a position of the target feeder; a manipulator configured to regulate a position of the condensing mirror; and a control unit configured to be able to control at least one of the stage, the manipulator, and a radiation timing of the laser light to the target, in a feedforward method, when the generation position is moved during generation of the extreme ultraviolet light.

An extreme ultraviolet light generating apparatus includes: EUV light sensors configured to measure energy of extreme ultraviolet light from mutually different directions, the extreme ultraviolet light being generated by applying laser light to a target supplied to a predetermined region in a chamber; an application position adjusting unit configured to adjust an application position of the laser light to the target supplied to the predetermined region; and a controller configured to control the application position adjusting unit such that a centroid of the extreme ultraviolet light becomes a targeted centroid, the centroid of the extreme ultraviolet light being specified from measurement results of the EUV light sensors, the controller controlling the application position adjusting unit such that the application position is scanned in accordance with reference scan points mutually different in position, and calibrating the targeted centroid based on the measurement results acquired for the reference scan points.

System and method for accurately measuring alignment of every exposure field on a pre-patterned wafer without reducing wafer-exposure throughput. Diffraction grating disposed in scribe-lines of such wafer, used as alignment marks, and array of encoder-heads (each of which is configured to define positional phase(s) of at least one such alignment mark) are used. Determination of trajectory of a wafer-stage scanning during the wafer-exposure in the exposure tool employs determining in-plane coordinates of such spatially-periodic alignment marks by simultaneously measuring position-dependent phases of signals produced by these marks as a result of recombination of light corresponding to different diffraction orders produced by these marks. Measurements may be performed simultaneously at all areas corresponding to at least most of the exposure fields of the wafer, and/or with use of a homodyne light source, and/or in a wavelength-independent fashion, and/or with a pre-registration process allowing for accommodation of wafers with differently-dimensioned exposure fields.