An apparatus and method for monitoring a stability of a spectrum are provided. The apparatus for monitoring stability of a spectrum includes a spectroscope configured to measure a spectrum of a sample and a processor configured to calculate a similarity change index of the measured spectrum and to determine the stability of the measured spectrum by analyzing the calculated similarity change index.

Detection sensitivity of optical computing devices may be improved by utilizing multiple integrated computational elements in combination with one another. Optical computing devices containing multiple integrated computational elements may comprise: two or more integrated computational elements that are identical to one another and optically interact sequentially with incident electromagnetic radiation, such that at least a portion of the photons from the incident electromagnetic radiation optically interacts with each integrated computational element; wherein the sequential optical interaction of the incident electromagnetic radiation with the two or more integrated computational elements increases a detection sensitivity of the optical computing device relative to that obtained when only one of the integrated computational elements is present; and a detector that receives the photons that have optically interacted with each integrated computational element.

According to one embodiment, a value of a film thickness of a processing object disposed above a substrate is obtained. Then, a wavelength that provides a highest degree of intensity of signal light reflected when the signal light is incident onto the processing object having the value of the film thickness, based on wavelength selection reference information is selected. Then, a first instruction performing an alignment process to the substrate by use of signal light having a wavelength thus selected is generated. The wavelength selection reference information is information that includes a correlation between values of the film thickness of the processing object and degrees of intensity of the signal light, with respect to a plurality of wavelengths.

According to one embodiment, a value of a film thickness of a processing object disposed above a substrate is obtained. Then, a wavelength that provides a highest degree of intensity of signal light reflected when the signal light is incident onto the processing object having the value of the film thickness, based on wavelength selection reference information is selected. Then, a first instruction performing an alignment process to the substrate by use of signal light having a wavelength thus selected is generated. The wavelength selection reference information is information that includes a correlation between values of the film thickness of the processing object and degrees of intensity of the signal light, with respect to a plurality of wavelengths.

A micromechanical device for projecting an image and for analyzing an optical spectrum and a corresponding manufacturing method. The device includes: a first light providing unit by which a first light beam is providable to the device; a diffraction unit for diffract the first light beam provided to the device as a function of a diffraction property of the diffraction unit; a second light providing unit by which a second light beam is providable to the device; a micromirror by which the second light beam provided to the device is variably deflectable as a function of a position and/or an orientation of the first micromirror; and a first actuator by which the adjustable diffraction property of the optical diffraction unit and also the position and/or the orientation of the micromirror are adjustable.

A micromechanical device for projecting an image and for analyzing an optical spectrum and a corresponding manufacturing method. The device includes: a first light providing unit by which a first light beam is providable to the device; a diffraction unit for diffract the first light beam provided to the device as a function of a diffraction property of the diffraction unit; a second light providing unit by which a second light beam is providable to the device; a micromirror by which the second light beam provided to the device is variably deflectable as a function of a position and/or an orientation of the first micromirror; and a first actuator by which the adjustable diffraction property of the optical diffraction unit and also the position and/or the orientation of the micromirror are adjustable.

A new spectral measurement technique is provided which enables measurement even if the light to be measured exists for a very short period. In one embodiment, a broadband pulsed light wave whose wavelength shifts temporally and continuously in a pulse interferes with a light wave to be measured. The intensity at each wavelength of the light wave to be measured is obtained using a Fourier transform of the output signal from a detector that has detected the intensity of the wave resulting from the interference. A laser beam from a laser source is converted to a supercontinuum wave by a nonlinear optical element, and a pulse extension element extends pulses of the supercontinuum wave, thus generating the broadband pulsed light wave.

A new spectral measurement technique is provided which enables measurement even if the light to be measured exists for a very short period. In one embodiment, a broadband pulsed light wave whose wavelength shifts temporally and continuously in a pulse interferes with a light wave to be measured. The intensity at each wavelength of the light wave to be measured is obtained using a Fourier transform of the output signal from a detector that has detected the intensity of the wave resulting from the interference. A laser beam from a laser source is converted to a supercontinuum wave by a nonlinear optical element, and a pulse extension element extends pulses of the supercontinuum wave, thus generating the broadband pulsed light wave.

The invention relates to a device (2) and to a method for characterizing an ultrashort laser pulse. Furthermore, the invention relates to use of a self-contained optical assembly in a device (2) for characterizing an ultrashort laser pulse. The device (2) comprises an imaging optical element (4) configured to image the incident laser pulse (6) in a direction of a straight line (L). A first optical element (10) is configured to apply predetermined varying group delay dispersion on the line focused laser pulse. A non-linear optical element (14) is configured to generate a second harmonic laser pulse (30). An optical grating (20) generates a diffraction of the second harmonic laser pulse, which is imaged on a flat sensor (24). A processing unit (36) determines a best fit for the captured image thereby calculating a frequency spectrum and a spectral phase of the laser pulse.

The invention relates to a device (2) and to a method for characterizing an ultrashort laser pulse. Furthermore, the invention relates to use of a self-contained optical assembly in a device (2) for characterizing an ultrashort laser pulse. The device (2) comprises an imaging optical element (4) configured to image the incident laser pulse (6) in a direction of a straight line (L). A first optical element (10) is configured to apply predetermined varying group delay dispersion on the line focused laser pulse. A non-linear optical element (14) is configured to generate a second harmonic laser pulse (30). An optical grating (20) generates a diffraction of the second harmonic laser pulse, which is imaged on a flat sensor (24). A processing unit (36) determines a best fit for the captured image thereby calculating a frequency spectrum and a spectral phase of the laser pulse.