A sensing element for a temperature sensor including a base with a platinum meander applied thereto. An alumina diffusion barrier (ADB) covers the meander to provide protection against contamination and structural stabilization, wherein the alumina diffusion barrier is a contiguous polycrystalline layer fabricated from alumina and approximately 1% by weight of a rutile additive to be substantially devoid of network porosity. The contiguous polycrystalline layer includes grains with a typical grain size being in a range of 0.5-3 m. A method for fabricating an alumina diffusion barrier includes the steps of: combining a nano-alumina and nano-rutile powder to create a formulation; applying the formulation to the platinum meander to form a layer; and sintering the layer to create a contiguous polycrystalline layer covering the platinum meander.

The present disclosure relates to probe sheaths adapted for a probe housing positioned within a turbomachine fluid flow path. A probe sheath according to the disclosure can include: a non-metallic sheathing material having at least one opening shaped to enclose a first portion of a fluid probe therein, the non-metallic sheathing material being sized for placement within an interior cavity of the probe housing; and a metallic sheathing material mechanically coupled to a first end of the non-metallic sheathing material and sized for placement within the interior cavity of the probe housing. The metallic sheathing material may include at least one opening in fluid communication with the at least one opening of the non-metallic sheathing material, and may be shaped to enclose a second portion of the fluid probe therein.

A resistance pattern that contains platinum as a main component is formed into a meander shape and on a main surface of a ceramic substrate. A protective film layer that covers the resistance pattern has a two-layer structure including a trap layer as an inner layer and an overcoat layer as an outer layer. The trap layer contains alumina as a main component and 2 to 30 vol % of platinum. The overcoat layer contains alumina as a main component. With such a configuration, even when reactivity of the platinum resistance pattern becomes higher under high temperature use, platinum contained in the trap layer reacts with oxygen or impurities etc. contained in the ceramic substrate. Thus, reaction of the platinum resistance pattern can be suppressed.

A resistance pattern that contains platinum as a main component is formed into a meander shape and on a main surface of a ceramic substrate. A protective film layer that covers the resistance pattern has a two-layer structure including a trap layer as an inner layer and an overcoat layer as an outer layer. The trap layer contains alumina as a main component and 2 to 30 vol % of platinum. The overcoat layer contains alumina as a main component. With such a configuration, even when reactivity of the platinum resistance pattern becomes higher under high temperature use, platinum contained in the trap layer reacts with oxygen or impurities etc. contained in the ceramic substrate. Thus, reaction of the platinum resistance pattern can be suppressed.

A temperature sensor integrated type semiconductor pressure sensor apparatus includes a temperature detection device, a lead wire covered with a lead wire protection material, and a terminal, which are integrated together by a thermoplastic resin. This can prevent the lead wire from being deformed in the assembly process, thereby simplifying the assembly process. Furthermore, the temperature detection device is exposed from the opening at the tip of the protrusion, which can secure enough temperature response. Furthermore, the temperature detection device, the lead wire and the lead wire protection material are covered with the thermoplastic resin, so they are protected from combustion gas component, oil contaminant and corrosion product included in intake air.

A process chamber measurement wafer for location inside a process chamber and measuring environmental conditions within the process chamber during a process run. The process chamber measurement wafer including a releasable dummy wafer to protect the instrumented portion of the process chamber measurement wafer from process material deposited during the process run.

A process chamber measurement wafer for location inside a process chamber and measuring environmental conditions within the process chamber during a process run. The process chamber measurement wafer including a releasable dummy wafer to protect the instrumented portion of the process chamber measurement wafer from process material deposited during the process run.

A method of producing a temperature sensor which is configured to detect a temperature change of a respiratory gas of a subject, includes: preparing a rod-like heat sensitive element which includes a heat sensitive portion in a tip end portion; placing the heat sensitive portion in a cavity of a mold; injecting a resin material into the cavity to mold a protective portion which covers the heat sensitive element; and releasing the tip end portion in which the protective portion is formed, from the mold.

A method of producing a temperature sensor which is configured to detect a temperature change of a respiratory gas of a subject, includes: preparing a rod-like heat sensitive element which includes a heat sensitive portion in a tip end portion; placing the heat sensitive portion in a cavity of a mold; injecting a resin material into the cavity to mold a protective portion which covers the heat sensitive element; and releasing the tip end portion in which the protective portion is formed, from the mold.

The invention relates to a thermal element comprising a shaft and a test prod arranged on one end of the shaft. The thermal element comprises a first conductor and a second conductor, which are manufactured from different conductor materials and which are in electrical contact on one contact point provided in the region of the test prod. The first conductor and the second conductor are embedded at least in sections in a material of the shaft. The contact point is additionally or alternatively to the shaft material shielded with respect to the outside space at least in sections by means of a shield formed by a shielding material, wherein the shielding material has a lower diffusion coefficient and/or a higher thermal conductivity than the shaft material.