A system is provided comprising an FTIR spectrometer configured to obtain a Fourier Transformed infrared (FTIR) spectrum of a Peripheral Blood Mononuclear Cells (PBMC) sample of the subject; a data processor operable with the FTIR spectrometer, and configured to analyze the infrared (IR) spectrum of the Peripheral Blood Mononuclear Cells (PBMC) sample of the subject by assessing a characteristic of the sample of the subject at at least one wavenumber; and an output unit, configured to generate an output indicative of the presence of a solid tumor, based on the infrared (IR) spectrum. Other embodiments are also provided.

A system is provided comprising an FTIR spectrometer configured to obtain a Fourier Transformed infrared (FTIR) spectrum of a Peripheral Blood Mononuclear Cells (PBMC) sample of the subject; a data processor operable with the FTIR spectrometer, and configured to analyze the infrared (IR) spectrum of the Peripheral Blood Mononuclear Cells (PBMC) sample of the subject by assessing a characteristic of the sample of the subject at at least one wavenumber; and an output unit, configured to generate an output indicative of the presence of a solid tumor, based on the infrared (IR) spectrum. Other embodiments are also provided.

Disclosed are methods of detecting an analyte of interest comprising introducing a sample comprising an analyte of interest to an antibody or antibody fragment; incubating the sample and antibody or antibody fragment under conditions sufficient to allow binding of the analyte of interest to the antibody or antibody fragment; and detecting the binding of the analyte of interest to the antibody or antibody fragment using a label-free second harmonic detection system. Also disclosed are methods of screening and diagnosing using antibodies or antibody fragments and a label-free second harmonic detection system.

Embodiments of the present disclosure generally relate to systems and methods for in-line measurement of alkali metal-containing structures or alkali ion-containing structures of, e.g., electrodes. In an embodiment, a system for processing an electrode is provided. The system includes a first processing chamber for forming an electrode comprising an alkali metal-containing structure. The system further includes a metrology station coupled to and in-line with the first processing chamber, the metrology station comprising: a source of radiation for delivering radiation to the alkali metal-containing structure, and an optical detector for receiving an emission of radiation emitted from the alkali metal-containing structure, and a processor configured to determine a characteristic of the alkali metal-containing structure of the electrode based on the emission of radiation.

Embodiments of the present disclosure generally relate to systems and methods for in-line measurement of alkali metal-containing structures or alkali ion-containing structures of, e.g., electrodes. In an embodiment, a system for processing an electrode is provided. The system includes a first processing chamber for forming an electrode comprising an alkali metal-containing structure. The system further includes a metrology station coupled to and in-line with the first processing chamber, the metrology station comprising: a source of radiation for delivering radiation to the alkali metal-containing structure, and an optical detector for receiving an emission of radiation emitted from the alkali metal-containing structure, and a processor configured to determine a characteristic of the alkali metal-containing structure of the electrode based on the emission of radiation.

Provided herein are systems, devices, and methods for improved optical waveguide transmission and alignment in an analytical system. Waveguides in optical analytical systems can exhibit variable and increasing back reflection of single-wavelength illumination over time, thus limiting their effectiveness and reliability. The systems are also subject to optical interference under conditions that have been used to overcome the back reflection. Novel systems and approaches using broadband illumination light with multiple longitudinal modes have been developed to improve optical transmission and analysis in these systems. Novel systems and approaches for the alignment of a target waveguide device and an optical source are also disclosed.

Provided herein are systems, devices, and methods for improved optical waveguide transmission and alignment in an analytical system. Waveguides in optical analytical systems can exhibit variable and increasing back reflection of single-wavelength illumination over time, thus limiting their effectiveness and reliability. The systems are also subject to optical interference under conditions that have been used to overcome the back reflection. Novel systems and approaches using broadband illumination light with multiple longitudinal modes have been developed to improve optical transmission and analysis in these systems. Novel systems and approaches for the alignment of a target waveguide device and an optical source are also disclosed.

A system is provided. The system has a femtosecond oscillator to generate pulses used for pump and probe beams. A photonic crystal fiber is disposed in a path of the probe beam and produces pulses for a chirped probe beam. A high NA objective receives the pump and the chirped probe beam, redirects the received beams through a dielectric substrate towards an interface between a sample and the dielectric substrate to cause total internal reflection (TIR) at the sample-substrate interface, and produces corresponding evanescent waves in a portion of the sample adjacent to the sample-substrate interface, and collects a backward-propagating beam of pulses of responsive light. The portion of the sample illuminated by the evanescent waves emits responsive light. The dielectric substrate is transparent to the responsive light, the pump and the chirped probe beam. An image is produced having a specific image size using the received backward-propagating beam.

Semiconductor metrology systems based on directing radiation on a wafer, detecting second harmonic generated (SHG) radiation from the wafer and correlating the second harmonic generated (SHG) signal to one or more electrical properties of the wafer are disclosed. The disclosure also includes parsing the SHG signal to remove contribution to the SHG signal from one or more material properties of the sample such as thickness. Systems and methods described herein include machine learning methodologies to automatically classify obtained SHG signal

Semiconductor metrology systems based on directing radiation on a wafer, detecting second harmonic generated (SHG) radiation from the wafer and correlating the second harmonic generated (SHG) signal to one or more electrical properties of the wafer are disclosed. The disclosure also includes parsing the SHG signal to remove contribution to the SHG signal from one or more material properties of the sample such as thickness. Systems and methods described herein include machine learning methodologies to automatically classify obtained SHG signal