Provided is a measuring apparatus, comprising a measuring unit that irradiates a film with light and measures the light transmitted through the film or the light reflected by the film, a moving mechanism that allows the measuring unit to move in a first direction intersecting the direction in which the film is conveyed, the measuring unit includes a light projecting unit that irradiates the film with light, an integrating sphere that collects light from the film, and a light receiving portion that receives the light collected by the integrating sphere.

Disclosed are methods for detecting a presence or absence of an antimicrobial surface coating including applying at least one detectable fluorophoric dye compound to a substrate, irradiating the surface of the substrate with ultraviolet radiation in the 100-415 nm wavelength range to excite the detectable fluorophoric dye compound, observing fluorescence of the excited fluorophoric dye compound, and determining the presence or absence of the antimicrobial surface coating based on the observed fluorescence. Further disclosed are antimicrobial surface coating solutions, methods for their application, and methods for confirming the presence and coverage of antimicrobial surface coatings.

Disclosed herein is a method for assessing a flow a sprayed coating, including the steps of spraying a coating onto a surface and capturing a plurality of images of the sprayed surface at a predetermined frequency within a predetermined interval of time, and a computer program product for assessing a flow of a sprayed coating.

A display device includes a substrate bendable about a bending line, a display element layer above the substrate, a protection film below the substrate, and a separator between the substrate and the protection film and corresponding to the bending line.

An optical sensor system, comprising refractory plasmonic elements that can withstand temperatures exceeding 2500° C. in chemically aggressive and harsh environments that impose stress, strain and vibrations. A plasmonic metamaterial or metasurface, engineered to have a specific spectral and angular response, exhibits optical reflection characteristics that are altered by varying physical environmental conditions including but not limited to temperature, surface chemistry or elastic stress, strain and other types of mechanical load. The metamaterial or metasurface comprises a set of ultra-thin structured layers with a total thickness of less than tens of microns that can be deployed onto surfaces of devices operating in harsh environmental conditions. The top interface of the metamaterial or metasurface is illuminated with a light source, either through free space or via an optical fiber, and the reflected signal is detected employing remote detectors.

An object is to measure absorbance of aqueous cosmetic materials that have not heretofore been studied for absorbance measurement, and particularly to form a uniform layer of thin film in order to ensure accurate measurement without causing these aqueous cosmetic materials, which are O/W emulsions, to undergo phase separation during measurement. As a means for achieving the foregoing, an absorbance measurement method is provided, wherein an absorbent aqueous composition is applied on the surface of a substrate, which surface has been plasma treated, arc-discharge treated, or corona-discharge treated, to achieve a contact angle with pure water of 0 to 70.0 degrees, and the applied absorbent aqueous composition is measured for absorbance.

A method of performing metrology analysis of a thin film includes coupling a radiation into an optical element disposed adjacent to a surface of the thin film. The radiation is coupled such that the radiation is totally internally reflected at an interface between the optical element and the thin film. An evanescent radiation generated at the interface penetrates the thin film. The method furthers include analyzing the evanescent radiation scattered by the thin film to obtain properties of the thin film.

A process for sizing two-dimensional nanostructures includes providing the nanostructures to a liquid-liquid interface, providing probe particles to the liquid-liquid interface, obtaining an image of the nanostructures and the probe particles, and processing the image to ascertain a size property of the nanostructures.

In an imaging method, a focal point of a focused optical beam is sequentially mechanically positioned at coarse locations in or on an integrated circuit (IC) wafer or chip. At each coarse location, a two-dimensional (2D) image or mapping tile is acquired by steering the focal point to fine locations on or in the IC wafer or chip using electronic beam steering and, with the focal point positioned at each fine location, acquiring an output signal produced in response to an electrical charge that is optically injected into the IC wafer or chip at the fine location by the focused optical beam. The 2D image or mapping tiles are combined, including stitching together overlapping 2D image or mapping tiles, to generate an image or mapping of the IC wafer or chip. The electronic beam steering may be performed using a galvo mirror. The set of coarse locations may span a three-dimensional (3D) volume.

An article comprising: (i) a body, the body comprising a material and a transmittance greater than or equal to 90% throughout an electromagnetic radiation wavelength range of 250 nm to 800 nm; and (ii) cupric oxide (CuO) in direct contact with the material of the body, the cupric oxide (CuO) comprising a thickness that is less than or equal to 1.3 nm. Also disclosed is the article further comprising: an ultra-thin metal film disposed directly on the cupric oxide (CuO). The article demonstrates a transmittance greater than or equal to 65% throughout an electromagnetic radiation wavelength range of 300 nm to 1400 nm. The ultra-thin metal film can be silver (Ag), gold (Au), copper (Cu), or platinum (Pt). The ultra-thin metal film comprises a thickness within a range of 1 nm to 5 nm. The article at the ultra-thin metal film has a sheet resistance of less than or equal to 2100 Ω/□. Additionally, a method of forming the article.