Patent classifications
G01N23/205
GRAZING INCIDENCE X-RAY FLUORESCENCE SPECTROMETER AND GRAZING INCIDENCE X-RAY FLUORESCENCE ANALYZING METHOD
A grazing incidence X-ray fluorescence spectrometer (1) of the present invention includes: a bent spectroscopic device (4) to monochromate X-rays (3) from an X-ray source (2) and generate an X-ray beam (5) focused on a fixed position (15) on a surface of a sample (S); a slit member (6) disposed between the bent spectroscopic device (4) and the sample (S) and having a linear opening (61); a slit member moving unit (7) to move the slit member (6) in a direction that intersects the X-ray beam (5) passing through the linear opening (61); a glancing angle setting unit (8) to move the slit member (6) by using the slit member moving unit (7), and set a glancing angle (α) of the X-ray beam (5) to a desired angle; and a detector (10) to measure an intensity of fluorescent X-rays (9) from the sample (S) irradiated with the X-ray beam (5).
Full Beam Metrology For X-Ray Scatterometry Systems
Methods and systems for characterizing dimensions and material properties of semiconductor devices by full beam x-ray scatterometry are described herein. A full beam x-ray scatterometry measurement involves illuminating a sample with an X-ray beam and detecting the intensities of the resulting zero diffraction order and higher diffraction orders simultaneously for one or more angles of incidence relative to the sample. The simultaneous measurement of the direct beam and the scattered orders enables high throughput measurements with improved accuracy. The full beam x-ray scatterometry system includes one or more photon counting detectors with high dynamic range and thick, highly absorptive crystal substrates that absorb the direct beam with minimal parasitic backscattering. In other aspects, model based measurements are performed based on the zero diffraction order beam, and measurement performance of the full beam x-ray scatterometry system is estimated and controlled based on properties of the measured zero order beam.
Full Beam Metrology For X-Ray Scatterometry Systems
Methods and systems for characterizing dimensions and material properties of semiconductor devices by full beam x-ray scatterometry are described herein. A full beam x-ray scatterometry measurement involves illuminating a sample with an X-ray beam and detecting the intensities of the resulting zero diffraction order and higher diffraction orders simultaneously for one or more angles of incidence relative to the sample. The simultaneous measurement of the direct beam and the scattered orders enables high throughput measurements with improved accuracy. The full beam x-ray scatterometry system includes one or more photon counting detectors with high dynamic range and thick, highly absorptive crystal substrates that absorb the direct beam with minimal parasitic backscattering. In other aspects, model based measurements are performed based on the zero diffraction order beam, and measurement performance of the full beam x-ray scatterometry system is estimated and controlled based on properties of the measured zero order beam.
Using multiple sources/detectors for high-throughput X-ray topography measurement
An apparatus for X-ray topography includes a source assembly, a detector assembly, a scanning assembly and a processor. The source assembly is configured to direct multiple X-ray beams so as to irradiate multiple respective regions on a sample, wherein the regions partially overlap one another along a first axis of the sample and are offset relative to one another along a second axis of the sample that is orthogonal to the first axis. The detector assembly is configured to detect the X-ray beams diffracted from the sample and to produce respective electrical signals in response to the detected X-ray beams. The scanning assembly is configured to move the sample relative to the source assembly and the detector assembly along the second axis. The processor is configured to identify defects in the sample by processing the electrical signals, which are produced by the detector assembly while the sample is moved.
DIFFRACTION DATA ANALYSIS METHOD, COMPUTER PROGRAM, AND RECORDING MEDIUM
The present invention is a method for analyzing diffraction data obtained using a crystal structure analysis sample, the sample comprising a single crystal of a porous compound, and a compound for which a structure is to be determined. The method comprising: a step (I) that selects a space group that is identical to a space group of the single crystal of the porous compound, or a space group that has a symmetry lower than that, to be a space group of the crystal structure analysis sample; a step (II) that determines an initial structure of the crystal structure analysis sample using diffraction data with respect to a crystal structure of the single crystal of the porous compound as initial values; and a step (III) that refines the initial structure determined.
MASS SPECTROMETER
A mass spectrometer (1) includes: an ionization section (201) configured to generate ions from a sample; a mass separation section (231, 235) configured to separate ions generated by the ionization section according to mass-to-charge ratio; an ion detector (237) configured to detect an ion separated by the mass separation section; an ion capture section (31) configured to capture ions separated by the mass separation section; and an electron beam detection section (32) configured to detect an electron beam diffracted by ions captured within the ion capture section (31). This mass spectrometer is capable of performing, in a single measurement operation, both a mass spectrometric analysis and an electron-beam diffraction measurement for distinguishing between isomers. The electron-beam diffraction measurement can be more efficiently performed than in a conventional device of this type.
SAMPLE HOLDER UNIT FOR SINGLE-CRYSTAL X-RAY STRUCTURE ANALYSIS APPARATUS
A sample holder unit for a single-crystal X-ray structure analysis apparatus that quickly, surely and easily performs structure analysis with a crystalline sponge, the structure analysis inclusive of an operation of attaching a sample soaked in the crystalline sponge thereto, even if having no specialized knowledge, is provided. There are provided a sample holder, and an applicator comprising an opening 302 and a storing space in which the sample holder is stored, and a pull-out prevention part that selectively prevents and releases the sample holder stored in the storing space from being pulled out from the opening 302, wherein the pull-out prevention part comprises an operation part that releases pull-out prevention thereof in a state where the sample holder stored in the applicator is attached to the goniometer.
SAMPLE HOLDER UNIT FOR SINGLE-CRYSTAL X-RAY STRUCTURE ANALYSIS APPARATUS
A sample holder unit for a single-crystal X-ray structure analysis apparatus that quickly, surely and easily performs structure analysis with a crystalline sponge, the structure analysis inclusive of an operation of attaching a sample soaked in the crystalline sponge thereto, even if having no specialized knowledge, is provided. There are provided a sample holder, and an applicator comprising an opening 302 and a storing space in which the sample holder is stored, and a pull-out prevention part that selectively prevents and releases the sample holder stored in the storing space from being pulled out from the opening 302, wherein the pull-out prevention part comprises an operation part that releases pull-out prevention thereof in a state where the sample holder stored in the applicator is attached to the goniometer.
Sample inspection apparatus employing a diffraction detector
A sample inspection apparatus includes a source of electromagnetic radiation, a beam former for producing a plurality of coaxial and substantially conical shells of radiation, a detection surface and a set of conical shell slot collimators. Each conical shell has a different opening angle. The detection surface is arranged to receive diffracted radiation after incidence of one or more of the conical shells upon the sample to be inspected. The set of conical shell slot collimators is provided at or close to the detection surface which each stare at different annular regions of different corresponding conical shells.
Sample inspection apparatus employing a diffraction detector
A sample inspection apparatus includes a source of electromagnetic radiation, a beam former for producing a plurality of coaxial and substantially conical shells of radiation, a detection surface and a set of conical shell slot collimators. Each conical shell has a different opening angle. The detection surface is arranged to receive diffracted radiation after incidence of one or more of the conical shells upon the sample to be inspected. The set of conical shell slot collimators is provided at or close to the detection surface which each stare at different annular regions of different corresponding conical shells.