A method may comprise measuring at least one of the conductivity or resistance on a surface of a substrate comprising an antimicrobial system; comparing the measured conductivity or resistance to a reference value; and/or determining a presence or an absence of the antimicrobial system on the surface.

A hiding value of a coating on a coated surface is assessed by assessing a reflectance of a multiplicity of pixels of an optically scanned image of the coated surface, and, based at least in part on the reflectance of each pixel of the multiplicity of pixels, assessing a hiding value of the coating on the coated surface.

A hiding value of a coating on a coated surface is assessed by assessing a reflectance of a multiplicity of pixels of an optically scanned image of the coated surface, and, based at least in part on the reflectance of each pixel of the multiplicity of pixels, assessing a hiding value of the coating on the coated surface.

There is described an equipment and method for analysis of a fluid, suspension, solution, dispersion or fluid emulsion that automatically analyzes the characteristic properties of the samples of the fluids, such as paints, enamels, and dyes, among others, so that adjustments can be made to the fluid to meet the optical properties such as color, opacity, hue, saturation (tinting power), covering and luminosity, from the spectrometric measurement technique by transmission analysis of film having radiated fixed thickness.

A method for determining the thickness of a plurality of coating layers. The method comprises the steps of performing a calibration analysis on calibration data to determine initial values and search limits of optical parameters of the plurality of coating layers, irradiating the plurality of layers with a pulse of THz radiation in the range from 0.01 THz to 10 THz, detecting the reflected radiation to produce a sample response derived from the reflected radiation, producing a synthesized waveform using the optical parameters and predetermined initial thicknesses of the layers, varying the thicknesses and the optical parameters within the search limits to minimize the error measured between the sample response and the synthesized waveform, and outputting the thicknesses of the layers.

A method for determining the thickness of a plurality of coating layers. The method comprises the steps of performing a calibration analysis on calibration data to determine initial values and search limits of optical parameters of the plurality of coating layers, irradiating the plurality of layers with a pulse of THz radiation in the range from 0.01 THz to 10 THz, detecting the reflected radiation to produce a sample response derived from the reflected radiation, producing a synthesized waveform using the optical parameters and predetermined initial thicknesses of the layers, varying the thicknesses and the optical parameters within the search limits to minimize the error measured between the sample response and the synthesized waveform, and outputting the thicknesses of the layers.

A method for determining the thickness of a plurality of coating layers, the method comprising: performing a calibration analysis on calibration data to determine initial values and search limits of optical parameters of said plurality of coating layers, irradiating the said plurality of layers with a pulse of THz radiation, said pulse comprising a plurality of frequencies in the range from 0.01 THz to 10 THz; detecting the reflected radiation to produce a sample response said sample response being derived from the reflected radiation; producing a synthesised waveform using the optical parameters and predetermined initial thicknesses of said layers; and varying said thicknesses and varying said optical parameters within the said search limits to minimise the error measured between the sample response and the synthesised waveform; and outputting the thicknesses of the layers.

A method for determining the thickness of a plurality of coating layers, the method comprising: performing a calibration analysis on calibration data to determine initial values and search limits of optical parameters of said plurality of coating layers, irradiating the said plurality of layers with a pulse of THz radiation, said pulse comprising a plurality of frequencies in the range from 0.01 THz to 10 THz; detecting the reflected radiation to produce a sample response said sample response being derived from the reflected radiation; producing a synthesised waveform using the optical parameters and predetermined initial thicknesses of said layers; and varying said thicknesses and varying said optical parameters within the said search limits to minimise the error measured between the sample response and the synthesised waveform; and outputting the thicknesses of the layers.

The present invention relates to a method for controlling the curing degree of at least one at least partially cured ink and/or varnish printed on a substrate, which comprises the following steps: a) providing a substrate, which is printed with the at least one at least partially cured ink and/or at least partially cured varnish, wherein the at least one at least partially cured ink and/or at least partially cured varnish comprises at least one extractable compound, b) cutting at least one sample from an area of the printed substrate provided in step a), placing the at least one sample in a solvent, in which at least one of the at least one extractable compound is soluble, incubating the solvent with the at least one sample placed therein for at least 10 seconds and removing the at least one sample from the solvent to obtain a solvent extract, c) quantitatively measuring a spectroscopic characteristic of the solvent extract at at least one wavelength between 190 and 4,000 nm, at which at least one of the at least one extractable compound absorbs or emits radiation, so as to obtain a measured numeric value of the spectroscopic characteristic, d) comparing the measured numeric value of the spectroscopic characteristic measured in step c) with a reference value of the spectroscopic characteristic for the same area of the printed substrate, from which the at least one sample has been cut out in step b), and e) outputting a result, wherein the reference value of the spectroscopic characteristic for the same area of the printed substrate, from which the at least one sample has been cut out in step b), has been obtained by the use of an empirical model.

The present invention relates to a method for controlling the curing degree of at least one at least partially cured ink and/or varnish printed on a substrate, which comprises the following steps: a) providing a substrate, which is printed with the at least one at least partially cured ink and/or at least partially cured varnish, wherein the at least one at least partially cured ink and/or at least partially cured varnish comprises at least one extractable compound, b) cutting at least one sample from an area of the printed substrate provided in step a), placing the at least one sample in a solvent, in which at least one of the at least one extractable compound is soluble, incubating the solvent with the at least one sample placed therein for at least 10 seconds and removing the at least one sample from the solvent to obtain a solvent extract, c) quantitatively measuring a spectroscopic characteristic of the solvent extract at at least one wavelength between 190 and 4,000 nm, at which at least one of the at least one extractable compound absorbs or emits radiation, so as to obtain a measured numeric value of the spectroscopic characteristic, d) comparing the measured numeric value of the spectroscopic characteristic measured in step c) with a reference value of the spectroscopic characteristic for the same area of the printed substrate, from which the at least one sample has been cut out in step b), and e) outputting a result, wherein the reference value of the spectroscopic characteristic for the same area of the printed substrate, from which the at least one sample has been cut out in step b), has been obtained by the use of an empirical model.