An integrated system operation method is disclosed that includes the following steps: the film of a substrate is measured by a metrology apparatus to obtain a film information. The substrate is moved from the metrology apparatus to a process apparatus adjacent to the transfer apparatus. The film information is sent to the process apparatus. A film treatment is applied to the substrate in accordance with the film information.

The present invention discloses a device and method for detecting fluid transparency. The detection device comprises: a detection pipeline, which allows a beam to be incident on and emergent from a fluid therein; a laser tube, used for outputting the incident beam; and a photoelectric detector, used for detecting the emergent beam from the fluid, wherein the photoelectric detector comprises a scatter detector and a transmission detector; and the detection method comprises obtaining a scattered background noise value and a transmission background noise value of a device, obtaining the scattered light intensity I.sub.scatter obtained by the scatter detector and the transmission light intensity I.sub.transmission obtained by the transmission detector, and calculating the particle-absorbed light intensity I.sub.absorb; obtaining the total light intensity I.sub.total of a laser; and obtaining a fluid transparency T. With the described detection device and detection method, the accuracy of detecting fluid transparency may be effectively improved.

The present invention relates to an inspection apparatus and an inspection method which selectively adjust a numerical aperture of illuminating light in the form of collimated light when inspecting a target object, such as a wafer or the like, using a spectrum, thereby preventing a diffraction phenomenon caused by the illuminating light. The inspection apparatus may include: a camera unit disposed above a target object; an illumination unit configured to illuminate the target object with illuminating light; and a light detection unit configured to detect reflection light of the target object illuminated with the illuminating light, wherein the illumination unit comprises a numerical aperture adjustment device which has a first optical member having a first numerical aperture that is replaceable with a second optical member having a second numerical aperture different from the first numerical aperture so as to reduce a diffraction phenomenon caused by the illuminating light.

A gas concentration measurement device is disclosed. The gas concentration measurement device comprises: a light source unit for emitting light into the gas concentration measurement device; an incident unit for refracting the light emitted from the light source unit; a first reflection unit and a second reflection unit for reflecting the incident light; a rotatable third reflection unit; and a light receiving unit for measuring the amount of incident light, wherein the light incident from the incident unit is reflected between the first reflection unit and the second reflection unit through the third reflection unit, and the light is incident on the light receiving unit by allowing an optical path thereof to be changed according to the rotation of the third reflection unit.

Method includes positioning a first carrier assembly on a system stage. The carrier assembly includes a support frame having an inner frame edge that defines a window of the support frame. The first carrier assembly includes a first substrate that is positioned within the window and surrounded by the inner frame edge. The first substrate has a sample thereon. The method includes detecting optical signals from the sample of the first substrate. The method also includes replacing the first carrier assembly on the system stage with a second carrier assembly on the system stage. The second carrier assembly includes the support frame and an adapter plate held by the support frame. The second carrier assembly has a second substrate held by the adapter plate that has a sample thereon. The method also includes detecting optical signals from the sample of the second substrate.

Method includes positioning a first carrier assembly on a system stage. The carrier assembly includes a support frame having an inner frame edge that defines a window of the support frame. The first carrier assembly includes a first substrate that is positioned within the window and surrounded by the inner frame edge. The first substrate has a sample thereon. The method includes detecting optical signals from the sample of the first substrate. The method also includes replacing the first carrier assembly on the system stage with a second carrier assembly on the system stage. The second carrier assembly includes the support frame and an adapter plate held by the support frame. The second carrier assembly has a second substrate held by the adapter plate that has a sample thereon. The method also includes detecting optical signals from the sample of the second substrate.

There is an inspection system including multiple inspection units configured to inspect substrates, wherein each of the inspection units includes: a tester configured to inspect a substrate; a moving part configured to hold and move the substrate relative to the tester; and a frame structure configured to accommodate the tester and the moving part, wherein the frame structure of one inspection unit includes: a first frame to be connected to a frame structure of another inspection unit; and a second frame that accommodates at least the moving part and is configured to move relative to the first frame to extract the moving part from the first frame.

A surface inspection device (1) according to the present invention comprises: a plate-shaped sample holding member (3) which can hold a sample (2); a spindle motor (4) for rotating the sample holding member (3); a turntable (5) which is fixed to the spindle motor (4) and rotated by the spindle motor (4); a frame (6) to which the spindle motor (4) is fixed; a plurality of support members (12) each having one end fixed to the sample holding member (3) and the other end fixed to the turntable (5), the support members supporting the sample holding member (3) such that the sample holding member is displaceable in a focus direction which is the height direction with respect to the turntable (5); and a sample drive unit (11) which displaces the sample holding member (3) in the focus direction with respect to the turntable (5). This surface inspection device (1) can accurately drive the sample (2) in the focus direction.

The motion of a mechanical stage may be directed in x-, y-, and/or z-dimensions such that excitation of a resonant frequency f is reduced. In particular, once a resonant frequency f is identified, the acceleration of the stage in the x-, y-, and/or z-dimensions may divided into an even number of acceleration segments or intervals, with the second of each pair of acceleration segments starting 1/(2f) seconds after the start of the initial acceleration segment. The acceleration intervals may be defined by a start time, an amplitude profile, and/or a time duration. In some implementations, the amplitude and time duration of each acceleration pulse may be different. The amplitude and time duration of acceleration steps may be determined and adjusted to compensate for the particular resonance frequency of an individual system, and programmed into a controller for the stage using motor programming controls.

The invention includes an improvement in a method of assessing a gemstone having at least one planar face with an internally reflecting surface including the steps of optically modifying the at least one planar face of the gemstone to return a sample beam from an internally reflecting plane corresponding to the at least one planar face to an optical coherence tomography (OCT) system; selectively directing the sample beam from an optical coherence tomography (OCT) system onto the gemstone; and generating an OCT image map of the gemstone to determine volume, gem carat weight and/or quality.