According to the present invention there is provided a method of inspecting a component (10), using an assembly comprising a camera (3) with a fixed position, and a moveable stage (5), wherein the moveable stage is configured such that it can rotate about a rotation axis (7), and, can move linearly along two linear axes (9a, 9b) wherein said two linear axes are perpendicular to one another and wherein both of said two linear axes are each perpendicular to the rotation axis, the method comprising the steps of, (a) providing a first component into a predefined orientation on the stage, such that a first side of the component is facing a camera; (b) moving the stage linearly along one or more of said two linear axes so as to bring the first side of the first component into focus of the camera; (c) capturing an image of the first side of the first component after it has been brought into focus of the camera. An assembly according to the above comprising additionally a processor which is configured to determine whether the image of the component is in-focus of the camera, and if not, to determine a movement of the moveable stage and to initiate the moveable stage to undergo said determined movement so as to bring the component into focus is also provided.

Provided is a spectrophotometric device including a base plate including a first surface to accommodate a sample thereon, a rotatable plate including a second surface corresponding to and spaced a certain distance apart from the first surface, a test beam radiator connected to the first surface through a first beam guide to radiate a test beam to the sample accommodated on a beam path between the first and second surfaces, a spectrophotometer connected to the second surface through a second beam guide to analyze spectroscopic properties of the sample by analyzing a characteristic beam having passed through the sample accommodated on the beam path, and a state determiner provided near the beam path to determine whether the sample accommodated between the first and second surfaces is in a state in which analysis of optical properties is enabled.

A computer-implemented method for performing photometric cuvette mapping includes detecting edges associated with a plurality of gaps between a plurality of vessels in a reaction ring during a complete rotation of a reaction ring. Each gap is determined according to an edge detection process which includes identifying: a vessel interior in response to detection of a first predetermined number of photometer device control manager (DCM) measurements below a threshold value; a rising edge in response to detection of a second predetermined number of photometer DCM measurements above the threshold value; and identifying a falling edge in response to detection of a third predetermined number of photometer DCM measurements below the threshold value. The edge detection process further includes recording the rising edge and the falling edge as being indicative of one of the plurality of gaps.

This invention concerns spectroscopy apparatus comprising a light source arranged to generate a light profile on a sample, a photodetector having at least one photodetector element for detecting characteristic light generated from interaction of the sample with light from the light source, a support for supporting the sample, the support movable relative to the light profile, and a processing unit. The processing unit is arranged to associate a spectral value recorded by the photodetector element at a particular time with a point on the sample predicted to have generated the characteristic light recorded by the photodetector element at the particular time based on. relative motion anticipated to have occurred between the support and the light profile.

A wafer table structure providing a single wafer table surface suitable for handling both wafers and film frames includes a base tray having a set of compartments formed therein by way of a set of ridges formed in or on an interior base tray surface; a hardenable fluid permeable compartment material disposed within the set of base tray compartments; and a set of openings formed in the base tray interior surface by which the hardened compartment material is exposable to negative or positive pressures. The base tray includes a first ceramic material (e.g., porcelain), and the hardenable compartment material includes a second ceramic material. The base tray and the compartment material are simultaneously machinable by way of a standard machining process to thereby planarize exposed outer surfaces of the base tray and the hardened compartment material at an essentially identical rate for forming a highly or ultra-planar wafer table surface.

In a spectroscopic analysis system, a broadband light source emits infra-red, visible or ultra-violet light which is transmitted through a fluid in a sample cell to a broadband detector. Changes in transmitted intensity are related to measurand in the fluid. A rotatable optical modulator or chopper, driven by an electric motor and located in the optical path, has light-transmissive optical elements, and non-transmissive regions. A non-contact magnetic field generator applies a magnetic field to the modulator or chopper to damp or brake the rotation. In an aspect, the modulator is an electrically conductive, non-ferromagnetic wheel, disc or cylinder in which eddy currents are induced. Optical elements may be apertures, filters, cuvettes, etc. A Hall effect sensor, rotary encoder, optical switch, etc. may determine angular speed or position of the modulator, and a PID controller may be used to maintain rotation speed at a setpoint by modulating an electromagnetic field generator.

A lifter assembly for an optical system includes a chuck having a chuck base and a detachable top plate, wherein the detachable top plate is one of a plurality of interchangeable detachable top plates configured to support a substrate. The lifter assembly also includes a moveable plate supporting the chuck on an upper surface of the moveable plate, the moveable plate vertically adjustable between a lower, retracted position and an upper, extended position. The lifter assembly further includes a bellows structure operatively coupled to the moveable plate. The lifter assembly yet further includes a pneumatic system fluidly coupled to the bellows structure to selectively expand and contract, wherein expansion of the bellows structure vertically adjusts the moveable plate to the upper, extended position and contraction of the bellows structure vertically adjusts the moveable plate to the lower, retracted position.

A mask inspection device and method thereof are provided. In the mask inspection device, an image capturing module is controlled to capture an image of the object to be inspected, and when the captured image does not match a predetermined correction image, a horizontal position of the bearing module which holds the object is adjusted; when the captured image matches the predetermined correction image, a light emission element projects a spot light towards the object, and the image capturing module captures an image in a mask region of the object, so as to produce a mask inspection image. The mask inspection information can be obtained from a two-dimensional image of the mask inspection image, and an abnormal image of the mask inspection image is inspected to generate mask abnormal information.

A multifunction wafer and film frame handling system includes a wafer table assembly having a wafer table providing an ultra-planar wafer table surface configured for carrying a wafer or a film frame, and at least one of: a flattening apparatus configured for automatically applying a downward force to portions of a warped or non-planar wafer in a direction normal to the wafer table surface; a displacement limitation apparatus configured for automatically constraining or preventing uncontrolled lateral motion of a wafer relative to the wafer table surface after cessation of an applied negative pressure and application of a positive pressure to the underside of the wafer via the wafer table; and a rotational misalignment compensation apparatus configured for automatically compensating for a rotational misalignment of a wafer mounted on a film frame.

Improved gas leak detection from moving platforms is provided. Automatic horizontal spatial scale analysis can be performed in order to distinguish a leak from background levels of the measured gas. Source identification can be provided by using isotopic ratios and/or chemical tracers to distinguish gas leaks from other sources of the measured gas. Multi-point measurements combined with spatial analysis of the multi-point measurement results can provide leak source distance estimates. These methods can be practiced individually or in any combination.