Implementations disclosed describe, among other things, a system and a method of using a wafer inspection system that includes a plurality of inspection heads configured to concurrently inspect a separate region of a plurality of regions of a wafer. Each inspection head includes an illumination subsystem to illuminate a corresponding region of the wafer, a collection subsystem to collect a portion of light reflected/scattered from the corresponding region of the wafer. Each inspection head further includes a light detection subsystem to detect the collected light and generate one or more signals representative of a state of the corresponding region of the wafer. The wafer inspection system further includes a processing device configured to determine, using the one or more signals received from each of the inspection heads, the quality of the wafer.

The present invention relates to a system and method for monitoring changes in reagent concentration, and in particular, to a system and method for monitoring for changes in reagent concentrations within small volumes of liquids in contact with a biological sample disposed on a substrate such as a microscope slide. The disclosed system and method utilize changes in electromagnetic properties associated with an interface between the substrate and a liquid applied to the biological sample in order to provide information regarding changes in reagent concentration within the liquid.

The invention includes an improvement in a method of assessing a gemstone having at least one planar face with an internally reflecting surface including the steps of optically modifying the at least one planar face of the gemstone to return a sample beam from an internally reflecting plane corresponding to the at least one planar face to an optical coherence tomography (OCT) system; selectively directing the sample beam from an optical coherence tomography (OCT) system onto the gemstone; and generating an OCT image map of the gemstone to determine volume, gem carat weight and/or quality.

Improved gas leak detection from moving platforms is provided. Automatic horizontal spatial scale analysis can be performed in order to distinguish a leak from background levels of the measured gas. Source identification can be provided by using isotopic ratios and/or chemical tracers to distinguish gas leaks from other sources of the measured gas. Multi-point measurements combined with spatial analysis of the multi-point measurement results can provide leak source distance estimates. These methods can be practiced individually or in any combination.

An optical measuring device including a sample placement portion for a measurement sample to be placed therein; a light source portion for emitting a measurement beam toward the measurement sample that is placed in the sample placement portion; and a detector for detecting sample information from a measurement sample that is disposed in the sample placement portion; a cover portion that is able to open and close, for accessing the interior of the sample placement portion, is formed on the sample placement portion; an optical element member for not transmitting light of at least a prescribed wavelength band within the measurement beam; and a driving mechanism that is linked mechanically with the opening and closing of the cover portion to move the optical element member.

Automatically correcting for rotational misalignment of a wafer improperly mounted on a film frame includes capturing an image of portions of the wafer using an image capture device, prior to initiation of a wafer inspection procedure by an inspection system; digitally determining a rotational misalignment angle and a rotational misalignment direction of the wafer relative to the film frame and/or a set of reference axes of a field of view of the image capture device; and correcting for the rotational misalignment of the wafer by way of a film frame handling apparatus separate from the inspection system, which is configured for rotating the film frame across the rotational misalignment angle in a direction opposite to the rotational misalignment direction. Such film frame rotation can occur prior to placement of the film frame on the wafer table, without decreasing film frame handling throughput or inspection process throughput.

Improved gas leak detection from moving platforms is provided. Automatic horizontal spatial scale analysis can be performed in order to distinguish a leak from background levels of the measured gas. Source identification can be provided by using two or more tracer measurements of isotopic ratios and/or chemical tracers to distinguish gas leaks from other sources of the measured gas. Multi-point measurements combined with spatial analysis of the multi-point measurement results can provide leak source distance estimates. Qualitative source identification is provided. These methods can be practiced individually or in any combination.

A system for placing a sample at a predefined measurement location for measuring an optical property of that sample. The apparatus includes a measurement platform for supporting the sample at the measurement location, the measurement platform having an orifice therein beneath the measurement location, and a nozzle configured to retain the sample therein when a vacuum is applied to the nozzle. The sample is contacted by the nozzle, and a vacuum is applied to the nozzle so that the sample is retained therein by air pressure. The nozzle with the sample retained therein is then transported to the measurement location. The vacuum at the nozzle is disabled to release the sample from the nozzle, and a vacuum is applied to the orifice in the measurement platform so as to retain the sample on the measurement platform. The nozzle is then retracted away from the measurement platform.

An automated station includes a plurality of panels forming an enclosure, a camera positioned within the enclosure, a light fixture positioned within the enclosure, a turntable positioned within the enclosure, an inspection device, and a computer controller functionally coupled to the camera, the light fixture, the turntable, and the inspection device. The computer controller controls the operation of the camera, the light fixture, the turntable, and the inspection device based on information received by the computer controller about an object to be photographed and inspected by the station.

A method includes receiving an object into an automated station and a computer controller functionally coupled to the automated station performing the steps of: receiving information about the object, automatically adjusting one or more configuration options of the automated station based on the received information, and receiving input about whether the automated station will photograph the object, inspect the object, or both.

A device and method tests preforms that are rotationally symmetrical with respect to an axis of rotation during their conveyance along a conveyance path. The device and method tests only a statistically relevant number of produced preforms, thus allowing substantial reduction in the constructive complexity required for aligning the preforms prior to being tested. A certain number of preforms that have not been correctly aligned are allowed to continue along the conveyance path without being tested.