Patent classifications
G01N2201/063
Optical System for the Spectral Component Analysis of Non-Solid Media
An optical system (10) for a spectral component analysis of non-solid media, the system comprising: one or several light emitter assemblies (3), each comprising several light emitter modules (1) arranged in a curve along a ring-shaped circumference (3a) of the light emitter assembly (3); and one or several light detector assemblies (4), each comprising several light detector modules (2) arranged in a curve along a ring-shaped circumference (4a) of the light detector assembly (4), The light emitter assemblies (3) and the light detector assemblies (4) are coaxially arranged following one another along a common center axis (C) in an alternating manner.
Optical switch devices
An optical device includes an array of lenses and a plurality of first and second segments disposed under the array of lenses. At a first viewing angle, the array of lenses presents a first image for viewing without presenting the second image for viewing, and at a second viewing angle different from the first viewing angle, the array of lenses presents for viewing the second image without presenting the first image for viewing. In some examples, individual ones of the first and second segments can comprise specular reflecting, transparent, diffusely reflecting, and/or diffusely transmissive features. In some examples, individual ones of the first and second segments can comprise transparent and non-transparent regions. Some examples can incorporate more than one region producing an optical effect.
METHOD AND APPARATUS FOR IMAGING NONSTATIONARY OBJECT
Disclosed is an optical imaging system, and associated method, comprising a stage module configured to support an object such that an area of the object is illuminated by an illumination beam; an objective lens configured to collect at least one signal beam, the at least one signal beam originating from the illuminated area of the object; an image sensor configured to capture an image formed by the at least one signal beam collected by the objective lens; and a motion compensatory mechanism operable to compensate for relative motion of the stage module with respect to the objective lens during an image acquisition. The motion compensatory mechanism causes a compensatory motion of one or more of: said objective lens or at least one optical element thereof; said image sensor; and/or an optical element comprised within a detection branch and/or illumination branch of the optical imaging system.
OPTICAL NANOSTRUCTURE REJECTER FOR AN INTEGRATED DEVICE AND RELATED METHODS
Apparatus and methods relating to photonic bandgap optical nanostructures are described. Such optical nanostructures may exhibit prohibited photonic bandgaps or allowed photonic bands, and may be used to reject (e.g., block or attenuate) radiation at a first wavelength while allowing transmission of radiation at a second wavelength. Examples of photonic bandgap optical nanostructures includes periodic and quasi-periodic structures, with periodicity or quasi-periodicity in one, two, or three dimensions and structural variations in at least two dimensions. Such photonic bandgap optical nanostructures may be formed in integrated devices that include photodiodes and CMOS circuitry arranged to analyze radiation received by the photodiodes.
SPECTROSCOPIC ANALYSIS APPARATUS, SPECTROSCOPIC ANALYSIS METHOD, STEEL STRIP PRODUCTION METHOD, AND STEEL STRIP QUALITY ASSURANCE METHOD
A spectroscopic analysis apparatus includes: a light projecting device; a light receiving device; and an output device, wherein the light receiving device includes: a separator configured to separate reflected light into s-polarized light and p-polarized light; a detector for s-polarized light configured to output an electric signal indicating an intensity of the s-polarized light; and a detector for p-polarized light configured to output an electric signal indicating an intensity of the p-polarized light; and the output device is configured to: calculate an absorbance based on a ratio between the intensities of the s-polarized light and the p-polarized light using the electric signals output from the detector for s-polarized light and the detector for p-polarized light; and calculate either or both of the composition and the composition ratio of the surface of the measurement target object using an intensity of the absorbance at any desired wavenumber.
DEVICES AND METHODS TO MEASURE SMALL DISPLACEMENTS
Methods, devices and apparatus for measuring expansion/contraction properties of a material are described. According to an embodiment a method comprises: providing a device, said device comprising a sample comprising said material, said sample comprising a first surface and a second surface, a first substrate and a second substrate connected to said first surface and to said second surface of said sample, respectively, a reflective material attached to said second substrate, and two electrical contacts each independently in contact with said sample; applying voltage to said sample using said electrical contacts; illuminating said reflective material using a light source, such that said illumination comprises light having known and controllable polarization; collecting light reflected off said reflective material; measuring amplitude and phase of an oscillating change in polarization of the reflected light; and extracting parameters related to expansion/contraction from said reflected light measurement, thus evaluating said expansion/contraction properties of said material.
Control interface for a machine-vision lighting device
A machine-vision device including a camera system, with a camera and an integrated origin light source that is integrated into the camera system, and a lighting device with: control interface including: a plurality of light sensors each for capturing a respective origin light signal, and emitting a respective sensor signal, and an electronic unit for processing the sensor signal configured so as to transmit a respective control signal to a respective output of the processing electronic unit. The lighting device with one or more automatically controlled light sources that are external to the camera system, each connected to one respective output of the processing electronic unit by respective connection, so as to be controlled with the control signal delivered to the output. At least one light sensor is placed so as to directly capture the light emitted by one origin light source.
IMAGING REFLECTOMETER
An imaging reflectometer includes a source module configured to generate a plurality of input beams at different nominal wavelengths. An illumination pupil having a first numerical aperture (NA) is arranged so that each of the plurality of input beams passes through the illumination pupil. A large field lens is configured to receive at least a portion of each of the plurality of input beams and provide substantially telecentric illumination over a sample being imaged. The large field lens is also configured to receive reflected portions of the substantially telecentric illumination reflected from the sample. The reflected portions pass through an imaging pupil having a second NA that is lower than the first NA and are received by an imaging sensor module that generates image information.
Imaging reflectometer
An imaging reflectometer includes a source module configured to generate a plurality of input beams at different nominal wavelengths. An illumination pupil having a first numerical aperture (NA) is arranged so that each of the plurality of input beams passes through the illumination pupil. A large field lens is configured to receive at least a portion of each of the plurality of input beams and provide substantially telecentric illumination over a sample being imaged. The large field lens is also configured to receive reflected portions of the substantially telecentric illumination reflected from the sample. The reflected portions pass through an imaging pupil having a second NA that is lower than the first NA and are received by an imaging sensor module that generates image information.
PROCESS AND SYSTEM FOR MEASURING MORPHOLOGICAL CHARACTERISTICS OF FIBER LASER ANNEALED POLYCRYSTALLINE SILICON FILMS FOR FLAT PANEL DISPLAY
A method of measuring morphological characteristics of a laser annealed film having a crystalline structure, which is defined by at least one row of side-to-side positioned grains each having a length (Lg), which is uniform for the grains, and width (Wg), wherein a length of the row (Lr) corresponds to a cumulative width Wg of the grains and creates a diffraction of various orders of diffraction, the method includes generating a monochromatic light; training the monochromatic light onto a surface of the laser annealed film at an angle varying in a range between 0 (incident) and grazing angles; and measuring variations of properties of the monochromatic light diffracted from the surface, thereby measuring the morphological characteristics of the laser annealed film along the length (Lr) of the one row.