The inventors discovered that viscosity of a protein solution can be estimated by measuring the apparent particle size or apparent molecular weight by a small angle X-ray scattering (SAXS) method or X-ray solution scattering method, which enables measurement of small amounts of samples, and then correlating those measurement results with viscosity of the protein solution.

The disclosure provides an apparatus for aligning first and second plates that are parallel to each other and have the same orientation. The apparatus includes a detector that detects composite small-angle X-ray scattering emitted from patterns of the first and second plates that are perpendicularly impinged by X-ray, and a moving unit that aligns the first and second plates according to a composite amplitude distribution of the composite small-angle X-ray scattering. Therefore, the first and second plates are aligned to each other accurately.

According to an aspect of the present invention, provided is an information processing apparatus, comprising: a processor configured to execute a program so as to output a diagnostic result diagnosing an analysis profile result by inputting an input profile result in relation to an intensity of X-ray from a thin film and the analysis result of the input profile result to a neural network, wherein the neural network is a neural network that is allowed to machine-learn teacher data using input profile data in relation to an intensity of X-ray from a thin film and analysis profile data obtained from the input profile data as input data, and using diagnostic data obtained by diagnosing the analysis profile data as output data.

Methods and systems for reducing the effect of finite source size on illumination beam spot size for Transmission, Small-Angle X-ray Scatterometry (T-SAXS) measurements are described herein. A beam shaping slit having a slender profile is located in close proximity to the specimen under measurement and does not interfere with wafer stage components over the full range of angles of beam incidence. In one embodiment, four independently actuated beam shaping slits are employed to effectively block a portion of an incoming x-ray beam and generate an output beam having a box shaped illumination cross-section. In one aspect, each of the beam shaping slits is located at a different distance from the specimen in a direction aligned with the beam axis. In another aspect, the beam shaping slits are configured to rotate about the beam axis in coordination with the orientation of the specimen.

Methods and systems for generating X-ray illumination from a laser produced plasma (LPP) employing a liquid sheet jet target are presented herein. A highly focused, short duration laser pulse is directed to a liquid sheet jet target. The interaction of the focused laser pulse with the sheet jet target ignites a plasma. In some embodiments, the liquid sheet jet is generated by a convergent capillary nozzle or a convergent, planar cavity nozzle. In some embodiments, the target material includes one or more elements having a relatively low atomic number. In some embodiments, the liquid sheet jet LPP light source generates multiple line or broadband X-ray illumination in a soft X-ray (SXR) spectral range used to measure structural and material characteristics of semiconductor structures. In some embodiments, Reflective, Small-Angle X-ray Scatterometry measurements are performed with a liquid sheet jet LPP illumination source as described herein.

A method of processing a glass material includes guiding and/or focusing light from a light source to glass material in a hot stage of a processing system, where the light source provides light at a wavelength λ that interacts with crystals that may be formed in the glass material. The method includes collecting and/or guiding light directed from the glass material in the hot stage to a wavelength separator, and separating the light directed from the glass material to provide a spectrum δ having wavelengths that are within about twenty nanometers of the wavelength λ. The method includes observing with a detector light of the spectrum δ to identify nano-scale shifts in the wavelength λ caused by interaction with crystals, if present, within the glass material in the hot stage of the processing system.

A method includes obtaining a dark-field signal generated from a dark-field CT scan of an object, wherein the dark-field CT scan is at least a 360 degree scan. The method further includes weighting the dark-field signal. The method further includes performing a cone beam reconstruction of the weighted dark-field signal over the 360 degree scan, thereby generating volumetric image data. For an axial cone-beam CT scan, in one non-limiting instance, the cone-beam reconstruction is a full scan FDK cone beam reconstruction. For a helical cone-beam CT scan, in one non-limiting instance, the dark-field signal is rebinned to wedge geometry and the cone-beam reconstruction is a full scan aperture weighted wedge reconstruction. For a helical cone-beam CT scan, in another non-limiting instance, the dark-field signal is rebinned to wedge geometry and the cone-beam reconstruction is a full scan angular weighted wedge reconstruction.

Methods and systems for performing measurements of semiconductor structures based on high-brightness, Soft X-Ray (SXR) illumination over a small illumination spot size with a small physical footprint are presented herein. In one aspect, the focusing optics of an SXR based metrology system project an image of the illumination source onto a specimen under measurement with a demagnification of at least 1.25. In a further aspect, an illumination beam path from the x-ray illumination source to the specimen under measurement is less than 2 meters. In another aspect, SXR based measurements are performed with x-ray radiation in the soft x-ray region (i.e., 80-3000 eV). In some embodiments, SXR based measurements are performed at grazing angles of incidence in a range from near zero degrees to 90 degrees. In some embodiments, the illumination optics project an image of an illumination source onto a specimen under measurement with a demagnification of 50, or less.

Automated analysis of particle beam measurement results is facilitated by a device that calculates a spatial parameter distribution representing spatial structure of a sample based on a scattering pattern corresponding to projection of the spatial structure of the sample to wavenumber space, the projection being obtained by detecting scattering of a particle beam which enters the sample and intersects with the sample. The device includes a section to provide estimates for signals on the scattering pattern in association with at which point on a spatial parameter distribution of the sample interactions occur during scattering; a section to aggregate estimation results of the interaction estimation section to calculate a spatial parameter distribution of a sample matching an aggregated result; and a section to perform alternately and repeatedly estimation in the interaction estimation section and calculation in the parameter distribution calculation section in order to improve estimation accuracy in spatial parameter distributions.

A transmission type small-angle scattering device of the present invention includes a goniometer 10 including a rotation arm 11. The rotation arm 11 is freely turnable around a θ-axis extending in a horizontal direction from an origin with a vertical arrangement state of the rotation arm being defined as the origin, and has a vertical arrangement structure in which an X-ray irradiation unit 20 is installed on a lower-side end portion of the rotation arm 11, and a two-dimensional X-ray detector 30 is installed on an upper-side end portion of the rotation arm 11 to form a vertical arrangement structure.