An analysis apparatus comprises: a moveable stage assembly; a sample holder on a top surface of the stage assembly; a first photon source and a first photon detector or detector array, the first photon source being configured to emit a first beam of photons that intercepts the surface of a sample at a first location on the sample and the first photon detector or detector array being configured to detect photons that are emitted from the first location; and a second photon source and a second photon detector or detector array, the second photon source being configured to emit a second beam of photons that intercepts the surface of the sample at a second location on the sample, the second location being spaced apart from the first location, and the second photon detector or detector array being configured to detect photons that are emitted from the second location.

Crystallographic information of crystalline sample can be determined from one or more three-dimensional diffraction pattern datasets generated based on diffraction patterns collected from multiple crystals. The crystals for diffraction pattern acquisition may be selected based on a sample image. At a location of each selected crystal, multiple diffraction patterns of the crystal are acquired at different angles of incidence by tilting the electron beam, wherein the sample is not rotated while the electron beam is directed at the selected crystal.

An x-ray weld inspection apparatus has at least one x-ray source, at least one x-ray detector, a motor arrangement configured to move the at least one x-ray source and the at least one x-ray detector substantially along a weld, and a control device. The control device comprises memory and at least one processing core, configured to control the motor arrangement to move the at least one x-ray source and the at least one x-ray detector during an x-ray weld scan substantially along the direction of the weld. At least one section of the weld is imaged at least twice during a single x-ray scan, producing at least two imaging data sets, respectively. An angle of incidence of x-rays at the at least one section of the weld is different for the imaging data sets.

The purpose of the present disclosure is to provide a pattern measurement device that can accurately measure positional deviation between a center of gravity of a top surface of a pattern and a center of gravity of a bottom surface of the pattern, even when an incidence angle of a charged particle beam varies for each irradiation position of the charged particle beam. The pattern measurement device according to the present disclosure acquires an angular deviation amount corresponding to coordinates in a visual field of a pattern in accordance with a relationship between the coordinates in the visual field of the pattern and an angular deviation amount of the charged particle beam, and acquires a positional deviation amount corresponding to the coordinates in the visual field of the pattern in accordance with a relationship between the angular deviation amount and the center of gravity positional deviation amount (see FIG. 3c).

A radiation imaging system comprises a radiation imaging apparatus having a plurality of imaging modes, and a control apparatus configured to control imaging of a radiation image with respect to the radiation imaging apparatus. The radiation imaging system comprises: an obtaining unit configured to obtain information with respect to a communication state between the radiation imaging apparatus and the control apparatus; and a display control unit configured to cause a display unit of at least one of the radiation imaging apparatus and the control apparatus to display information indicating a margin in the communication state based on an imaging mode of the radiation imaging apparatus and the information with respect to the communication state.

A scanner comprises an electromagnetic wave source; a collimator positioned to alter the electromagnetic waves emitted from the electromagnetic wave source into an electromagnetic beam; and a detector positioned to measure one or more levels of electromagnetic energy of the electromagnetic beam, wherein a collimator element is spatially adjustable in at least one axis via one or more adjusting mechanisms to change the one or more levels of electromagnetic energy measured the detector.

A support unit and a collimator are relatively rotated about the axis of rotation by a rotation driving device. The collimator has a blocking region that blocks X-rays and a transmission region that allows X-rays to pass therethrough. The transmission region has a vertex positioned on the axis of rotation, and the circumferential length of the transmission region increases proportionally as it advances outward from the vertex. A sample supported by the support unit is irradiated with X-rays by an X-ray source through the transmission region of the collimator, and the fluorescent X-rays from the sample are detected by the detector. The analysis of a composition of a sample is performed based on the fluorescent X-rays detected by the detector.

There are described herein methods and system for generating an inspection image of an object from radiographic imaging. The method comprises obtaining a plurality of digital images of the object positioned between a radiation source and a photon beam detector, the digital images taken at different object-detector distances or source-detector distances to create unique grain diffraction patterns in each one of the digital images, and forming the inspection image from image features common to the digital images at a common scale and removing the unique grain diffraction patterns.

In an approach to X-ray inspection image display systems, a colorized X-ray inspection image is received comprising a monochrome X-ray inspection image that is colorized in accordance with an X-ray inspection system false colorization scheme. The colorized X-ray inspection image is filtered by performing pixel shading on the colorized X-ray inspection image to generate a custom colorized X-ray inspection image having a custom false colorization scheme that is different from the X-ray inspection system false colorization scheme.

A sequential X-ray fluorescence spectrometer according to the present invention includes a total analysis time display unit configured to measure, for each kind of analytical sample, a standard sample which contains a component at a known content as a standard value to determine a measured intensity of each measurement line corresponding to the component. The total analysis time display unit is further configured to calculate, for each component, a counting time which gives a specified analytical precision by using the standard value and the measured intensity and to calculate a total counting time as a sum of the counting times of respective components. The total analysis time display unit is configured to calculate a total analysis time as a sum of the total counting time and a total non-counting time and to output the calculated total analysis time and the calculated counting times of the respective components.