A magnetic measurement system includes an X-ray source, a monochromator that converts right- and left-polarization X-ray into right- and left-monochromatic X-ray, an aperture slit that allows the right- and left-monochromatic X-ray to pass through, an analytical section, and piezoelectric scanning devices. The analytical section has a Fresnel zone plate that receives and focuses the right- and left-monochromatic X-ray on a single point being 10 nm or less wide of a magnetic sample, an order-sorting aperture that allows the focused X-ray to selectively pass through, a sample-stage that sets a comparatively thick magnetic sample that is more than 150 nm thick and less than or equal to 1000 nm thick to be irradiated with the X-ray, and an X-ray-detector that detects transmittance of transmission X-ray passing through the comparatively thick sample and that generates X-ray magnetic circular dichroism (XMCD) data by directly measuring the detected transmittance of the transmission X-ray.

A system and an apparatus are provided to measure magnetic characteristic of crystal grains composing magnetic polycrystalline materials in the magnetic field or nonmagnetic field by X-ray magnetic circular dichroism (XMCD). In particular, the system and the apparatus measure the magnetic characteristic of comparatively very thick materials.

Only X-rays having a specific wavelength out of focusing X-rays 2 diffracted from a sample S is reflected from a monochromator 60 based on a Bragg's condition, passed through a receiving slit 30 and detected by an X-ray detector 20. The monochromator 60 is configured to be freely removable, and arranged between the sample S and a focal point 2a at which the focusing X-rays 2 diffracted from the sample S are directly focused. At this time, the monochromator 60 is approached to the focal point 2a as closely as possible. The monochromator 60 comprises a multilayer mirror having an internal interplanar spacing which varies continuously from one end to the other end.

An X-ray optics assembly for an X-ray diffractometer is provided, comprising a multilayer mirror, in particular a Goebel mirror, and a switching system with which beam paths for an X-ray beam are selectable. The X-ray optics assembly includes a monochromator, in particular a channel-cut crystal, and three beam paths for the X-ray beam are selectable using the switching system. A first beam path in a first position of the switching system leads past the multilayer mirror and leads past the monochromator, a second beam path in a second position of the switching system contains the multilayer mirror and leads past the monochromator, and a third beam path in a third position of the switching system contains the multilayer mirror and contains the monochromator. The invention provides an X-ray optics assembly and an X-ray diffractometer which may be used even more universally for various measurement geometries in a simple manner.

An X-ray irradiation apparatus (100) comprises an X-ray source device (110) for creating X-rays (2) with a polychromatic spectrum and an X-ray optic device (120) with a beam axis (3) that is longitudinal, wherein the X-ray optic device (120) comprises a reflector device (121) that is polycrystalline having a reflector geometry, a reflector mosaicity and a reflector thickness and the reflector device (121) is arranged for receiving a portion of the X-rays (2) within an acceptance angle of the reflector device (121) and for creating an X-ray beam (4) by Bragg reflection, which is directed along the beam axis (3) towards a focal position thereof and has a spectral distribution determined by the polychromatic spectrum of the X-rays (2), the reflector geometry, the reflector mosaicity and the reflector thickness, and wherein the X-ray irradiation apparatus (100) further comprises a spectral filter aperture device (122) that is arranged downstream from the reflector device (121) for creating a filter gap (123) transmitting a first spectral portion (4A) of the spectral distribution of the X-ray beam (4) and blocking a second spectral portion (4B) and a third spectral portion (4C) of this spectral distribution, wherein the first spectral portion (4A) has higher energies than the second spectral portion (4B) and lower energies than the third spectral portion (4C), wherein the reflector device (121) has an acceptance solid-angle of at least 100 micro-steradian, and wherein the reflector geometry, the reflector mosaicity, the reflector thickness and the acceptance angle of the reflector device (121) are selected such that simultaneously a radiation flux in the first spectral portion (4A) is at least 1% of an incoming flux of the same spectral portion of the X-rays (2) received by the reflector device (121) with a peak reflectivity of at least 1%, the first spectral portion (4A) has a spectral bandwidth of at most 15%, the second and third spectral portions (4B, 4C) have a flux reduced by at least three orders of magnitude compared with the flux in the first spectral portion (4A), and the X-ray beam (4) has a focal spot size of less than 1.5 mm in both transverse dimensions relative to the longitudinal beam axis. Furthermore, an X-ray fluorescence imaging apparatus (200) and a method of using the X-ray irradiation apparatus (100) are described.

Disclosed is an X-ray topography apparatus including an X-ray source, a multilayer film mirror, a slit, a two-dimensional X-ray detector, and a sample moving device that sequentially moves the sample to a plurality of step positions. The X-ray source is a minute focal spot. The multilayer film mirror forms monochromatic, collimated, high-intensity X-rays. The direction in which the multilayer film mirror collimates the X-rays coincides with the width direction of the slit. The step size by which the sample is moved is smaller than the width of the slit. The combination of the size of the minute focal spot, the width of the slit, and the intensity of the X-rays that exit out of the multilayer film mirror allows the contrast of an X-ray image produced when the detector receives X-rays for a predetermined period of 1 minute or shorter to be high enough for observation of the X-ray image.

A support structure having multiple highly aligned curved x-ray optics, the support structure having multiple internal partially or fully concentric surfaces upon which said optics are mounted, thereby aligning said optics along a central optical axis thereof and therefore to a source, sample, and/or detector in combination with which the support structure is useable. The surfaces may be nested around the central optical axis; and the support structure may divided longitudinally into sections around the central optical axis by walls. At least one of the x-ray optics comprises a curved diffracting optic, for receiving a diverging x-ray beam and focusing the beam to a focal area, in one embodiment a focusing monochromating optic. In an improved embodiment, an optic comprises a single layer, plastically deformed, LiF optic.

A sample handling apparatus/technique/method for a material analyzer, which provides active, variable concentration of a sample, using a measurement marker introduced into the sample, to measurably concentrate an analyte in a liquid (e.g., water) sample. Active, variable concentration allows otherwise lower level analytes to be concentrated in a measurable way. This enables measurements at higher (e.g., concentrated) levels, which can be extrapolated to obtain their lower, original levels based on the concentration levelmeasured using the introduced marker as a guide. The sample handling apparatus may be used in combination with an optic-enabled x-ray analyzer, the x-ray analyzer including an x-ray engine with an x-ray excitation path and an x-ray detection path, usable during both during the concentration and analyte measurement.

An analysis device includes an X-ray generation part configured to generate four monochromatic X-rays with different energies to irradiate a sample, an electrically conductive sample stage configured to place the sample thereon and formed of an electrically conductive material, an electrode configured to detect an electric current carried by irradiating the sample with the four monochromatic X-rays with different energies, and an electric power source configured to apply a voltage between the electrically conductive sample stage and the electrode, wherein the four monochromatic X-rays with different energies are X-rays included within a range from an absorption edge of a compound semiconductor included in the sample to a higher energy side of 300 eV.

An x-ray fluorescence system and method of fabrication are provided which include a titanium x-ray source, a focusing, doubly-curved lithium fluoride (LiF) crystal optic, and a detector. The titanium x-ray source includes a titanium target on which electrons impinge to generate a diverging x-ray beam with a titanium-based characteristic energy, and the focusing, doubly-curved LiF crystal optic monochromates and focuses the diverging x-ray beam from the titanium x-ray source to provide a monochromated and focused x-ray excitation beam directed to impinge on a sample. The crystal optic and the titanium x-ray source operate at a Bragg angle which facilitates polarization within the x-ray fluorescence system. The detector receives fluorescence from the sample induced by the x-ray excitation beam impinging thereon, with the fluorescence is indicative of a concentration of at least one element in the sample.