Provided is a scanning probe microscope, and in particular, a scanning probe microscope capable of scanning a large area using a probe including a plurality of conductive tips and capable of simply generating a surface image of a sample with high resolution by recognizing only two binary states of contact/non-contact between the conductive tips and a surface of the sample.

A scanning probe microscope that includes a probe, a positioning unit configured to position a probe on a measurement sample, an excitation unit configured to excite the measurement sample at a predetermined frequency, a resonance unit configured to output a frequency modulation signal by converting a change of a capacitance of the measurement sample, a lock-in amplifier configured to output a differential capacitance signal obtained by extracting a predetermined frequency component and a harmonic component of the predetermined frequency of the demodulated signal, a conversion unit configured to output data indicative of a relationship between a voltage applied to the measurement sample and the capacitance, a detecting unit that detects a voltage value corresponding to a feature point of the relationship data, and a main measurement control unit that measures electrical characteristics of the measurement sample subjected to a DC bias voltage substantially equal to the feature point voltage.

The present application relates to a method for avoiding damage when analyzing a sample surface with a scanning probe microscope, the method comprising the step of: detecting an electrostatic interaction between a charging of the sample surface and a measuring tip of the scanning probe microscope in the course of the approach of the measuring tip to the sample surface already at a distance from the sample surface which is greater than the distance of the measuring tip when analyzing the sample surface.

Atomic force microscopy apparatus and method that enable observing charge generation transients with nanometer spatial resolution and nanosecond to picosecond time resolution, the timescale relevant for studying photo-generated charges in the world's highest efficiency photovoltaic films. The AFM apparatus includes an AFM, a light source for illumination of a sample operatively coupled to the AFM, a voltage source operatively coupled to the AFM, and a control circuitry operatively coupled to the light source and the voltage source. The AFM apparatus improves the time resolution and enables rapid acquisition of photocapacitance transients in a wide array of solar-energy-harvesting materials.

Atomic force microscopy apparatus and method that enable observing charge generation transients with nanometer spatial resolution and nanosecond to picosecond time resolution, the timescale relevant for studying photo-generated charges in the world's highest efficiency photovoltaic films. The AFM apparatus includes an AFM, a light source for illumination of a sample operatively coupled to the AFM, a voltage source operatively coupled to the AFM, and a control circuitry operatively coupled to the light source and the voltage source. The AFM apparatus improves the time resolution and enables rapid acquisition of photocapacitance transients in a wide array of solar-energy-harvesting materials.

Costs may be avoided and yields improved by applying scanning probe microscopy to substrates in the midst of an integrated circuit fabrication process sequence. Scanning probe microscopy may be used to provide conductance data. Conductance data may relate to device characteristics that are normally not available until the conclusion of device manufacturing. The substrates may be selectively treated to ameliorate a condition revealed by the data. Some substrates may be selectively discarded based on the data to avoid the expense of further processing. A process maintenance operation may be selectively carried out based on the data.

Systems and methods for manufacturing multiple integrated tip probes for scanning probe microscopy. According to an embodiment is a microscope probe configured to analyze a sample, the microscope probe including: a movable probe tip including a terminal probe end; a first actuator configured to displace the movable probe tip along a first axis; and a detection component configured to detect motion of the movable probe tip in response to an applied signal; where the moveable probe tip comprises a metal layer affixed to a supporting layer, at least a portion of the metal layer at the terminal probe end extending past the supporting layer.

Systems and methods for manufacturing multiple integrated tip probes for scanning probe microscopy. According to an embodiment is a microscope probe configured to analyze a sample, the microscope probe including: a movable probe tip including a terminal probe end; a first actuator configured to displace the movable probe tip along a first axis; and a detection component configured to detect motion of the movable probe tip in response to an applied signal; where the moveable probe tip comprises a metal layer affixed to a supporting layer, at least a portion of the metal layer at the terminal probe end extending past the supporting layer.

The present invention relates to a method for measuring the dielectric properties of a sample with a scanning probe microscope. In particular, the invention relates to highly-localized optical imaging and spectroscopy on a sample surface using an atomic force microscope (AFM) probe mechanically driven at two oscillation frequencies, referred to herein as “active bimodal operation”, and a modulated source of electromagnetic radiation.

The present invention relates to a method for measuring the dielectric properties of a sample with a scanning probe microscope. In particular, the invention relates to highly-localized optical imaging and spectroscopy on a sample surface using an atomic force microscope (AFM) probe mechanically driven at two oscillation frequencies, referred to herein as “active bimodal operation”, and a modulated source of electromagnetic radiation.