Scanning Probe Microscope (SPM) system configured with the use of a composite material employing a non-metallic matrix and at least one of diamond particles, fused silica particles, boron carbide particles, silicon carbide particles, aluminum oxide particles, carbon fiber elements, carbon nanotube elements, and doped diamond particles to increase the structural integrity and/or strength of the SPM system, and a fraction of reinforcement ranging from at least 25% to at least 75% with advantageous modification of the Young's modulus, coefficient of thermal expansion, and thermal conductivity.

The surface of the atomic force microscopy (AFM) cantilever is defined by a main cantilever body and an island. The island is partly separated from the main body by a separating space between facing edges of the main body and the island. At least one bridge connects the island to the main body, along a line around which the island is able to rotate through torsion of the at least one bridge. The island has a probe tip located on the island at a position offset from said line and a reflection area. In an AFM a light source directs light to the reflection area and a light spot position detector detects a displacement of a light spot formed from light reflected by the reflection area, for measuring an effect of forces exerted on the probe tip.

A probe assembly for a surface analysis instrument such as an atomic force microscope (AFM) that accommodates potential thermal drift effects includes a substrate defining a base of the probe assembly, a cantilever extending from the base and having a distal end, and a reflective pad disposed at or near the distal end. The reflective pad has a lateral dimension (e.g., length) between about twenty-five (25) microns, and can be less than a micron. Ideally, the reflective pad is patterned on the cantilever using photolithography. A corresponding method of manufacture of the thermally stable, drift resistant probe is also provided.

A method for implementing a transistor using multiple integrated probe tips is provided. The method comprises the steps of (1) providing a sample; (2) providing a microscope probe comprising a plurality of probe tips; (3) contacting a first outer probe tip of the plurality of probe tips to the sample, wherein he first outer probe tip is configured to act as a source terminal for a transistor; (4) contacting a second outer probe tip of the plurality of probe tips to the sample, wherein the second outer probe tip is configured to act as a drain terminal for the transistor; (5) using an inner probe tip of the plurality of probe tips as a gate terminal for the transistor; and (6) characterizing the sample with the plurality of probe tips.

A method for implementing a transistor using multiple integrated probe tips is provided. The method comprises the steps of (1) providing a sample; (2) providing a microscope probe comprising a plurality of probe tips; (3) contacting a first outer probe tip of the plurality of probe tips to the sample, wherein he first outer probe tip is configured to act as a source terminal for a transistor; (4) contacting a second outer probe tip of the plurality of probe tips to the sample, wherein the second outer probe tip is configured to act as a drain terminal for the transistor; (5) using an inner probe tip of the plurality of probe tips as a gate terminal for the transistor; and (6) characterizing the sample with the plurality of probe tips.

The present invention refers to a method for modifying a scanning probe microscope (SPM) tip, a modified SPM tip obtainable by the method, a modified SPM tip, to the use of the modified SPM tip, to a scanning probe comprising the modified SPM tip and to the use of the scanning probe.

The present invention refers to a method for modifying a scanning probe microscope (SPM) tip, a modified SPM tip obtainable by the method, a modified SPM tip, to the use of the modified SPM tip, to a scanning probe comprising the modified SPM tip and to the use of the scanning probe.

A SPM head incorporates a probe and a cantilever on which the probe is mounted. The cantilever has a planar reflecting surface proximate a free end of the cantilever. The cantilever extends from a mechanical mount and a single-mode optical fiber is supported by the mechanical mount to provide a beam. A micromirror is mounted to reflect the beam substantially 90° to the planar reflecting surface.

This probe production method is a method of producing a probe (101) having a coating layer (104) on a surface thereof, in which the coating layer (104) is formed on a surface of a base material (103) having a sharp tip end portion (103a) using a gas phase method.

This probe production method is a method of producing a probe (101) having a coating layer (104) on a surface thereof, in which the coating layer (104) is formed on a surface of a base material (103) having a sharp tip end portion (103a) using a gas phase method.