Patent classifications
G01Q70/14
Integrated optical nanoscale probe
A diamond probe is suitable to be attached to an Atomic Force Microscope and is created with a tip that incorporates a one or more Nitrogen Vacancy (NV) centers located near the end of the tip. The probe arm acts as an optical waveguide to propagate the emission from the NV center with high efficiency and a beveled end directs excitation light to the NV center and directs photoluminescence light emanating from the NV center into the probe arm. The light source (or a portion of the light source), a detector, as well as an RF antenna, if used, may be mounted to the probe arm. The probe with integrated components enable excitation of photoluminescence in the NV center as well as optically detected Electron Spin Resonance (ODMR) and temperature measurements, and may further serve as a light probe utilizing the physical effect of Stimulated Emission Depletion (STED).
Integrated optical nanoscale probe measurement of electric fields from electric charges in electronic devices
A diamond probe is suitable to be attached to an Atomic Force Microscope and is created with a tip that incorporates a one or more Nitrogen Vacancy (NV) centers located near the end of the tip. The probe arm acts as an optical waveguide to propagate the emission from the NV center with high efficiency and a beveled end directs excitation light to the NV center and directs photoluminescence light emanating from the NV center into the probe arm. The probe tip is scanned over an area of a sample with an electric charge, such as a field effect transistor or flash memory. Optically Detected Spin Resonance (ODMR) is measured as the probe tip is scanned over the area of the sample, from which a characteristic of the area of the sample with the electric charge may be determined.
In-plane scanning probe microscopy tips and tools for wafers and substrates with diverse designs on one wafer or substrate
Cantilevers, SPM tips and nanomachining tools are created in the plane of wafers to obtain new and high performance parts. The method produces more parts for any given wafer, then conventional methods and allows every part on any given wafer to be different from any other, permitting great freedom in new SPM and nanomachining techniques and product development.
FORMING NANOTIPS
A nanotip apparatus which includes nanotips arranged in a pattern on a semiconductor base. Each of the nanotips have a pointed tip portion and a base portion in contact with the semiconductor base. Further, each of the nanotips include a gradient of silicon germanium (SiGe) with the highest concentration of germanium being at the pointed tip portion and the lowest concentration of germanium being at the base in contact with the semiconductor base. Also disclosed is a method in which the nanotips may be formed.
Probe for Scanning Probe Microscope and Binary State Scanning Probe Microscope Including the Same
Provided is a scanning probe microscope, and in particular, a scanning probe microscope capable of scanning a large area using a probe including a plurality of conductive tips and capable of simply generating a surface image of a sample with high resolution by recognizing only two binary states of contact/non-contact between the conductive tips and a surface of the sample.
Systems and Methods for Mechanosynthesis
Methods, systems, and devices are disclosed for performing mechanosynthesis, including those that involve bulk chemical preparation of tips, multiple tips for supplying feedstock, and use of sequential tips such as in a thermodynamic cascade; such features may simplify starting requirements, increase versatility, and/or reduce complexity in the mechanosynthesis equipment and/or process.
Systems and Methods for Mechanosynthesis
Methods, systems, and devices are disclosed for performing mechanosynthesis, including those that involve bulk chemical preparation of tips, multiple tips for supplying feedstock, and use of sequential tips such as in a thermodynamic cascade; such features may simplify starting requirements, increase versatility, and/or reduce complexity in the mechanosynthesis equipment and/or process.
Device, and Method of Manufacture, for use in Mechanically Cleaning Nanoscale Debris from a Sample Surface
A mechanical method of removing nanoscale debris from a sample surface using an atomic force microscope (AFM) probe. The probe is shaped to include an edge that provides shovel-type action on the debris as the probe is moved laterally to the sample surface. Advantageously, the probe is able to lift the debris without damaging the debris for more efficient cleaning of the surface. The edge is preferably made by focused ion beam (FIB) milling the diamond apex of the tip.
SYSTEMS AND METHODS FOR MANUFACTURING NANO-ELECTRO-MECHANICAL-SYSTEM PROBES
Systems and methods for manufacturing multiple integrated tip probes for scanning probe microscopy. According to an embodiment is a microscope probe configured to analyze a sample, the microscope probe including: a movable probe tip including a terminal probe end; a first actuator configured to displace the movable probe tip along a first axis; and a detection component configured to detect motion of the movable probe tip in response to an applied signal; where the moveable probe tip comprises a metal layer affixed to a supporting layer, at least a portion of the metal layer at the terminal probe end extending past the supporting layer.
SYSTEMS AND METHODS FOR MANUFACTURING NANO-ELECTRO-MECHANICAL-SYSTEM PROBES
Systems and methods for manufacturing multiple integrated tip probes for scanning probe microscopy. According to an embodiment is a microscope probe configured to analyze a sample, the microscope probe including: a movable probe tip including a terminal probe end; a first actuator configured to displace the movable probe tip along a first axis; and a detection component configured to detect motion of the movable probe tip in response to an applied signal; where the moveable probe tip comprises a metal layer affixed to a supporting layer, at least a portion of the metal layer at the terminal probe end extending past the supporting layer.