Techniques are described herein that are capable of using variable voltage sources to control respective thermoelectric coolers independently in a thermal testing environment. The variable voltage sources create temperature differentials between first and second opposing surfaces of the thermoelectric coolers by applying input voltages to the respective thermoelectric coolers. Heat is transferred, by first heat exchanger(s), between a fluid and respective subset(s) of the thermoelectric coolers Heat is transferred, by second heat exchanger(s), between semiconductor device(s) and the subset(s) of the thermoelectric coolers.

A test circuit includes one or more sensors adapted to be formed on a wafer, each sensor detecting one or more wafer characterization data in a stressed condition; a stress generator controlling the one or more sensors to place the one or more sensors under stress during wafer manufacturing; memory coupled to the one or more sensors to store wafer characteristics under the stressed condition; and an interface coupled to the memory to communicate the wafer characterization data to a tester.

A timer circuit includes a plurality of n-type field effect transistors (NFETs) powered by a current source, a plurality of electromigration detection elements each electrically connected to a respective NFET of the plurality of NFETs, and a read-out circuit electrically connected to the plurality of electromigration detection elements to meter usage of each of the NFETs.

A health signature of each switching device in a control system is estimated using system parameters such as a DC-link voltage, three-phase voltages, three-phase currents, and temperature. The switching devices can be implemented as transistors, and a health signature for each transistor may be an on-state resistance or an on-state voltage of the transistors. For example, the on-state resistance for a metal-oxide-semiconductor field-effect transistor (MOSFET) functions as a health signature. Alternatively, the on-state voltage is used as a health signature for an insulated-gate bipolar transistor (IGBT). Additionally, a junction temperature is estimated for each transistor. Using the estimated health signatures and the junction temperatures, the remaining useful life of each transistor is estimated.

A method for ensuring wafer level reliability is provided. The method involves: forming a gate oxide layer having a thickness of less than 50 Å on a semiconductor substrate; forming a PMOS element having a channel length of less than 0.13 μm on the semiconductor substrate; and assessing hot carrier injection (HCl) for the PMOS element.

In some examples, a circuit comprises a function unit configured to perform a circuit function, and one or more in situ monitors configured to measure internal data associated with the circuit. The circuit may further comprise a memory configured to store one or more limit values associated with the one or more in situ monitors, and a lifetime model unit configured to determine whether the circuit has reached an end-of-life threshold based on the measured internal data from the one or more in situ monitors and the limit values.

In some examples, this disclosure describes a method of operating a circuit. The method may comprise performing a circuit function under normal operating conditions, wherein performing the circuit function under the normal operating conditions includes performing at least a portion of the circuit functions via a characteristic circuit, performing at least the portion of the circuit function under enhanced stress conditions via a characteristic circuit replica, and predicting a potential future problem with the circuit function under the normal conditions based on an evaluation of operation of the characteristic circuit relative to operation of the characteristic circuit replica.

In some examples, a method of operating a circuit may comprise performing a circuit function under normal conditions, performing the circuit function under aggravated conditions, predicting a potential future problem with the circuit function under the normal conditions based on an output of the circuit function under the aggravated conditions, and outputting a predictive alert based on predicting the potential future problem.

A method for predicting failure parameters of semiconductor devices can include receiving a set of data that includes (i) characteristics of a sample semiconductor device, and (ii) parameters characterizing a stress condition. The method further includes extracting a plurality of feature values from the set of data and inputting the plurality of feature values into a trained model executing on the one or more processors, wherein the trained model is configured according to an artificial intelligence (AI) algorithm based on a previous plurality of feature values, and wherein the trained model is operable to output a failure prediction based on the plurality of feature values. Further, the method includes generating, via the trained model, a predicted failure parameter of the sample semiconductor device due to the stress condition.

A device and a method for monitoring and analysis utilize unintended electromagnetic emissions of electrically powered components, devices or systems. The emissions are received at the antenna and a receiver. A processor processes and measures change or changes in a signature of the unintended electromagnetic emissions. The measurement are analyzed to both record a baseline score for future measurements and to be used in determining status and/or health of the analyzed system or component.