A method and an apparatus for producing a relief-pattern forming, the method and apparatus being suitable for producing a film-like material, such as an embossed film, having a fine relief-structure pattern formed on a surface thereof so as to have a distinctive optical effect with higher quality, good productivity, and fewer defects. A transfer pattern printed layer having an inverted structure of a relief-structure pattern is formed on a second substrate by printing a transfer pattern onto the surface of a first substrate on which the relief-structure pattern is formed at a predetermined position by registration with the relief-structure pattern followed by drying, laminating with the second substrate, curing and peeling.

Treating a reflective optical element (104) for the EUV wavelength range that has a reflective coating on a substrate. The reflective optical element in a holder (106) is irradiated with at least one radiation pulse of a radiation source (102) having a duration of between 1 μs and 1 s. At least one radiation source (102) and the reflective optical element move relative to one another. Preferably, this is carried out directly after applying the reflective coating in a coating chamber (100). Reflective optical elements of this type are suitable in particular for use in EUV lithography or in EUV inspection of masks or wafers, for example.

Treating a reflective optical element (104) for the EUV wavelength range that has a reflective coating on a substrate. The reflective optical element in a holder (106) is irradiated with at least one radiation pulse of a radiation source (102) having a duration of between 1 μs and 1 s. At least one radiation source (102) and the reflective optical element move relative to one another. Preferably, this is carried out directly after applying the reflective coating in a coating chamber (100). Reflective optical elements of this type are suitable in particular for use in EUV lithography or in EUV inspection of masks or wafers, for example.

An adhesive film includes an upper protective layer, a lower protective layer, and an adhesive layer between the upper protective layer and the lower protective layer. The adhesive layer includes a first adhesive layer and a second adhesive layer on the first adhesive layer. The first adhesive layer includes an acrylic resin, a photoinitiator, and a monofunctional monomer. The second adhesive layer includes an acrylic resin, a photoinitiator, and a multifunctional monomer.

An adhesive film includes an upper protective layer, a lower protective layer, and an adhesive layer between the upper protective layer and the lower protective layer. The adhesive layer includes a first adhesive layer and a second adhesive layer on the first adhesive layer. The first adhesive layer includes an acrylic resin, a photoinitiator, and a monofunctional monomer. The second adhesive layer includes an acrylic resin, a photoinitiator, and a multifunctional monomer.

Provided for herein are methods for producing reflective optical elements for the EUV wavelength range which have grating structures or which include structures that can serve as phase shifters. The methods may include the following operations: applying a structurable layer to a substrate, applying a reflective coating to the substrate that has been provided with the structurable layer, and locally irradiating the structurable layer. The structurable layer may be irradiated before or after application of the reflective coating.

A method for creating gradient optical properties within a substrate is disclosed herein. More specifically, the present invention teaches a method whereby a material disposed on a substrate is patterned in three dimensions such that the thickness and diffusivity properties of the material can be used to regulate the diffusion of ions into the substrate. An example is given in which ions, injected into a substrate through an ion exchange process, alter the refractive index within the substrate in a pre-selected fashion to form a gradient refractive index lens.

A method for creating gradient optical properties within a substrate is disclosed herein. More specifically, the present invention teaches a method whereby a material disposed on a substrate is patterned in three dimensions such that the thickness and diffusivity properties of the material can be used to regulate the diffusion of ions into the substrate. An example is given in which ions, injected into a substrate through an ion exchange process, alter the refractive index within the substrate in a pre-selected fashion to form a gradient refractive index lens.

This application provides a display screen, a display screen protective film, and an electronic device. A transmissive layer of the display screen has a first surface away from a display panel, an orthographic projection of each micro structural unit on the first surface and along a thickness direction is located in a pixel region, and a projection area of the micro structural unit is less than or equal to an area of the pixel region. The micro structural unit may be a curved surface. In this embodiment of this application, the pixel region may include a region in which a sub-pixel is located on the display panel, and a spaced region between the sub-pixel and another sub-pixel that is located around the sub-pixel and adjacent to the sub-pixel. In the foregoing display screen, each micro structural unit mainly bends a display light ray of one sub-pixel. This helps reduce a difference in light refraction degrees between different sub-pixels, and further helps optimize a flash point.

A cover article is described herein that includes: a substrate having a primary surface; an optical structure disposed on the primary surface, wherein the optical structure comprises an optical coating and a scratch resistant layer, and wherein the optical coating has an outer surface; and an easy-to-clean (ETC) coating disposed on the outer surface of the optical coating, wherein the ETC coating comprises a fluorine-containing material. The outer surface of the optical coating has a surface roughness (Ra) less than 1.5 nm. The optical structure has a physical thickness of greater than or equal to 500 nm and a maximum hardness of 10 GPa or greater, as measured on the outer surface of the optical coating by a Berkovich Indenter Test along an indentation depth of 50 nm or greater. The scratch resistant layer has a physical thickness from 200 nm to 5000 nm.