G02B1/12

System and method for customization of a photochromic article

A system for customization of a photochromic article (14) includes a container (12) having an interior (28). At least one actinic radiation source (34) is located in the interior (28) of the container (12). At least one deactivation radiation source (36) is located in the interior (28) of the container (12). A method of customizing a photochromic article (14) includes inserting a photochromic article (14) having at least one non-thermally reversible photochromic material into a container (12) having at least one actinic radiation source (34) and actuating the at least one actinic radiation source (34) to activate the at least one non-thermally reversible photochromic material.

Technique for optimizing coupling to optical fibers
11611190 · 2023-03-21 · ·

A method of optimizing the coupling to an optical fiber, including: generating a femtosecond laser pulse; directing a focus of the laser pulse to a longitudinal depth in the region beneath the endface of the optical fiber to generate microvoids; adjusting the intensity of the laser pulse at different depths, such that a refractive index profile is created in the region beneath the endface of the optical fiber.

COLLIMATOR, MANUFACTURING METHOD THEREOF, AND DISPLAY DEVICE INCLUDING COLLIMATOR
20230079920 · 2023-03-16 ·

A collimator includes: a transmission pattern transmitting light; and a non-transmission layer disposed on at least one side surface of the transmission pattern. The non-transmission layer includes a low reflective metal material.

COLLIMATOR, MANUFACTURING METHOD THEREOF, AND DISPLAY DEVICE INCLUDING COLLIMATOR
20230079920 · 2023-03-16 ·

A collimator includes: a transmission pattern transmitting light; and a non-transmission layer disposed on at least one side surface of the transmission pattern. The non-transmission layer includes a low reflective metal material.

BASE MATERIAL AND FORMATION METHOD THEREOF, AND ELECTRONIC DEVICE
20230071142 · 2023-03-09 ·

A base material, a formation method, and an electronic device are provided in the present disclosure. The base material includes a transparent substrate, including a first surface and a second surface which are opposite to each other; a first film layer disposed over the first surface of the transparent substrate, where the first film layer includes a first light transmittance and includes a hollowed region and a non-hollowed region; and the hollowed region is used as a first graphic mark; and further includes a second film layer disposed over the first film layer, where the second film layer includes a second light transmittance and a set color, where the first light transmittance is less than the second light transmittance.

BASE MATERIAL AND FORMATION METHOD THEREOF, AND ELECTRONIC DEVICE
20230071142 · 2023-03-09 ·

A base material, a formation method, and an electronic device are provided in the present disclosure. The base material includes a transparent substrate, including a first surface and a second surface which are opposite to each other; a first film layer disposed over the first surface of the transparent substrate, where the first film layer includes a first light transmittance and includes a hollowed region and a non-hollowed region; and the hollowed region is used as a first graphic mark; and further includes a second film layer disposed over the first film layer, where the second film layer includes a second light transmittance and a set color, where the first light transmittance is less than the second light transmittance.

OPTICAL ELEMENT FOR A EUV PROJECTION EXPOSURE SYSTEM

In a method for producing an optical element for an EUV projection exposure apparatus, a shaping layer (22.sub.1) is applied onto a substrate (20) so as to have a surface roughness of at most 0.5 nm rms directly after the application of the shaping layer onto the substrate.

OPTICAL ELEMENT FOR A EUV PROJECTION EXPOSURE SYSTEM

In a method for producing an optical element for an EUV projection exposure apparatus, a shaping layer (22.sub.1) is applied onto a substrate (20) so as to have a surface roughness of at most 0.5 nm rms directly after the application of the shaping layer onto the substrate.

GAS-SOLUBLE NANOVOIDED POLYMERS

An actuator includes a primary electrode, a secondary electrode overlapping at least a portion of the primary electrode, a nanovoided polymer layer disposed between and abutting the primary electrode and the secondary electrode, the nanovoided polymer layer having a plurality of nanovoids dispersed throughout a polymer matrix, and a sealing layer at least partially encapsulating the nanovoided polymer layer, where the nanovoids include a fill gas.

GAS-SOLUBLE NANOVOIDED POLYMERS

An actuator includes a primary electrode, a secondary electrode overlapping at least a portion of the primary electrode, a nanovoided polymer layer disposed between and abutting the primary electrode and the secondary electrode, the nanovoided polymer layer having a plurality of nanovoids dispersed throughout a polymer matrix, and a sealing layer at least partially encapsulating the nanovoided polymer layer, where the nanovoids include a fill gas.