G02B5/09

Method for replacing a mirror in a projection exposure apparatus, and position- and orientation data measuring device for carrying out the method

When replacing a mirror in a projection exposure apparatus, a mirror for replacement is initially removed (41). Position- and orientation data of the removed mirror for replacement are measured (43) by a position -and orientation data measuring device. Furthermore, position- and orientation data of a replacement mirror, to be inserted in place of the mirror for replacement, are measured (46) using the position- and orientation data measuring device. Bearing points of the replacement mirror are reworked (48) on the basis of ascertained differences between, firstly, the position- and orientation data of the mirror for replacement and, secondly, the position- and orientation data of the replacement mirror. The reworked replacement mirror is installed (54). This yields a mirror replacement method, in which an adjustment outlay of the replacement mirror in the projection exposure apparatus is reduced.

Method for replacing a mirror in a projection exposure apparatus, and position- and orientation data measuring device for carrying out the method

When replacing a mirror in a projection exposure apparatus, a mirror for replacement is initially removed (41). Position- and orientation data of the removed mirror for replacement are measured (43) by a position -and orientation data measuring device. Furthermore, position- and orientation data of a replacement mirror, to be inserted in place of the mirror for replacement, are measured (46) using the position- and orientation data measuring device. Bearing points of the replacement mirror are reworked (48) on the basis of ascertained differences between, firstly, the position- and orientation data of the mirror for replacement and, secondly, the position- and orientation data of the replacement mirror. The reworked replacement mirror is installed (54). This yields a mirror replacement method, in which an adjustment outlay of the replacement mirror in the projection exposure apparatus is reduced.

Precision Freeform Structuring for the Fabrication of Coded Lenses
20220355387 · 2022-11-10 ·

A system for fabricating coded lenses includes a cutting tool configured to controllably cut a workpiece at a specified position-dependent depth while traversing a surface of the workpiece along a specified two-dimensional path. A signal generator is operative to generate a signal for controlling fabrication of a coded lens from the workpiece. A vibration tool is operative to ultrasonically vibrate the cutting tool for cutting of gratings on the workpiece.

LIDAR DEVICE

A light detection and ranging (lidar) device includes: a lower base; an upper base; a laser emitting unit for emitting a laser in a form of a point light source; a nodding mirror for transforming the laser in the form of the point light source to a line beam pattern which is perpendicular to the lower base, wherein the nodding mirror reflects the laser emitted from the laser emitting unit; a polygonal mirror for transforming the line beam pattern to a plane beam pattern and receiving a laser reflected from an object; and a sensor unit for receiving the laser reflected from the object via the polygonal mirror.

LIDAR DEVICE

A light detection and ranging (lidar) device includes: a lower base; an upper base; a laser emitting unit for emitting a laser in a form of a point light source; a nodding mirror for transforming the laser in the form of the point light source to a line beam pattern which is perpendicular to the lower base, wherein the nodding mirror reflects the laser emitted from the laser emitting unit; a polygonal mirror for transforming the line beam pattern to a plane beam pattern and receiving a laser reflected from an object; and a sensor unit for receiving the laser reflected from the object via the polygonal mirror.

LiDAR device

A light detection and ranging (lidar) device includes: a lower base; an upper base; a laser emitting unit for emitting a laser in a form of a point light source; a nodding mirror for transforming the laser in the form of the point light source to a line beam pattern which is perpendicular to the lower base, wherein the nodding mirror reflects the laser emitted from the laser emitting unit; a polygonal mirror for transforming the line beam pattern to a plane beam pattern and receiving a laser reflected from an object; and a sensor unit for receiving the laser reflected from the object via the polygonal mirror.

LiDAR device

A light detection and ranging (lidar) device includes: a lower base; an upper base; a laser emitting unit for emitting a laser in a form of a point light source; a nodding mirror for transforming the laser in the form of the point light source to a line beam pattern which is perpendicular to the lower base, wherein the nodding mirror reflects the laser emitted from the laser emitting unit; a polygonal mirror for transforming the line beam pattern to a plane beam pattern and receiving a laser reflected from an object; and a sensor unit for receiving the laser reflected from the object via the polygonal mirror.

WAVEFRONT CORRECTION FOR AERODYNAMIC AND ATMOSPHERIC EFFECTS TO AN OPTICAL SENSOR ON A HIGH-SPEED FLIGHT VEHICLE
20230101430 · 2023-03-30 ·

A system and method for measurement and correction of aero-optical and aero-thermal effects to an EO/IR sensor's window/dome on a supersonic flight-vehicle. Range-gating of laser pulses measures and separates aerodynamic and atmospheric effects. Separate control algorithms and control loops at different update rates both simplifies the control algorithms and improves overall performance. The use of a MEMS MMA having tip/tilt/piston capabilities as the deformable mirror to provide wavefront correction enhances overall performance. The corrected laser pulses may also be used to actively illuminate a target to provide both active and passive detection.

ASSEMBLY, IN PARTICULAR IN A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
20230034958 · 2023-02-02 ·

An assembly, for example in a microlithographic projection exposure apparatus, comprises an optical element and a joint arrangement for mechanically bearing the optical element. The joint arrangement comprises at least one connecting element secured on the optical element. The mass of the connecting element is distributed over its length so that the moment of inertia of the connecting element is increased in comparison with a connecting element of identical mass and length in which the mass is distributed uniformly over the length.

MICRO-ELECTRO-MECHANICAL SYSTEM (MEMS) MICRO-MIRROR ARRAY STEERED LASER TRANSMITTER AND SITUATIONAL AWARENESS SENSOR WITH WAVELEGTH CONVERSION
20220350133 · 2022-11-03 ·

A steerable laser transmitter and active situational awareness sensor that achieves SWaP-C, steering rate and spectral diversity improvements by scanning a beam with a Micro-Electro-Mechanical System (MEMS) Micro-Minor Array (MMA). One or more sections of non-linear material (NLM) positioned in the optical path (e.g. as annular sections around a conic mirror or as reflective optical coatings on the MMA) are used to convert the wavelength of the beam to a different wavelength while preserving the steering of the beam. The MEMS MMA may include piston actuation of the mirrors to shape the spot-beam.