The invention relates to a compact wideband vacuum ultraviolet (VUV) and soft X-ray grazing incidence spectrometer based on a plane amplitude diffraction grating. The spectrometer enables simultaneous detection of a VUV spectrum in a positive first order of diffraction and a negative first order of diffraction. The technical result of the invention is that of recording a spectrum in a wide spectral range (3-200 nm) with a moderate spectral resolution (/15-30) and with a significantly higher spectral resolution (/100-200) in a narrow soft X-ray or extreme ultraviolet range with the possibility of measuring the absolute radiation output in these regions of the spectrum.

A system for transferring near-UV and/or UV photons with engineered angular momentum on to matter, and treat organic and inorganic substances and/or impurities comprising a coherent or incoherent source of near-UV and/or UV photons, and one or more angular momentum generators configured to deliver near-UV and/or UV photons with optimized spin angular momentum (SAM), orbital angular momentum OAM, and/or a SAM/OAM combination to target organic or inorganic substance and/or impurity, wherein the angular momentum generators are scalable such that they can be fabricated as a stand alone structure, as a structure fabricated on the package of the near-UV and/or UV photon source, or as an integral part of the near-UV and/or UV photon source.

A system for 3D printing utilizing non-UV, near-UV, and/or UV photons with or without engineered angular momentum, which may be organized as shaped flux or flux shaping structures of non-UV photons, near-UV photons, and/or UV photons, the system comprising: one or more of a coherent source, a partially-coherent source, and an incoherent source of one or more of non-UV photons, near-UV photons, and UV photons; and one or more flux shaping structures or angular momentum generators, with or without flux shaping, configured to impart the one or more of the non-UV photons, the near-UV photons, and the UV photons with one or more of spin angular momentum (SAM) and orbital angular momentum (OAM).

A membrane transmissive to EUV radiation, which may be used as a pellicle or spectral filter in a lithographic apparatus. The membrane has one or more high doped regions wherein the membrane is doped with a dopant concentration greater than 10.sup.17 cm.sup.3, and one or more regions with low (or no) doping. The membrane may have a main substrate having low doping and one or more additional layers, wherein the high doped regions are within some or all of the additional layers.

The invention relates to a compact wideband vacuum ultraviolet (VUV) and soft X-ray grazing incidence spectrometer based on a plane amplitude diffraction grating. The spectrometer enables simultaneous detection of a VUV spectrum in a positive first order of diffraction and a negative first order of diffraction. The technical result of the invention is that of recording a spectrum in a wide spectral range (3-200 nm) with a moderate spectral resolution (/15-30) and with a significantly higher spectral resolution (/100-200) in a narrow soft X-ray or extreme ultraviolet range with the possibility of measuring the absolute radiation output in these regions of the spectrum.

The present application is directed to an improved immersion grating assembly that provides additional wavelength dispersion and higher optical efficiency at ultraviolet wavelengths relative to prior art devices. More specifically, the immersion grating disclosed herein may be used to narrow the spectrum of light emitted by excimer laser systems. Narrower spectral linewidth of excimer laser systems may enable the creation of smaller feature sizes in semiconductor structures manufactured using UV photolithography processes.

The disclosure relates to a grating and a radiation imaging device. The grating comprises a plurality of stacked grating elements. The grating elements are stacked to form a grid. The grating element comprises a first sheet and a second sheet having two parallel planes. The second sheet is stacked at the first sheet in a length direction of the first sheet. The first sheet is almost impervious to radiation. The present disclosure stacks the sheets having different specifications together to form the grating with uniform grating slits, such that there is no limitation on the thickness of the grating and the grating can be used along with high-energy radiations.

The method of producing this diffraction grating includes a step of generating a moire by a periodic pattern projected onto a plurality of unit diffraction gratings and a plurality of unit diffraction gratings, and a step of adjusting so that the extending directions of the gratings are aligned by relatively rotating at least one of a plurality of unit diffractions with respect to at least one of the others of the plurality of unit diffractions.

A diffractive optical element prevents degradation of the optical performance of the element due to moisture absorption of the resin layers from taking place and also can prevent cracks of the resin layers and peeling of the resin layers along the interface thereof from taking place in a hot environment or in a cold environment. The diffractive optical element comprises a first layer and a second layer sequentially laid on a substrate, a diffraction grating being formed at the interface of the first layer and the second layer, the height d of the diffraction grating, the average film thickness t1 of the first layer and the average film thickness t2 of the second layer satisfying the relationship requirements expressed by the expressions of 1.1dt150 m and 30 mt2(400 mt1d).

A system for an extreme ultraviolet (EUV) light source includes a light-generation system configured to emit one or more light beams onto a beam path; one or more optical amplifiers, each of the one or more amplifiers including a gain medium on the beam path, each gain medium being configured to amplify the one or more light beams to produce one or more amplified light beams; and one or more diffractive optical elements on the beam path, where each of the one or more diffractive optical elements has a plurality of focal lengths, and each focal length of the diffractive optical element is associated with a particular polarization state.