A measurement device for a linear stage includes a two-dimensional grating and a measurement unit respectively disposed on first and second moving stages of the linear stage. The measurement unit includes a light source, a two-dimensional sensor and a processor. The light source emits incident light to the two-dimensional grating so that the incident light is reflected thereby to result in reflection light. The two-dimensional sensor receives the reflection light and converts the same to a reflection signal. The processor receives the reflection signal and determines accordingly a first rotational angle, and first and second displacement components of a displacement of the first moving stage.

Each of a plurality of optical elements that are arrayed in a lattice pattern in a screen member which diffuses a laser beam incident from a projector to guide the laser beam toward a projection surface has a curved surface on a side thereof, and the curved surface has a common convexly curved shape, and diffuses the laser beam which is emitted from the curved surface toward the projection surface. The respective optical elements include a plurality of reference elements which serve as a reference and a plurality of peripheral elements which are adjacent to the respective reference elements. The respective reference elements and the respective adjacent peripheral elements are formed by offsetting surface vertexes of the curved surfaces in a stepwise manner. Offset amounts generated between the respective reference elements and the respective adjacent peripheral elements are different from each other.

The present invention provides a method and apparatus for fabricating a grating on a silicon substrate, and the resulting grating device. In some embodiments, the apparatus method includes providing a silicon substrate; growing a diamond layer on the substrate; removing most of the silicon substrate and polishing an obverse face of the silicon to leave a very thin layer of polished silicon on the diamond layer; depositing a stack on the diamond layer, wherein the stack includes a plurality of pairs of dielectric layers on the thin layer of polished silicon, wherein each pair of the plurality of pairs of dielectric layers includes a first layer having a first index of refraction value and a second layer having a second index of refraction value that is different than the first index of refraction value; and forming a diffraction grating on an outer surface of the stack.

A display includes light-scattering regions. Each of the light-scattering regions is provided with linear protrusions and/or recesses having the same longitudinal direction. The light-scattering regions are different from each other in the longitudinal direction.

An antenna structure for directing light is disclosed. The antenna structure includes a reflector having a reflective surface and a ring-shaped dielectric grating arranged at the reflective surface and extending concentrically along a center axis perpendicular to the reflective surface and forming an omnidirectional reflector surrounding a low-index center portion of the ring-shaped dielectric grating. The antenna structure is configured to outcouple light emitted inside the low-index center portion through an upper end of the dielectric grating along the center axis with a Gaussian beam profile projection efficiency η of at least 65%. A light emitting device and a method for designing an antenna structure are also disclosed.

A spatial light modulator and an electronic apparatus including the spatial light modulator are provided. The spatial light modulator may include: a plurality of pixels configured to steer incident light; and a plurality of thermoelectric layers in which heat transfer with the plurality of pixels occurs. The plurality of pixels may include a plurality of grating structures.

An EUV reflective structure includes a substrate and multiple pairs of a Si layer and a Mo layer. The Si layer includes a plurality of cavities.

The present application discloses a beam combining device, which includes a reflective diffractive grating surface configured to combine a first, a second and a third incident light beam having different colors to a single diffracted mixed-color light beam when impinging on the reflective diffractive grating surface, wherein a profile of the grating surface is configured according to an optimization criterion with respect to a diffraction efficiency.

Embodiments described herein relate to methods and apparatus for forming gratings having a plurality of fins with different slant angles on a substrate and forming fins with different slant angles on successive substrates using angled etch systems and/or an optical device. The methods include positioning portions of substrates retained on a platen in a path of an ion beam. The substrates have a grating material disposed thereon. The ion beam is configured to contact the grating material at an ion beam angle ϑ relative to a surface normal of the substrates and form gratings in the grating material.

Disclosed are an amplitude monitoring system, a focusing and leveling apparatus and a defocus detection method. The defocus detection method comprises the steps of: adjusting amplitude of a scanning mirror (201) to a theoretical amplitude value and recording corresponding theoretical output voltage values of a photodetector (309) (S1); adjusting the amplitude of the scanning mirror (201) and sampling real-time amplitude values θi of the scanning mirror (201) and real-time output voltage values of the photodetector (309) to calculate compensated real-time demodulation results Si, and recording real-time defocus amounts Hi of a wafer table (305) (S2); subsequent to stepwise displacement of the wafer table (305), establishing a database based on the compensated real-time demodulation results Si and the real-time defocus amounts Hi of the wafer table (305) (S3); and in an actual measurement, sampling in real time an actual amplitude value θk of the scanning mirror (201) and actual output voltage values of the photodetector (309) to calculate a compensated real-time demodulation result Sk, and finding an actual defocus amount Hk of the wafer table (305) by searching the database using a linear interpolation method (S4). Such a focusing and leveling apparatus and defocus detection method avoid degraded stability of the scanning mirror due to long-time operation, which may lead to low wafer surface defocus measurement accuracy of the focusing and leveling apparatus.