A dielectric-based reflective color filter includes a substrate layer capable of light reflection; and a dielectric layer formed on the substrate layer. The dielectric layer includes a plurality of dielectric units configured by a first structure extending in a first direction and a second structure intersecting the first structure and extending in a second direction. The plurality of the dielectric units is arranged on the substrate layer so as to be spaced apart from each other.

Various embodiments are described herein for an ocular device implantable in a user's eye and which has an adjustable optical element for varying one or more optical properties for the eye such as, but not limited to, providing a dynamically adjustable aperture stop to control the amount of incoming light, filtering incoming light, polarizing incoming light, and/or varying a depth of field for the eye.

An optical device is provided. The optical device includes a substrate, a central color filter, a first color filter and a second color filter sequentially disposed on the substrate from the center to the edge of the substrate, and a central hollow member, a first hollow member and a second hollow member respectively disposed on the central color filter, the first color filter and the second color filter. There is no distance between a center of the central color filter and a center of the central hollow member. There is a first distance between a center of the first color filter and a center of the first hollow member. There is a second distance between a center of the second color filter and a center of the second hollow member. The first distance is greater than zero. The second distance is greater than the first distance.

The present technology relates to an electromagnetic wave processing device that enables reduction of color mixture. Provided are a photoelectric conversion element formed in a silicon substrate, a narrow band filter stacked on a light incident surface side of the photoelectric conversion element and configured to transmit an electromagnetic wave having a desired wavelength, and interlayer films respectively formed above and below the narrow band filter, and the photoelectric conversion element is formed at a depth from an interface of the silicon substrate, the depth where a transmission wavelength of the narrow band filter is most absorbed. The depth of the photoelectric conversion element from the silicon substrate becomes deeper as the transmission wavelength of the narrow band filter is longer. The present technology can be applied to an imaging element or a sensor using a plasmon filter or a Fabry-Perot interferometer.

An image sensor for recording incident radiation may include a first layer for filtering the incident radiation by attenuating incident radiation with a frequency below a cutoff frequency and a second light-sensitive layer for absorbing radiation passing through the first layer. The first layer may precede the second light-sensitive layer in a direction of propagation of the incident radiation and the first layer includes at least one aperture passing through the first layer to the second light-sensitive layer for propagating radiation therethrough. The cross sectional size of the at least one aperture may be configured to provide a cutoff frequency so that incident radiation with a frequency below the cutoff frequency is attenuated inside the at least one aperture and incident radiation with a frequency above the cutoff frequency propagates through the at least one aperture.

To suppress the reduction in transmission efficiency due to the change of the chief ray angle in spite of using structural color filters. A solid-state imaging element includes: a light receiving element included in a plurality of pixels; structural color filters located above at least part of the light receiving element and each including a metal film a periodic opening pattern with a structural period smaller than a prescribed wavelength; and an interconnection layer located below the light receiving element and configured to acquire a signal of light detected by the light receiving element. The structural period is different between the structural color filters in accordance with a chief ray angle of incident light, and the structural period of the periodic opening pattern becomes smaller as the chief ray angle becomes larger, relative to the structural period of the periodic opening pattern at the chief ray angle of 0°.

The present disclosure provides a structural color filter comprising: a substrate; a metal layer disposed on the substrate; and semiconductor gratings disposed on the metal layer, wherein each of the semiconductor gratings is elongated in a first direction, wherein the semiconductor gratings are arranged to be spaced apart from each other in a second direction perpendicular to the first direction, wherein the semiconductor gratings have the same thickness, wherein the thickness is smaller than a wavelength of visible-light.

Disclosed is a method to fabricate a multifunctional collimator structure In one embodiment, an optical collimator, includes: a dielectric layer; a substrate; and a plurality of via holes, wherein the dielectric layer is formed over the substrate, wherein the plurality of via holes are configured as an array along a lateral direction of a first surface of the dielectric layer, wherein each of the plurality of via holes extends through the dielectric layer and the substrate from the first surface of the dielectric layer to a second surface of the substrate in a vertical direction, wherein the substrate has a bulk impurity doping concentration equal to or greater than 1×10.sup.19 per cubic centimeter (cm.sup.−3) and a first thickness, and wherein the bulk impurity doping concentration and the first thickness of the substrate are configured so as to allow the optical collimator to filter light in a range of wavelengths.

Disclosed is a cost-effective method to fabricate a multifunctional collimator structure for contact image sensors to filter ambient infrared light to reduce noises. In one embodiment, an optical collimator, includes: a dielectric layer; a substrate; a plurality of via holes; and a conductive layer, wherein the dielectric layer is formed over the substrate, wherein the plurality of via holes are configured as an array along a lateral direction of a first surface of the dielectric layer, wherein each of the plurality of via holes extends through the dielectric layer and the substrate from the first surface of the dielectric layer to a second surface of the substrate in a vertical direction, and wherein the conductive layer is formed over at least one of the following: the first surface of the first dielectric layer and a portion of sidewalls of each of the plurality of via holes, and wherein the conductive layer is configured so as to allow the optical collimator to filter light in a range of wavelengths.

Various embodiments are described herein for an ocular device implantable in a user's eye and which has an adjustable optical element for varying one or more optical properties for the eye such as, but not limited to, providing a dynamically adjustable aperture stop to control the amount of incoming light, filtering incoming light, polarizing incoming light, and/or varying a depth of field for the eye.