An apparatus for altering quantum of light passing through a lens of a photographic device. The apparatus comprises of a base assembly configured to be detachably coupled to the lens of the photographic device, a first assembly comprising a first filter, a second assembly comprising a second filter and a third assembly comprising a third filter. The first assembly is configured to be detachably coupled to the base assembly. The second assembly is configured to be detachably coupled to the base assembly. The third assembly is configured to be detachably coupled to the base assembly. Combination of the first filter and the second filter forms a first range of neutral density filter and combination of the first filter and the third filter forms a second range of neutral density filter.

A lens is provided. The lens includes a first material layer including a first lens material with a first birefringence, a first density, and a first impact resistance. The lens also includes a second material layer coupled with the first material layer and including a second lens material with a second birefringence, a second density, and a second impact resistance. The first birefringence is lower than the second birefringence, the first density is lower than the second density, and the second impact resistance is stronger than the first impact resistance.

An optical observation unit (1) has an illumination apparatus (43) for illuminating an observation object (3). The illumination apparatus (43, 143) has a light source (45) emitting illumination light with a first color temperature, and a spectral filter (49) that can be inserted in the illumination beam path. The spectral filter (49) converts the illumination light with the first color temperature into illumination light with a second color temperature. The illumination apparatus further has an attenuator (51) that can be inserted in the illumination beam path in place of the spectral filter (49) and has a transmission characteristic that leads to an intensity reduction of the illumination light with the first color temperature that corresponds to the intensity reduction of the illumination light with the second color temperature by way of the spectral filter (49).

A method of patterning lithographic substrates that includes using a free electron laser to generate EUV radiation and delivering the EUV radiation to a lithographic apparatus which projects the EUV radiation onto lithographic substrates. The method further includes reducing fluctuations in the power of EUV radiation delivered to the lithographic substrates by using a feedback-based control loop to monitor the free electron laser and adjust operation of the free electron laser accordingly, and applying variable attenuation to EUV radiation that has been output by the free electron laser in order to further control the power of EUV radiation delivered to the lithographic apparatus.

The present invention relates to an optical lens comprising at least one straight part and at least one curved part on the outer surface thereof, in which an apodization area for reducing a flare phenomenon is disposed at an edge adjacent to the straight part. The optical lens has the advantage of reducing flare and ghosting phenomena due to a diffraction effect of the apodization area in the edge region.

An organic electroluminescence device according to one aspect of the present invention includes: a base material having a top surface on which a recess is provided; a reflective layer provided along at least a surface of the recess; a filling layer filled inside the recess via the reflective layer, the filling layer having light transmissivity; a first electrode provided at least on an upper layer side of the filling layer, the first electrode having light transmissivity; an organic layer provided on an upper layer side of the first electrode, the organic layer including at least a light emitting layer; and a second electrode provided on an upper layer side of the organic layer, the second electrode having light transmissivity, wherein a coloring material is mixed into the filling layer.

A control device includes a memory storing instructions, and a processor configured to execute the instructions to obtain transmittance information related to transmittances of a plurality of neutral-density filters of an imaging device, receive a target transmittance, select at least one neutral-density filter of the plurality of neutral-density filters to achieve the target transmittance according to priority information related to a predetermined priority order of the plurality of neutral-density filters and the transmittance information of the at least one neutral-density filter, and control the at least one neutral-density filter to be in an effective state.

In a multi-projection device, each of the projectors comprises a light shielding plate. The light shielding plate has an end formed into a sawtooth shape and is also provided with a gradation coated part which is coated such that white-light transmittance gradually decreases in the direction away from the end.

A light reflection film includes at least one light reflection layer RPRL in which a cholesteric liquid crystal phase of a right-handed helical structure having right circularly polarized light reflection ability is fixed; and at least one light reflection layer LPRL in which a cholesteric liquid crystal phase of a left-handed helical structure having left circularly polarized light reflection ability is fixed. A total of three or more layers of the light reflection layer(s) RPRL and the light reflection layer(s) LPRL are laminated. The light reflection layer(s) RPRL and the light reflection layer(s) LPRL laminated each have a selective reflection center wavelength shifted by an interval of 10 nm or more and 160 nm or less between two light reflection layers adjacent to each other.

An optical element includes a substrate, a surface layer including thin films disposed on the substrate, and an absorption layer provided between the surface layer and the substrate and having transmittance that varies depending on a position on the substrate. The surface layer includes a first film disposed farthest from the substrate and having a refractive index of no less than 1.05 nor more than 1.4 at a wavelength of 550 nm. The surface layer includes a second film disposed closer to the substrate than the first film and having a higher refractive index than the substrate at a wavelength of 550 nm and a third film disposed adjacent to the second film and having a lower refractive index than the second film at a wavelength of 550 nm. The absorption layer has an extinction coefficient of no more than 0.5 at wavelengths of from 400 nm to 700 nm.