G02B13/143

OPTICAL IMAGE CAPTURING SYSTEM
20180188505 · 2018-07-05 ·

The invention discloses a six-piece optical lens for capturing image and a six-piece optical module for capturing image. In order from an object side to an image side, the optical lens along the optical axis comprises a first lens with refractive power, a second lens with refractive power; a third lens with refractive power, a fourth lens with refractive power; a fifth lens with refractive power; a sixth lens with refractive power; and at least one of the image-side surface and object-side surface of each of the six lens elements is aspheric. The optical lens can increase aperture value and improve the imagining quality for use in compact cameras.

INTERFEROMETRIC MEASURING ARRANGEMENT

A measurement arrangement (10) and an associated method for interferometrically determining the surface shape (12) of a test object (14) includes a light source (16) providing an input wave (18) and a diffractive optical element (24). The diffractive optical element is configured to produce in each case by way of diffraction from the input wave a test wave (26), which is directed at the test object (14) and has a wavefront that is adapted at least partially to a desired shape of the optical surface, and a reference wave (28). The measurement arrangement furthermore includes a reflective optical element (30) that back-reflects the reference wave (28) and a capture device (36) that captures an interferogram produced by superposing the test wave after interaction with the test object and the back-reflected reference wave (28), in each case after a further diffraction at the diffractive optical element in a capture plane (48).

Optical apparatus for use in photolithography
09933707 · 2018-04-03 · ·

An optical apparatus includes an interchange mechanism and an optical assembly of an illumination system or a projection objective. At least one of the plurality of optical elements of the optical assembly is selected from among a plurality of ones selectable from the interchange mechanism which facilitates exchange of one for another in the beam path. To reduce transmission of vibration from the interchange mechanism to the optical assembly, the interchange mechanism is mounted on a structure which is substantially dynamically decoupled from the housing, and a selected selectable optical element is located at an operating position at which it is separate from the interchange mechanism.

IMAGING OPTICAL UNIT AND PROJECTION EXPOSURE APPARATUS INCLUDING SAME
20180088303 · 2018-03-29 ·

An imaging optical unit for projection lithography has a plurality of mirrors for imaging an object field into an image field with imaging light guided along a path from the object field to the image field. The penultimate mirror in the path has no passage opening to pass the imaging light. The imaging optical unit has a stop to predefine an outer marginal contour of a pupil of the imaging optical unit. The stop is between the penultimate and last mirrors in the path. The imaging optical unit can have exactly one stop for predefining at least one section of the outer pupil marginal contour. An entrance pupil of the imaging optical unit can be upstream of the object field. The imaging optical unit can be well defined regarding its pupil and exhibit desirable properties for projection lithography.

PROJECTION LENS WITH WAVE FRONT MANIPULATOR AND RELATED METHOD AND APPARATUS

A projection lens images a pattern of a mask arranged in the region of an object plane of the projection lens into an image plane of the projection lens via electromagnetic radiation with a work wavelength <260 nm. The projection lens has a multiplicity of optical elements with optical surfaces. The projection lens also has a wavefront manipulation system for controllable influencing of the wavefront of the projection radiation travelling from the object plane to the image plane. The wavefront manipulation system has a manipulator having a manipulator element and an actuating device or reversibly changing an optical effect of the manipulator element on radiation of the projection beam path.

HEAT ACTUATED AND PROJECTED LITHOGRAPHY SYSTEMS AND METHODS

In accordance with an embodiment of the disclosure, a tip array can include an elastomeric tip substrate layer comprising a first surface and an oppositely disposed second surface, the tip substrate layer being formed from an elastomeric material; a plurality of tips fixed to the first surface, the tips each comprising a tip end disposed opposite the first surface, the tips having a radius of curvature of less than about 1 micron; and an array of heaters disposed on the second surface of the tip substrate layer and configured such that when the tip substrate layer is heated by a heater, a tip disposed in a location of a heated portion of tip substrate layer is lowered relative to a tip disposed in a location of an unheated portion of the tip substrate layer.

Thermoplastic sheet for a heads-up display system

A thermoplastic sheet for the manufacture of a transparent motor vehicle or building glazing intended for the display of information, in particular of a laminated glazing, the sheet including a compound exhibiting an absorption band in the ultraviolet region and of which the diffuse reflection spectrum as a function of the energy of the incident radiation is characterized by a V value on the reflection curve, determined by the point of intersection between the tangent (1) at the inflection point of said curve and its asymptote (2) at the higher energies, of between 3.06 and 3.65 eV.

Multi-layer photonic structures having omni-directional reflectivity and coatings incorporating the same

A multi-layer photonic structure may include alternating layers of high index material and low index material having a form [H(LH).sup.N] where, H is a layer of high index material, L is a layer of low index material and N is a number of pairs of layers of high index material and layers of low index material. N may be an integer1. The low index dielectric material may have an index of refraction n.sub.L from about 1.3 to about 2.5. The high index dielectric material may have an index of refraction n.sub.H from about 1.8 to about 3.5, wherein n.sub.H>n.sub.L and the multi-layer photonic structure comprises a reflectivity band of greater than about 200 nm for light having angles of incidence from about 0 degrees to about 80 degrees relative to the multi-layer photonic structure. The multi-layer photonic structure may be incorporated into a paint or coating system thereby forming an omni-directional reflective paint or coating.

High numerical aperture objective lens system
09671337 · 2017-06-06 · ·

An objective lens system having a high numerical aperture, a large working distance, and low optical aberrations over a wide spectral band of wavelengths is disclosed. The objective lens system includes a first lens group, a second lens group, and a third lens group. The first lens group includes first and second positive meniscus lenses that are positioned at a distance from each other along an optical axis of the objective lens system. The distance may be dependent on a focal length of the objective lens system. The second lens group includes first and second meniscus lenses and a bi-convex lens. The third lens group includes a bi-concave lens and a doublet lens.

Achromatic optical-dispersion corrected gradient refractive index optical-element
09644107 · 2017-05-09 · ·

An optical-dispersion corrected optical-element, the optical-element comprising a first nanocomposite-ink, the first nanocomposite-ink comprising nanofillers dispersed in a cured organic-matrix, a second nanocomposite-ink, the second nanocomposite-ink comprising the nanofillers dispersed in a the cured organic-matrix, optical-dispersion of the second nanocomposite-ink different than optical-dispersion of the first nanocomposite-ink, wherein the distribution of the first nanocomposite-ink and the second nanocomposite-ink result in optical-dispersion refractive-gradients, where the refractive-gradients correct chromatic aberration.