An optical arrangement of lenses configured for use with an ultra wide band optical sensor is provided herein. The optical arrangement is associated with a back focal plane and further includes a first, a second, a third, a fourth, a fifth, and a sixth lens ordered from first to sixth along a common optical axis such that the first lens is farthest from the back focal plane and the sixth lens is closest to the back focal plane, wherein the first and the second lenses are made of zinc sulfide, the third and the sixth lenses are made of barium fluoride, the fourth lens is made of magnesium oxide, and the fifth lens is made of calcium fluoride, and wherein the lenses are selected to transfer any light within a wavelength range that contains 0.42 m to 3.6 m.

Systems configured to provide illumination for wafer inspection performed by a wafer inspection tool are provided. One system includes one or more pupil lenses configured to focus a first far field pattern having a shape different than a shape of light generated by a light source. The system also includes a field lens array positioned between the one or more pupil lenses and an aperture stop. In addition, the system includes a lens group configured to focus a second far field pattern generated by the field lens array to a back focal plane of the lens group. The back focal plane of the lens group is a field plane of a wafer inspection tool at which a wafer to be inspected is placed during wafer inspection.

An F lens for extreme ultraviolet laser marking assembly and a laser processing device are provided. The lens assembly includes a first lens (L1), a second lens (L2), a third lens (L3), and a fourth lens (L4) successively coaxially arranged along a transmission direction of an incident laser. The first lens (L1) is a biconcave negative lens; the second lens (L2) is a falcate negative lens; the third lens (L3) is a falcate positive lens; and the fourth lens (L4) is a biconvex positive lens; and an intermediate part of the second lens (L2) and the third lens (L3) are both convex toward a transmission direction of the laser. A proportion of the refractive index of the first, the second, the third and the fourth lenses to the abbe number is 1.476/68, with a tolerance of 5%. By means of the design of the four lenses and relative positions therebetween, astigmatism and distortion are effectively corrected, and the focusing degree of the energy is high. Imaging and marking of high quality are achieved; imaging quality is improved, and the structure of the lens assembly is simple, which is convenient for designing and appropriate for various laser processing devices.

A mirror (M) of a projection exposure apparatus for microlithography configured for structured exposure of a light-sensitive material and a method for producing a mirror (M). The mirror (M) has a substrate body (B), a first mirror surface (S) and a second mirror surface (S). The first mirror surface (S) is formed on a first side (VS) of the substrate body (B). The second mirror surface (S) is formed on a second side (RS) of the substrate body (B), the second side being different from the first side of the substrate body (B). The mirror (M) may be embodied, in particular, such that the substrate body (B) is produced from a glass ceramic material.

Described herein are systems and methods for improving light-sheet microscopy with cost-effective and simplified components. Such cost-effective and simplified components can be implemented in a light focusing system, a light generation system, and/or in imaging system. The light focusing system can be improved by attaching a voice coil motor to a focusing lens to increase the imagable field of view. The light generation system can be improved with a multimode laser diode to increase the uniformity of the beam profile and to increase the usable optical power. The imaging system can be improved by using a fluid chamber with positive cylindrical optical window for minimizing spherical aberrations.

An optical assembly and a method for making the optical assembly. The optical assembly includes an optical element; an adhesion promoter; a blocking coating; a holder; and an adhesive configured to adhere the optical element to the holder. The blocking coating includes a light absorber that does not transmit light with wavelengths from greater than or equal to about 250 nm to less than or equal to about 400 nm; The light absorber is positioned such that light having a wavelength from greater than or equal to about 190 nm to less than or equal to about 500 nm is not incident to the adhesive. The adhesion promoter improves adhesion of the blocking coating to the optical element and reduces the likelihood of delamination during handling, operation, or clearing of the optical assembly.

An optical assembly and a method for making the optical assembly. The optical assembly includes an optical element; a blocking coating; a capping layer on the blocking coating; a holder; and an adhesive configured to adhere the optical element to the holder. The blocking coating includes a light absorber that does not transmit light with wavelengths from greater than or equal to about 250 nm to less than or equal to about 400 nm; The light absorber is positioned such that light having a wavelength from greater than or equal to about 190 nm to less than or equal to about 500 nm is not incident to the adhesive. The capping layer is made from a material having high transmission in the UV and enables use of aggressive cleaning treatments on the optical element significant impairment of the UV transmission of the optical element.

An array that focuses UVC light energy from a UVC light source into a beam and thereby reduces the degradation of UVC light energy at a set distance. Singular or plural optics, or lens assemblies forming the array can each use a UVC beam total internal reflection (TIR) lens which transmits a UVC beam which allows an extended distance greater that the fall off rate of the standard UVC energy source.

A fixed-focus lens includes an anti-radiation first lens, a second lens, a third lens, a fourth lens, a fifth lens, a sixth lens and a seventh lens arranged in order in a direction. An aperture stop is disposed between the first lens and the fourth lens. A ratio of a lens diameter of the first lens to an overall length is within a range of 0.4 to 0.5, where the overall length is an axial distance between an outer surface of the first lens and an outer surface of the seventh lens. Each of the first lens to the seventh lens is a spherical glass lens.

A method for producing an optical imaging system for an EUV microlithography apparatus, and a related optical system and apparatus.