An interactive projection system for outputting illuminated indicia upon a projection surface. A detection system is operable to detect both stationary and movable features. A control system is operable to determine the position of the stationary and movable features. A reflective device reflects light from a light source (natural and/or artificial) upon the projection surface as the illuminated indicia. A drive system moves the reflective device, thereby moving the illuminated indicia across the projection surface in response to control system thereby simulating the stationary feature on the projection surface as a physical boundary to the illuminated indicia and simulating the movable feature contacting the illuminated indicia.

A projection-type video-image-displaying device efficiently displays an image by reducing the loss of light in the device. The device is provided with a light source radiating white light, a rod lens, a rotary color filter, a DMD, illumination optical elements, a projection lens and a control device. The rod lens collects light from the light source and emits the light. The rotary color filter selectively transmits, from the white light, light of a specific color. The DMD modulates incident light in accordance with an image signal, and the illumination optical elements form illumination light for projection onto the DMD. The projection lens projects an image formed using the DMD. The control device synchronizes the rotary color filter with the image displayed by the DMD. The DMD is disposed in a substantially conjugate relationship with the light-emitting surface on the rotary color filter.

A reflective EUV optic such as a collector mirror configured as an array of facets that are spaced apart to form respective gaps between adjacent facets. The gaps are used as inlets for gas flow across one of the facets such that flow is introduced parallel to the optic surface. The facets can be made with offsets such that loss of reflective area of the EUV optic can be minimized. The gas facilitates removal of target material from the surface of the facets.

An analysis and observation device includes: an electromagnetic wave emitter that emits a primary electromagnetic wave; a reflective object lens having a primary mirror provided with a primary reflection surface reflecting a secondary electromagnetic wave and a secondary mirror provided with a secondary reflection surface receiving and further reflecting the secondary electromagnetic wave; first and second detectors that receive the secondary electromagnetic wave and generate an intensity distribution spectrum; and a controller that performs component analysis of a sample based on the intensity distribution spectrum. A transmissive region through which the primary electromagnetic wave is transmitted is provided at a center of the secondary mirror. The transmissive region transmits the primary electromagnetic wave, which has been emitted from the electromagnetic wave emitter and passed through an opening of the primary mirror, thereby emitting the primary electromagnetic wave along an analysis optical axis of the reflective object lens.

A heliostat includes a reflector that has at least one segment arranged in a segment assembly and that defines a reflecting surface; a rigid spaceframe structure that includes a plurality of struts joined at nodes, the plurality of struts supporting the segment assembly so as to hold the reflecting surface in a concave toroidal shape; a dual-axis mount constructed and arranged to support and orient the rigid spaceframe structure and the segment assembly so as to reflect sunlight incident on the reflecting surface toward a distant receiving surface, the dual-axis mount including at least two drives; at least one mechanical linkage coupled to at least one drive of the dual-axis mount and configured to change a relative position of at least two nodes of the rigid spaceframe structure in synchronization with motion of the at least one drive, and thereby changing a shape of the rigid spaceframe structure and the reflector.

Electrical energy generation system with an assembly comprising: a light concentrating funnel; a multilayer photovoltaic cell; a thermos-electric layer: and a thermal stabilization device, wherein each layer of the multilayer photovoltaic cell contains: 5 semiconductor nanoparticles complexed with perovskite, an electrolyte, and a catalyst. The system assembly is arranged so as light can enter at a range of incidence angles at the light concentrating funnel, is directed and concentrated, then exits the light concentrating funnel and irradiates the multilayer photovoltaic cell where a voltage is generated, and the residual heat from these processes is stabilized with a thermal stabilization device.

An EUV collector is used to collect EUV used light eminating from a source area. On a reflective surface of the collector, there is mounted a diffraction grating for the EUV used light. The EUV used light which emanates from the source area is diffracted by the diffraction grating toward a collection area. The reflective surface is designed at least partly as a planar reflective surface, as a parabolic reflective surface, as a rotationally symmetrically frustoconical reflective surface, or as a hollow-cylindrical reflective surface. A design of the reflective surface with ellipsoid reflective surface portions with first focal points, which lie in the source area, and second focal points, which are at a distance from one another and from the collection area, is also possible.

An optical system for a lithography system comprises: a number of optical elements for guiding radiation; a support device supporting the optical elements; and a plurality of active and/or passive components. The active and/or passive components are arranged on the support device in at least two different planes. The active and/or passive components are arranged on one side of the support device.

A phosphor element includes an incident face for an excitation light, an emitting face opposing the incident face and a side face, and the element converts at least a part of the incident excitation light incident onto the incident face to fluorescence and emits the fluorescence from the emitting face. The emitting face has an area larger than an area of the incident face. The phosphor element comprises an inclination region in which an inclination angle of the side face with respect to a vertical axis perpendicular to the emitting face is monotonously increased from the incident face toward the emitting face, viewed in a cross-section perpendicular to the emitting face and along the longest dividing line halving the emitting face.

There is provided an optical assembly for homogenizing a light beam and optimizing the wavelength conversion efficiency of an illumination system, the optical assembly being configured to be positioned in a beam path of the illumination system comprising a light source emitting the light beam, the optical assembly comprising a wavelength conversion element, a lens assembly comprising at least one lens for focusing the light beam on the wavelength conversion element an integrator rod comprising an entrance and an exit plane, wherein the exit plane of the integrator rod is configured to be reimaged on the wavelength conversion element via the lens assembly, wherein the surface of the exit plane of the integrator rod is a diffusing surface having an engineered topology optimized for the illumination system and with reduced thermal saturation and quenching limits.