Provided are a stereolithography apparatus and a method for producing a shaped article which are applicable to various shaping materials. The stereolithography apparatus according to the present embodiment comprises: laser source configured to generate laser light having a wavelength of (510 n)m or shorter; objective lens configured to focus the laser light to shaping material; and scanner configured to change a focus position of the laser light to the shaping material, wherein the shaping material is cured by two-photon absorption of the laser light having a wavelength (510 n)m or shorter to form shaped article.

A method includes: producing a light beam made up of pulses having a wavelength in the deep ultraviolet range, each pulse having a first temporal coherence defined by a first temporal coherence length and each pulse being defined by a pulse duration; for one or more pulses, modulating the optical phase over the pulse duration of the pulse to produce a modified pulse having a second temporal coherence defined by a second temporal coherence length that is less than the first temporal coherence length of the pulse; forming a light beam of pulses at least from the modified pulses; and directing the formed light beam of pulses toward a substrate within a lithography exposure apparatus.

Techniques for reducing biofouling on optical equipment, using minimum power in a marine environment are provided. An example of an apparatus according to the disclosure includes a housing including a cavity and an ultraviolet transparent window disposed over the cavity, an optical device disposed in the cavity and directed towards the ultraviolet transparent window, one or more ultraviolet light emitting diodes disposed in the cavity and directed towards the ultraviolet transparent window, and a controller operably coupled to the one or more ultraviolet light emitting diodes and configured to provide at least one lamp power function to the one or more ultraviolet light emitting diodes, wherein the at least one lamp power function is based on at least a flash power value, a flash duration, a rest power value and a rest duration.

A disinfection device includes: a container having a wall that defines a chamber for containing liquid therein; and a light source for transmitting disinfection light to the liquid. The light source is in a spatial relationship with the container so that a distance between the light source and the first light receiving surface of the liquid remains unchanged regardless of a volume of the liquid.

A microlithographic projection exposure apparatus optical 22 system includes a first reflective surface and at least one second reflective surface, each in the optical beam path. The first reflective surface is movable for the correction of an aberration that occurs during the operation of the optical system. The optical system is configured in so that, during the travel movement of the first reflective surface, the relative position of the first reflective surface and of the second reflective surface is maintainable in a stable manner. Either the first reflective surface and the second reflective surface directly succeed one another in the optical beam path, or there are only reflective optical elements between the first reflective surface and the second reflective surface.

An optical element for light concentration for a predefined wavelength range, includes a holding sleeve which is formed in such a way that a light passage volume is framed by at least one reflective partial surface of the holding sleeve, and a light transmission element, with which the light passage volume is at least partly filled and which is transmissive, at least for the predefined wavelength range. The light transmission element is at least partly formed from at least one medium that is diffuse for the predefined wavelength range, and has at least one first subregion having at least a first diffusivity and a second subregion having at least a second diffusivity differing from the first diffusivity. The disclosure further relates to a method for producing an optical element for light concentration.

An illumination optical unit for projection lithography illuminates an object field with illumination light along an illumination beam path. The arrangement of field facets of a field facet mirror and also of pupil facets of a pupil facet mirror is such that an illumination channel is guided over each of them. The field facet mirror images a light source image along in each case one illumination channel onto one of the pupil facets. The pupil facet mirror superimposedly images of the field facets into the object field. The illumination optical unit is designed for the settable specification of a spatial resolution of an illumination light illumination of an entrance pupil of a projection optical unit arranged downstream of the object field in the illumination light beam path. The result of this is an illumination optical unit with which illumination light can be used efficiently for high-contrast imaging of the structures to be projected.

A displacement device for pivoting a mirror element with two degrees of freedom of pivoting includes an electrode structure including actuator electrodes. The actuator electrodes are comb electrodes. All actuator electrodes are arranged in a single plane. The actuator electrodes form a direct drive for pivoting the mirror element.

An illumination optical system is used with a reflective imaging optical system configured to form an image of a pattern arranged on a first plane onto a second plane, and is configured to illuminate an illumination area on the first plane with a light from a light source. The illumination optical system includes one or more reflecting mirrors configured to reflect the light from the light source to the first plane such that the reflected light reaches the first plane after crossing an optical path of a light which travels in the reflective imaging optical system.

A reflective EUV optic such as a collector mirror configured as an array of facets that are spaced apart to form respective gaps between adjacent facets. The gaps are used as inlets for gas flow across one of the facets such that flow is introduced parallel to the optic surface. The facets can be made with offsets such that loss of reflective area of the EUV optic can be minimized. The gas facilitates removal of target material from the surface of the facets.