A UV light curing system is provided. The UV light curing system includes: a UV light source; a primary reflector for reflecting light emitted by the UV light source in a direction of an enclosure, the enclosure at least partially surrounding an object of interest; and a secondary reflector on an opposite side of the enclosure with respect to the primary reflector, the secondary reflector being positioned along a portion of a length of the enclosure, the secondary reflector surrounding at least 40% of the enclosure at the portion of the length of the enclosure.

A diffusive ultraviolet illuminator is provided. The illuminator can include a reflective mirror and a set of ultraviolet radiation sources located within a proximity of the focus point of the reflective mirror. The ultraviolet radiation from the set of ultraviolet radiation sources is directed towards a reflective surface located adjacent to the illuminator. The reflective surface can diffusively reflect at least 30% the ultraviolet radiation and the diffusive ultraviolet radiation can be within at least 40% of Lambertian distribution. A set of optical elements can be located between the illuminator and the reflective surface in order to direct the ultraviolet radiation towards at least 50% of the reflective surface.

Systems and methods for optical narrowcasting are provided for transmitting various types of content. Optical narrowcasting content indicative of the presence of additional information along with identifying information may be transmitted. The additional information (which may include meaningful amounts of advertising information, media, or any other content) may also be transmitted as optical narrowcasting content. Elements of an optical narrowcasting system may include optical transmitters and optical receivers which can be configured to be operative at distances ranging from, e.g., 400 meters to 1200 meters. Additionally, the elements can be implemented on a miniaturized scale in conjunction with small, user devices such as smartphones. Moreover, optically narrowcast content may be filtered using at least identification data extracted from optical beacons received from optical transmitters such that only optically narrowcast content of interest is presented on a display and/or stored in a persistent storage.

An EUV collector for use in an EUV projection exposure apparatus includes at least one mirror surface having surface structures for scattering a used EUV wavelength () of used EUV light. The mirror surface has a surface height with a spatial wavelength distribution between a lower limit spatial wavelength and an upper limit spatial wavelength. An effective roughness (rmsG) below the lower limit spatial wavelength (PG) satisfies the following relation: (4 rmsG cos()/).sup.2<0.1. denotes an angle of incidence of the used EUV light at the mirror surface. The following applies to an effective roughness (rmsGG) between the lower limit spatial wavelength (PG) and the upper limit spatial wavelength (PG): 1.5 rmsG<rmsGG<6 rmsG.

A system and method of removing target material debris deposits simultaneously with generating EUV light includes generating hydrogen radicals in situ in the EUV vessel, proximate to the target material debris deposits and volatilizing the target material debris deposits and purging the volatilized target material debris deposits from the EUV vessel without the need of an oxygen containing species in the EUV vessel.

A method includes: producing a light beam made up of pulses having a wavelength in the deep ultraviolet range, each pulse having a first temporal coherence defined by a first temporal coherence length and each pulse being defined by a pulse duration; for one or more pulses, modulating the optical phase over the pulse duration of the pulse to produce a modified pulse having a second temporal coherence defined by a second temporal coherence length that is less than the first temporal coherence length of the pulse; forming a light beam of pulses at least from the modified pulses; and directing the formed light beam of pulses toward a substrate within a lithography exposure apparatus.

A method includes: producing a light beam made up of pulses having a wavelength in the deep ultraviolet range, each pulse having a first temporal coherence defined by a first temporal coherence length and each pulse being defined by a pulse duration; for one or more pulses, modulating the optical phase over the pulse duration of the pulse to produce a modified pulse having a second temporal coherence defined by a second temporal coherence length that is less than the first temporal coherence length of the pulse; forming a light beam of pulses at least from the modified pulses; and directing the formed light beam of pulses toward a substrate within a lithography exposure apparatus.

A system and method of removing target material debris deposits simultaneously with generating EUV light includes generating hydrogen radicals in situ in the EUV vessel, proximate to the target material debris deposits and volatilizing the target material debris deposits and purging the volatilized target material debris deposits from the EUV vessel without the need of an oxygen containing species in the EUV vessel.

A method for illuminating an object field of a projection exposure apparatus includes providing a subset of first facets to be positioned in park positions, which are each spaced apart from an associated target position, but at most by a maximum distance.

Described are optical systems for a digital micromirror device (DMD) illuminator. The optical systems include a LED array, a tapered non-imaging collection optic, a reflective stop and a telecentric lens system. The telecentric lens system is disposed along an optical axis defined between the tapered non-imaging collection optic and the reflective stop. The telecentric lens system is configured as a first half of a symmetric one to one imager for an object plane on the optical axis and as a second half of the symmetric one to one imager for optical energy reflected from the reflective aperture stop. The optical systems reclaim optical energy emitted by the LED array that does not initially pass through the reflective stop and provide an improved intensity distribution at the DMD. Reductions in stray light and the thermal loads on the illuminator and DMD are achieved relative to conventional illumination systems for DMDs.