An optical modulator includes: a waveguide made of semiconductor, a light being input to one of ends of the waveguide; and a first electrode provided on the waveguide and overlapping with a part of the waveguide, wherein the waveguide has a first region to a third region along a propagation direction of the light from the one of ends, wherein neither the first region nor a part of the second region on a side of the first region in the propagation direction overlaps with the first electrode, wherein the third region and a part of the second region on a side of the third region in the propagation direction overlap with the first electrode, wherein a second width of the second region is larger than a first width of the first region and a third width of the third region.

A method of manufacturing an electro-optically active device. The method comprising the steps of: etching a cavity on a silicon-on-insulator wafer; providing a sacrificial layer adjacent to a substrate of a lll-V semiconductor wafer; epitaxially growing an electro-optically active structure on the lll-V semiconductor wafer; etching the epitaxially grown optically active structure into an electro-optically active mesa; disposing the electro-optically active mesa in the cavity of the silicon-on-insulator wafer and bonding a surface of the electro-optically active mesa, which is distal to the sacrificial layer, to a bed of the cavity; and removing the sacrificial layer between the substrate of the lll-V semiconductor wafer and the electro-optically active mesa.

A method of providing electrical isolation between subsections in a waveguide structure for a photonic integrated device, the structure comprising a substrate, a buffer layer and a core layer, the buffer layer being located between the substrate and the core and comprising a dopant of a first type, the first type being either n-type or p- type, the method comprising the steps of prior to adding any layer to a side of the core layer opposite to the buffer layer: selecting at least one area to be an electrical isolation region, applying a dielectric mask to a surface of the core layer opposite to the buffer layer, with a window in the mask exposing an area of the surface corresponding to the selected electrical isolation region, implementing diffusion of a dopant of a second type, the second type being of opposite polarity to the first type, and allowing the dopant of the second type to penetrate to the substrate to form a blocking junction.

An integrated optical modulator array useful for modulating light at different wavelengths in the same optical band includes multiple GeSi waveguides on a substrate. Each GeSi waveguide has a different width and is coupled to electrodes to form an electro-absorption modulator. A stressor material, such as SiN, disposed between the GeSi waveguides in the optical modulators applies a strain to the GeSi waveguides. Because each GeSi waveguide has a different width, it experiences a different strain. This difference can be a difference in magnitude, type (homogeneous v. inhomogeneous, compressive v. tensile), or both. The different strains shift the bandgaps of the Ge in the GeSi waveguides by different amounts, shifting the optical absorption edges for the GeSi waveguides by different amounts. Put differently, the stressor layer strains each GeSi modulator differently, causing each GeSi modulator to operate at a different wavelength.

In accordance with various embodiments of the disclosed subject matter, a system, device and method for an electrically tunable wavelength selection filter comprising a wavelength selection filter portion having a plurality of alternating thin films of two dielectric materials with a thin film capacitor displacing one pair of alternating thin films, and an order sorting filter portion electrically isolated from but proximate the wavelength selection filter and having a plurality of alternating thin films of two dielectric materials where one of the dielectric materials exhibits a voltage-dependent refractive index. Independently controlling the capacitor charging voltage and the voltage across the order sorting filter enables selective transmission of narrow spectral lines across a desired frequency region.

An optical modulation device includes a waveguide, a first electrode layer, and a second electrode layer. The waveguide layer includes a waveguide body and a plurality of nano-waveguides embedded in the waveguide body and extending in an extension direction. The first electrode layer is arranged on one side of the waveguide layer and includes a plurality of first electrodes extending along the extension direction and arranged in a one-to-one correspondence with the plurality of nano-waveguides. The second electrode layer is arranged on a side of the waveguide layer facing away from the first electrode layer and includes a plurality of second electrodes extending in the extension direction and arranged in a one-to-one correspondence with the plurality of first electrodes.

An active matrix substrate includes a substrate; a plurality of gate bus lines and a plurality of source bus lines; an oxide semiconductor TFT that includes an oxide semiconductor layer, a gate insulating layer, and a gate electrode; a pixel electrode; and an upper insulating layer. The oxide semiconductor layer includes a high resistance region, and a first region and a second region. The high resistance region includes a channel region, a first channel offset region, and a second channel offset region. The upper insulating layer is disposed so as to overlap the channel region, the first channel offset region, and the second channel offset region, and so as not to overlap any of the first region and the second region, when viewed from the normal direction of the main surface of the substrate.

The optical response of a metasurface is controlled by actuating it via an electrical or magnetic field, temperature control, optical pumping or electromechanical actuation. The metasurface will therefore control the polarization of the incident light. The metasurface comprises an array of patch antennas. The patch antennas are in the form of asymmetrical elements, including rotated rods, cross-shapes, V-shapes, and L-shapes.

An optical modulator includes a p-type first semiconductor layer (102) formed on a clad layer (101), an insulating layer (103) formed on the first semiconductor layer (102), and an n-type second semiconductor layer (104) formed on the insulating layer (103). The first semiconductor layer (102) is made of silicon or silicon-germanium, and the second semiconductor layer (104) is formed from a III-V compound semiconductor made of three or more materials.

A photonic transmitter is provided, including a laser source including a first waveguide made of silicon and a second waveguide made of III-V gain material, the waveguides being separated from each other by a first segment of a dielectric layer; and a phase modulator including a first electrode made of single-crystal silicon and a second electrode made of III-V crystalline material, separated from each other by a second segment of the dielectric layer, where a thickness of the dielectric layer is between 40 nm and 1 m, where a thickness of a dielectric material in an interior of the first segment is equal to the thickness of the dielectric layer, and where a thickness of the dielectric material in an interior of the second segment is between 5 nm and 35 nm, a rest being formed by a thickness of semiconductor material.