G03C1/73

Photochromic Article

The present invention relates to a photochromic article that includes a substrate and a photochromic layer formed from a curable photochromic composition. The photochromic composition includes a polyol component that includes a polycarbonate diol, an isocyanate component that includes an unblocked polyfunctional isocyanate and/or a blocked polyfunctional isocyanate, and at least one photochromic compound. The equivalents ratio of blocked/unblocked isocyanate equivalents of the isocyanate component to hydroxyl equivalents of the polyol component is at least 5:1. The photochromic article exhibits a T.sub.1/2 (Fade Half Life) at 23° C. of less than or equal to 70 seconds.

Photochromic Article

The present invention relates to a photochromic article that includes a substrate and a photochromic layer formed from a curable photochromic composition. The photochromic composition includes a polyol component that includes a polycarbonate diol, an isocyanate component that includes an unblocked polyfunctional isocyanate and/or a blocked polyfunctional isocyanate, and at least one photochromic compound. The equivalents ratio of blocked/unblocked isocyanate equivalents of the isocyanate component to hydroxyl equivalents of the polyol component is at least 5:1. The photochromic article exhibits a T.sub.1/2 (Fade Half Life) at 23° C. of less than or equal to 70 seconds.

OPHTHALMIC DEVICES COMPRISING PHOTOCHROMIC MATERIALS WITH REACTIVE SUBSTITUENTS

Various non-limiting embodiments of the present disclosure relate to ophthalmic devices comprising photochromic materials comprising a reactive substituent. For example, the present disclosure contemplates ophthalmic devices comprising photochromic materials, such as photochromic naphthopyrans and indeno-fused naphthopyrans having a reactive substituent comprising a reactive moiety linked to the photochromic naphthopyran by one or more linking groups. In certain non-limiting embodiments, the reactive moiety comprises a polymerizable moiety. In other non-limiting embodiments, the reactive moiety comprises a nucleophilic moiety. Other non-limiting embodiments of the present disclosure relate to methods of making the photochromic ophthalmic device, wherein the photochromic ophthalmic devices comprise the photochromic naphthopyrans described herein.

OPHTHALMIC DEVICES COMPRISING PHOTOCHROMIC MATERIALS WITH REACTIVE SUBSTITUENTS

Various non-limiting embodiments of the present disclosure relate to ophthalmic devices comprising photochromic materials comprising a reactive substituent. For example, the present disclosure contemplates ophthalmic devices comprising photochromic materials, such as photochromic naphthopyrans and indeno-fused naphthopyrans having a reactive substituent comprising a reactive moiety linked to the photochromic naphthopyran by one or more linking groups. In certain non-limiting embodiments, the reactive moiety comprises a polymerizable moiety. In other non-limiting embodiments, the reactive moiety comprises a nucleophilic moiety. Other non-limiting embodiments of the present disclosure relate to methods of making the photochromic ophthalmic device, wherein the photochromic ophthalmic devices comprise the photochromic naphthopyrans described herein.

Photoresponsive compound

Provided is a compound that is fluidized by light irradiation and reversibly non-fluidized, and is not significantly colored. Provided is a photoresponsive compound represented by the following general formula (1), the photoresponsive compound being fluidized by light irradiation and reversibly non-fluidized:
R.sub.1—Z.sub.1═Z.sub.2—R.sub.2  General formula (1) wherein Z.sub.1 and Z.sub.2 are N or CH, while Z.sub.1≠Z.sub.2, R.sub.1 contains an aromatic hydrocarbon structure, R.sub.2 contains an aromatic heterocyclic structure, and a hydrogen atom is bonded to at least one carbon atom bonded adjacent to a carbon atom in the aromatic heterocyclic structure bonded to the Z.sub.2.

Photochromic article

Disclosed are articles having a thermoplastic photochromic coating. The articles exhibit a Bayer Abrasion ratio of at least 2 and desirable photochromic properties, i.e., the formation of darker activated colors and faster rates of photochromic activation and fade when irradiated with ultraviolet light.

Photochromic article

Disclosed are articles having a thermoplastic photochromic coating. The articles exhibit a Bayer Abrasion ratio of at least 2 and desirable photochromic properties, i.e., the formation of darker activated colors and faster rates of photochromic activation and fade when irradiated with ultraviolet light.

In situ adjustable optical mask
11771552 · 2023-10-03 · ·

Implantable corneal and intraocular implants such as a mask are provided. The mask can improve the vision of a patient, such as by being configured to increase the depth of focus of an eye of a patient. The mask can include an aperture configured to transmit along an optical axis substantially all visible incident light. The mask can further include a transition portion that surrounds at least a portion of the aperture. This portion can be configured to switch from one level of opacity to another level of opacity through the use of a controllably variable absorbance feature such as a switchable photochromic chromophore within a polymer matrix.

In situ adjustable optical mask
11771552 · 2023-10-03 · ·

Implantable corneal and intraocular implants such as a mask are provided. The mask can improve the vision of a patient, such as by being configured to increase the depth of focus of an eye of a patient. The mask can include an aperture configured to transmit along an optical axis substantially all visible incident light. The mask can further include a transition portion that surrounds at least a portion of the aperture. This portion can be configured to switch from one level of opacity to another level of opacity through the use of a controllably variable absorbance feature such as a switchable photochromic chromophore within a polymer matrix.

METHOD FOR PRODUCING RADIATION-SENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE

The present invention provides a method for producing a radiation-sensitive resin composition, in which an inter-lot variation in performance of radiation-sensitive resin compositions that have been filtered is suppressed, a pattern forming method, and a method for producing an electronic device. The method for producing a radiation-sensitive resin composition of an embodiment of the present invention has a step 1 of bringing a first solution including a first organic solvent into contact with a first filter to clean the first filter, and a step 2 of filtering a radiation-sensitive resin composition using the first filter cleaned in the step 1.