The present invention is to provide a pellicle frame characterized by including a metal or alloy having a linear expansion coefficient of 10×10.sup.−6 (1/K) or less and further a density of 4.6 g/cm.sup.3 or less, and a pellicle characterized by including the pellicle frame as an element.

The present invention is to provide a pellicle frame characterized by including a metal or alloy having a linear expansion coefficient of 10×10.sup.−6 (1/K) or less and further a density of 4.6 g/cm.sup.3 or less, and a pellicle characterized by including the pellicle frame as an element.

A method of manufacturing a semiconductor device includes heating a pellicle disposed over a photomask. Actinic radiation is passed through the pellicle to selectively expose a photoresist layer on a substrate. The selectively exposed photoresist layer is developed to form a pattern in the photoresist layer.

A method of manufacturing a semiconductor device includes heating a pellicle disposed over a photomask. Actinic radiation is passed through the pellicle to selectively expose a photoresist layer on a substrate. The selectively exposed photoresist layer is developed to form a pattern in the photoresist layer.

A frame assembly for mounting a pellicle on a photomask is disclosed. The frame assembly includes a frame to which the pellicle is attached, a stud attached to the photomask, and a fixture that is inserted into the lower side of the frame. The stud and the fixture are magnetically bonded to each other, and a gap of a certain height is created between the photomask and the frame by the stud under the fixture. This eliminates the need for precise alignment of the frame during the mounting process on the photomask, and facilitates the separation of the frame from the photomask for reuse. The formation of the gap eliminates the need for a separate process to create vent holes in the frame.

A frame assembly for mounting a pellicle on a photomask is disclosed. The frame assembly includes a frame to which the pellicle is attached, a stud attached to the photomask, and a fixture that is inserted into the lower side of the frame. The stud and the fixture are magnetically bonded to each other, and a gap of a certain height is created between the photomask and the frame by the stud under the fixture. This eliminates the need for precise alignment of the frame during the mounting process on the photomask, and facilitates the separation of the frame from the photomask for reuse. The formation of the gap eliminates the need for a separate process to create vent holes in the frame.

A support frame for pellicle is provided including a first support frame part, a second support frame part, and a filter, wherein the filter has a flat plate-shaped frame shape and is sandwiched by the first support frame part and the second support frame part, the first support frame part includes a first body part having a flat plate-shaped frame shape and a first engaging portion protruded from the first body part to a thickness direction of the support frame for pellicle, and the second support frame part includes a second body part having a flat plate-shaped frame shape and a second engaging portion of the second body part engaging with the first engaging portion being arranged in a concave part provided in the thickness direction of the support frame for pellicle.

A support frame for pellicle is provided including a first support frame part, a second support frame part, and a filter, wherein the filter has a flat plate-shaped frame shape and is sandwiched by the first support frame part and the second support frame part, the first support frame part includes a first body part having a flat plate-shaped frame shape and a first engaging portion protruded from the first body part to a thickness direction of the support frame for pellicle, and the second support frame part includes a second body part having a flat plate-shaped frame shape and a second engaging portion of the second body part engaging with the first engaging portion being arranged in a concave part provided in the thickness direction of the support frame for pellicle.

A method for forming a structure of a pellicle-mask structure is provided. The method includes bonding a pellicle frame to a mask through a pellicle frame adhesive. The method also includes forming a vent structure in the pellicle frame. The method further includes bonding a pellicle membrane to the pellicle frame through a pellicle membrane adhesive. A first size of the pellicle membrane adhesive is greater than a second size of the pellicle frame adhesive.

A method for forming a structure of a pellicle-mask structure is provided. The method includes bonding a pellicle frame to a mask through a pellicle frame adhesive. The method also includes forming a vent structure in the pellicle frame. The method further includes bonding a pellicle membrane to the pellicle frame through a pellicle membrane adhesive. A first size of the pellicle membrane adhesive is greater than a second size of the pellicle frame adhesive.